The invention discloses a method and device for quickly preparing
graphene patterns through double beams. The method comprises the steps that continuous
laser beams and short-pulse
laser beams are focused to the surface of a
nickel substrate at the same time, a beam focusing region on the surface of the
nickel substrate is quickly heated to the
graphene growth temperature by the short-pulse beams within the
laser pulse width time, the gathered continuous
laser beams are heated continuously so that the temperature of the region can be stably kept at the
graphene growth temperature, and the graphene synthesis is conducted; and the device is provided with a pulse laser unit, a continuous laser unit, a dichroscope, a
beam shaping and focusing unit, a
vacuum chamber, a gas flow
control unit and a three-axis precision translation platform, and quick preparation of any graphene pattern can be achieved. According to the method and device, preparation of the graphene patterns can be completed by using the small
laser power density, and the cost of the device is lowered effectively; and due to the fact that the pulse
laser heating speed is high, the heat-affected zone is small, the edge quality of the prepared graphene patterns is improved effectively, and the preparation speed of the prepared graphene patterns is increased effectively.