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Method and device for quickly preparing graphene patterns through double beams

A graphene, double-beam technology, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of affecting the edge quality of graphene patterns, expensive continuous lasers, and high laser power density, etc. Achieve the effect of shortening preparation time, fast preparation speed and good edge quality

Inactive Publication Date: 2017-06-20
XIAMEN UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Using a single CW laser to heat the substrate has the following two disadvantages: First, the CW laser beam requires a large laser power density to heat the substrate to the graphene growth temperature (950°C)
High-power CW lasers are very expensive, and a small focused CW laser beam can only synthesize graphene patterns with small linewidths, which limits the application of this technology
Secondly, the continuous heating of the nickel substrate by the continuous laser beam with high power density will easily lead to a large heat-affected zone on the nickel substrate, which will affect the edge quality of the graphene pattern.

Method used

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  • Method and device for quickly preparing graphene patterns through double beams

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Embodiment Construction

[0024] The following specific implementations will be combined with Figure 1~2 The present invention will be further explained.

[0025] Such as figure 1 Shown is a specific embodiment of the device in the present invention. The device includes a pulsed laser unit 1, a continuous laser unit 2, a dichroic mirror 3, a beam shaping and focusing unit 4, a vacuum cavity 5, a gas flow control unit 6, a three-axis precision translation stage 7 and an air-floating vibration isolation optical platform 8. .

[0026] The pulse laser unit 1 includes a pulse laser 11, a first laser shutter 12 and a mirror 13. The pulsed laser 11 is a nanosecond pulsed fiber laser with a power of 10W, a wavelength of 1064nm, and a pulse width of 1 nanosecond. The pulsed laser 11 is equipped with a controller to make the power and pulse repetition frequency adjustable. The adjustment range is 0.1Hz~1000Hz. Operation time of the laser shutter 12 <1 millisecond, when the first laser shutter 12 is closed, the p...

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Abstract

The invention discloses a method and device for quickly preparing graphene patterns through double beams. The method comprises the steps that continuous laser beams and short-pulse laser beams are focused to the surface of a nickel substrate at the same time, a beam focusing region on the surface of the nickel substrate is quickly heated to the graphene growth temperature by the short-pulse beams within the laser pulse width time, the gathered continuous laser beams are heated continuously so that the temperature of the region can be stably kept at the graphene growth temperature, and the graphene synthesis is conducted; and the device is provided with a pulse laser unit, a continuous laser unit, a dichroscope, a beam shaping and focusing unit, a vacuum chamber, a gas flow control unit and a three-axis precision translation platform, and quick preparation of any graphene pattern can be achieved. According to the method and device, preparation of the graphene patterns can be completed by using the small laser power density, and the cost of the device is lowered effectively; and due to the fact that the pulse laser heating speed is high, the heat-affected zone is small, the edge quality of the prepared graphene patterns is improved effectively, and the preparation speed of the prepared graphene patterns is increased effectively.

Description

Technical field [0001] The invention relates to the technical field of graphene preparation, in particular to a method and device for rapidly preparing graphene patterns with dual beams. Background technique [0002] Graphene is a kind of sp 2 The two-dimensional material with a honeycomb structure formed by hybridization has a thickness of only 0.335nm. Graphene has excellent optical, electrical, mechanical and physical properties. It is currently the thinnest but hardest nanomaterial. Its electronic energy band, physical and chemical properties are easy to control. It is used in microelectronics, optoelectronics, spintronics, and microelectronics. Nano-sensor, energy, machinery and other fields have good application prospects, and they are the core materials of next-generation micro-nano opto-electromechanical devices. The so-called Graphene Patterns are graphene structures with specific functions obtained by patterning a complete graphene film. The patterning of graphene is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/04C23C16/26C23C16/48
CPCC23C16/047C23C16/26C23C16/483
Inventor 张陈涛张建寰林坤黄元庆
Owner XIAMEN UNIV
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