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217 results about "Area density" patented technology

The area density (also known as areal density, surface density, superficial density, areic density, mass thickness, column density, or density thickness) of a two-dimensional object is calculated as the mass per unit area. The SI derived unit is: kilogram per square metre (kg·m⁻²). In the paper and fabric industries, it is called grammage and is expressed in grams per square meter (gsm); for paper in particular, it may be expressed as pounds per ream of standard sizes ("basis ream").

Charged particle beam projection method and program used therefor

A deposition energy distribution when a charged particle beam is made incident upon a resist film, is approximated by a sum of element distributions having Gaussian distributions. A pattern area density map partitioning the pattern layout plane into small regions, is defined for each element distribution. First and second sub-steps are repeated for each of the pattern area density maps. In the first sub-step, an area density of each small region is obtained. In the second sub-step, in accordance with an energy deposition rate, an exposure dose assigned to a pattern in a first small region, an area of the pattern and the area density of the first small region, the deposition energy to be given to the target small region is obtained and the corrected area density is calculated. A deposition energy at an evaluation point on a pattern layout plane is calculated from the corrected area densities.
Owner:FUJITSU SEMICON LTD

Imaging apparatus and imaging method

The resolution, frame rate, or both can be improved when imaging moving subjects in an imaging apparatus using a CMOS image sensor. The imaging apparatus has an image sensor having a two-dimensional array of pixels. Each of the pixels includes an element operable to produce an electric charge by photoelectrically converting light from an imaged subject and a part operable to accumulate the produced charge and output an accumulated charge or a signal representing the accumulated charge. The imaging apparatus also has an area control unit operable to define a specified area of the image sensor containing a plurality of pixels and an area density control unit operable to specify a density of pixels read from the specified area defined by the area control unit.
Owner:GK BRIDGE 1

Charged particle beam writing apparatus and method thereof

A charged particle beam writing apparatus includes a charge amount distribution calculation unit configured to calculate a charge amount distribution which is charged by irradiation of a charged particle beam onto a writing region of a target workpiece, by using a charge decay amount and a charge decay time constant both of which depend on a pattern area density, a position displacement amount distribution calculation unit configured to calculate a position displacement amount of each writing position due to charge amounts of the charge amount distribution by performing convolution of each charge amount of the charge amount distribution with a response function, and a writing unit configured to write a pattern on the each writing position where the position displacement amount has been corrected, using a charged particle beam.
Owner:NUFLARE TECH INC

Moire pattern anti-fake method based on linear grating

ActiveCN104859329AImprove anti-counterfeiting qualityImprove display clarityPattern printingGratingComputer graphics (images)
The invention discloses a moire pattern anti-fake method based on a linear grating. The moire pattern anti-fake method specifically comprises the steps that firstly, a background color block is established, and four channels in the background color block are separated; secondly, screening processing is carried out on the channels, the net points of the channel in which hidden information is embedded are in a straight line shape, and the rest of the channels are circular; thirdly, a hidden image is manufactured; fourthly, a digital image comprising the hidden information is manufactured; fifthly, the linear grating is manufactured; sixthly, the hidden information is extracted. The hidden information is embedded in one channel on which screening is carried out through the straight line, conventional net point screening is adopted for the other channels, and finally the hidden information is extracted through the matched linear grating. The digital image in which the hidden information is embedded has a very good hiding effect; when the hidden information is extracted, the hidden information is highlighted through the sharp contrast of the area density and the color displaying of the hidden channel, the displaying definition of the hidden information is improved, and therefore the moire pattern anti-fake quality is improved.
Owner:SHAANXI UNIV OF SCI & TECH

Charged particle beam lithography apparatus and charged particle beam lithography method

A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal; an area density calculator configured to calculate, using a plurality of small areas obtained by virtually dividing the pattern forming area into mesh areas of a predetermined size smaller than all of the first block areas, a pattern area density of each small area positioned therein for each of the first block areas; a second block area divider configured to re-divide the pattern forming area divided into the plurality of first block areas into a plurality of second block areas of a uniform size, which is larger than the small area; a corrected dose calculator configured to calculate, using the pattern area density of each small area, a proximity effect-corrected dose in each corresponding small area positioned inside the second block area for each of the second block areas; a beam dose calculator configured to calculate, using the proximity effect-corrected dose of each small area, a beam dose of a charged particle beam in each corresponding small area; and a pattern generator configured to form a predetermined pattern on a target object by irradiating a charged particle beam of the beam dose calculated for each of the small areas.
Owner:NUFLARE TECH INC

Deployable parabolic cylindrical antenna based on tension structure

The invention provides a deployable parabolic cylindrical antenna based on a tension structure. The deployable parabolic cylindrical antenna comprises a mesh support mechanism, a mesh retaining mechanism, a flexible cable and a wire mesh. The wire mesh is fixed on the flexible cable. The mesh support mechanism is constitutes a skeleton supporting the wire mesh. The mesh retaining mechanism is used for maintaining the basic shape of a parabolic cylinder so that the parabolic cylindrical antenna has a high surface accuracy. The flexible cable is staggered on the mesh support mechanism and forms the required the parabolic cylinder shape with the wire mesh. When the antenna is drawn in, a deployable truss shrinks in a straight line, the mesh support mechanism is folded and drawn in on two sides of the parabolic cylinder, and the flexible cable and the wire mesh are drawn in to a free space of the mesh support mechanism; when the antenna is deployed, the deployable truss is deployed in a straight line, the mesh support mechanism extends to two sides of the parabolic cylindrical antenna, and the flexible cable tightly supports the wire mesh to form the parabolic cylinder. The deployable parabolic cylindrical antenna of the invention has the advantages of large deployed diameter and small area density, and can be used for searching a target in the air and measuring the azimuth of the target.
Owner:XIDIAN UNIV
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