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5922results about "Fixed capacitor electrodes" patented technology

IN SITU GENERATION OF RuO4 FOR ALD OF Ru AND Ru RELATED MATERIALS

Apparatus and method for generating ruthenium tetraoxide in situ for use in vapor deposition, e.g., atomic layer deposition (ALD), of ruthenium-containing films on microelectronic device substrates. The ruthenium tetraoxide can be generated on demand by reaction of ruthenium or ruthenium dioxide with an oxic gas such as oxygen or ozone. In one implementation, ruthenium tetraoxide thus generated is utilized with a strontium organometallic precursor for atomic layer deposition of strontium ruthenate films of extremely high smoothness and purity.
Owner:ENTEGRIS INC

Plated terminations

InactiveUS7177137B2Improved termination featureEliminate or greatly simplify thick-film stripesFixed capacitor electrodesFixed capacitor dielectricHigh densityEngineering
A multilayer electronic component includes a plurality of dielectric layers interleaved with a plurality of internal electrode elements and a plurality of internal anchor tabs. Portions of the internal electrode elements and anchor tabs are exposed along the periphery of the electronic component in one or more aligned columns. Each exposed portion is within a predetermined distance from other exposed portions in a given column such that bridged terminations may be formed by depositing one or more plated termination materials over selected of the respectively aligned columns. Internal anchor tabs may be provided and exposed in prearranged relationships with other exposed conductive portions to help nucleate metallized plating material along the periphery of a device. External anchor tabs or lands may be provided to form terminations that extend to top and / or bottom surfaces of the device. Selected of the conductive elements may be formed by a finite volume percentage of ceramic material for enhanced durability, and external lands may be thicker than internal conductive elements and / or may also be embedded in top and / or bottom component surfaces. A variety of potential internal electrode configurations are possible including ones configured for orientation-insensitive component mounting and for high density peripheral termination interdigitated capacitors.
Owner:KYOCERA AVX COMPONENTS CORP

Capacitor and method for producing a capacitor

An electrode for a capacitor includes a substrate comprising at least one of glassy carbon and a metal. According to various embodiments, the substrate may be provided as glassy carbon or any of a variety of metals for use in capacitors. The capacitor also includes an activated carbon material adjacent the substrate. The activated carbon layer includes oxygen-containing functional groups. A material is provided in contact with the activated carbon layer for providing enhanced capacitance for the electrode. Various types of capacitance-enhancing materials may be utilized, including carbon nanotubes and conductive metal oxides.
Owner:MEDTRONIC INC

Method of producing graphite-carbon composite electrodes for supercapacitors

A method of producing a composite electrode having a specific surface area of at least 100 m2 / gm for use in an electrochemical capacitor. The method comprises (a) providing exfoliated graphite flakes that are substantially interconnected to form a porous, conductive graphite network comprising pores; and (b) incorporating an electrochemically active material into at least a pore of the graphite network to form the composite electrode. The exfoliated graphite flakes are preferably obtained from the intercalation and exfoliation of a laminar graphite material selected from natural graphite, spheroidal graphite, synthetic graphite, highly oriented pyrolytic graphite, meso-carbon micro-bead, carbon / graphite fiber, carbon / graphite whisker, carbon / graphite nano-fiber, carbon nano-tube, or a combination thereof. A supercapacitor featuring such a composite electrode exhibits an exceptionally high capacitance value and low equivalent series resistance.
Owner:NANOTEK INSTR GRP LLC

Plated terminations

InactiveUS6960366B2Improved termination featureEliminate and greatly simplifyResistor terminals/electrodesFinal product manufactureTermination problemEngineering
Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on one or both of top and bottom surfaces of a monolithic structure can facilitate the formation of selective wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
Owner:KYOCERA AVX COMPONENTS CORP

Plated terminations

InactiveUS20050046536A1Improved termination featureEliminate and greatly simplifyWave amplification devicesResistor terminals/electrodesTermination problemEngineering
Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on top and bottom sides of a monolithic structure can facilitate the formation of wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
Owner:KYOCERA AVX COMPONENTS CORP

Plated terminations

InactiveUS7154374B2Improved termination featureEliminate or greatly simplify thick-film stripesResistor terminals/electrodesSemiconductor/solid-state device detailsTermination problemEngineering
Improved termination features for multilayer electronic components are disclosed. Monolithic components are provided with plated terminations whereby the need for typical thick-film termination stripes is eliminated or greatly simplified. Such termination technology eliminates many typical termination problems and enables a higher number of terminations with finer pitch, which may be especially beneficial on smaller electronic components. The subject plated terminations are guided and anchored by exposed internal electrode tabs and additional anchor tab portions which may optionally extend to the cover layers of a multilayer component. Such anchor tabs may be positioned internally or externally relative to a chip structure to nucleate additional metallized plating material. External anchor tabs positioned on top and bottom sides of a monolithic structure can facilitate the formation of wrap-around plated terminations. The disclosed technology may be utilized with a plurality of monolithic multilayer components, including interdigitated capacitors, multilayer capacitor arrays, and integrated passive components. A variety of different plating techniques and termination materials may be employed in the formation of the subject self-determining plated terminations.
Owner:KYOCERA AVX COMPONENTS CORP

Universial energy conditioning interposer with circuit architecture

InactiveUS7110227B2Solve and reduce industry problemSolve and reduce and obstacleMagnetic/electric field screeningSemiconductor/solid-state device detailsEnergy regulationInterposer
The present invention relates to an interposer substrate for interconnecting between active electronic componentry such as but not limited to a single or multiple integrated circuit chips in either a single or a combination and elements that could comprise of a mounting substrate, substrate module, a printed circuit board, integrated circuit chips or other substrates containing conductive energy pathways that service an energy utilizing load and leading to and from an energy source. The interposer will also possess a multi-layer, universal multi-functional, common conductive shield structure with conductive pathways for energy and EMI conditioning and protection that also comprise a commonly shared and centrally positioned conductive pathway or electrode of the structure that can simultaneously shield and allow smooth energy interaction between grouped and energized conductive pathway electrodes containing a circuit architecture for energy conditioning as it relates to integrated circuit device packaging. The invention can be employed between an active electronic component and a multilayer circuit card. A method for making the interposer is not presented and can be varied to the individual or proprietary construction methodologies that exist or will be developed.
Owner:X2Y ATTENUATORS L L C
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