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140results about How to "Reduce channel resistance" patented technology

Double gate field effect transistor and method of manufacturing the same

Provided is a double gate field effect transistor and a method of manufacturing the same. The method of manufacturing the double gate field effect transistor comprises forming as many fins as required by etching a silicon substrate, masking the resultant product by an insulating material such as silicon nitride, forming trench regions for device isolation and STI film by using the silicon nitride mask, forming gate oxide films on both faces of the fins after removing the hard mask, and forming a gate line. As such, unnecessary channel formation under the silicon oxide film, when a voltage higher than a threshold voltage is applied to the substrate, is prevented by forming a thick silicon oxide film on the substrate on which no protruding fins are formed.
Owner:SAMSUNG ELECTRONICS CO LTD

Semiconductor device having super junction construction and method for manufacturing the same

A semiconductor device includes a body region, a drift region having a first part and a second part, and a trench gate electrode. The body region is disposed on the drift region. The first and second parts extend in an extending direction so that the second part is adjacent to the first part. The trench gate electrode penetrates the body region and reaches the drift region so that the trench gate electrode faces the body region and the drift region through an insulation layer. The trench gate electrode extends in a direction crossing with the extending direction of the first and second parts. The first part includes a portion near the trench gate electrode, which has an impurity concentration equal to or lower than that of the body region.
Owner:DENSO CORP

Structure and method for a fast recovery rectifier structure

An apparatus and method for a fast recovery rectifier structure. Specifically, the structure includes a substrate of a first dopant. A first epitaxial layer lightly doped with the first dopant is coupled to the substrate. A first metallization layer is coupled to the first epitaxial layer. A plurality of trenches is recessed into the first epitaxial layer, each of which is coupled to the metallization layer. The device also includes a plurality of wells each doped with a second dopant type, wherein each well is formed beneath and adjacent to a corresponding trench. A plurality of oxide layers is formed on walls and a bottom of a corresponding trench. A plurality of channel regions doped with the first dopant is formed within the first epitaxial layer between two corresponding wells. Each of the plurality of channel regions is more highly doped with the first dopant than the first epitaxial layer.
Owner:POWER INTEGRATIONS INC

Structure and Method for Forming Field Effect Transistor with Low Resistance Channel Region

A trench-gate field effect transistor includes trenches extending into a silicon region of a first conductivity type, and a gate electrodes in each trench. Body regions of second conductivity type extend over the silicon region between adjacent trenches. Each body region forms a first PN junction with the silicon region, and each body region includes a silicon-germanium layer of the second conductivity type laterally extending between adjacent trenches. Source regions of the first conductivity flank the trenches, and each source region forms a second PN junction with one of the body regions. Channel regions extend in the body regions along sidewalls of the trenches between the source regions and a bottom surface of the body regions. The silicon-germanium layers extend into corresponding channel regions to thereby reduce the channel resistance.
Owner:SEMICON COMPONENTS IND LLC

Preparation method for artificial graphite negative electrode material for lithium ion battery

Disclosed is a preparation method for an artificial graphite negative electrode material for a lithium ion battery. Artificial graphite coke powder with small grain diameter and an organic carbon source are taken as the raw materials; the raw materials are subjected to procedures of mixing, high-temperature treatment, graphitization treatment, sieving and the like; the coke powder and the organic carbon source are mixed in a heating environment, and the effects of coating, mixing and holding, secondary pelleting and the like can be achieved; the small-particle coke powder can form secondary particles under the cohesive action of the organic carbon source; therefore, the problem of anisotropy of the material is solved, and the tap density of the material is improved; meanwhile, the artificial graphite negative electrode material is capable of lowering the material turnover and equipment residual loss, high in yield, simple in procedures, low in energy consumption, environment-friendly, uniform in the coating effect on the surface of the material, and high in consistency; and in addition, the prepared negative electrode material has the characteristics of isotropy, low iron impurity content, low initial irreversible capacity, small volume expansion, high absorbency, high circulation performance, high performance cost ratio, excellent comprehensive performance and the like.
Owner:田东

Semiconductor device

A semiconductor device capable of reducing ON-resistance changes with temperature, including a semiconductor substrate of a first conductivity type, a drift layer of the first conductivity type formed on the semiconductor substrate, a first well region of a second conductivity type formed in the front surface of the drift layer, a second well region of the second conductivity type formed in the front surface of the drift layer, and a gate structure that is formed on the front surface of the drift layer and forms a channel in the first well region and a channel in the second well region. A channel resistance of the channel formed in the first well region has a temperature characteristic that the channel resistance decreases with increasing temperature and a channel resistance of the channel formed in the second well region has a temperature characteristic that the channel resistance increases with increasing temperature.
Owner:MITSUBISHI ELECTRIC CORP
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