44results about How to "Quick exposure" patented technology

Systems and methods of manufacturing ophthalmic lenses, for example, soft, extended wear silicone hydrogel contact lenses, are provided. The systems generally include a housing having an illuminated chamber, a carrier, for example a tray, movable in the illuminated chamber from an inlet portion to an outlet portion of the housing, and the tray configured to carry a plurality of contact lens molds. Polymerizing light energy is provided, for example, by multiple fluorescent lamps, to the molds at an intensity effective to at least initiate polymerization of a monomer composition located in each of the molds. The light may be illuminated onto two opposing sides of each mold. In some cases, the intensity of the light provided to one side of the mold may be different to the light intensity provided to the opposing side of the mold. In addition, the system may include features that are effective to provide for an instantaneous start and an instantaneous end to the light induced cure of the monomer in the molds. The system may include DALI protocol based technology for controlling the fluorescent lamps.

An economical X-ray apparatus that allows a rapid exposure of comparatively large-format digital X-ray images has an exposure unit, with which a predetermined surface segment of an exposure plane can be exposed with X-ray radiation, and a digital X-ray detector that is moved in the exposure plane, with the X-ray detector being continuously periodically driven.

A drawing apparatus which can create an exposure pattern rapidly. The drawing apparatus has a raster conversion processing module for converting vector images as wiring patterns into bitmap image data, an image cache module for temporarily storing a predetermined-size cached image supplied from the raster conversion processing module, a first compression module for compressing the cached image stored in the image cache module, a second compression module for compressing the cached image stored in the image cache module in a compression ratio differing from that of the first compression module, a comparison module for comparing data sizes of compressed data generated by the first and second compression modules and selecting one having a smaller data size, a memory access module for writing the compressed data selected by the comparison module, into a storage module, and a cache region control module for controlling a compression status of the cached image.

An exposure apparatus is used for calibrating a substrate and a photomask and carrying out exposure in a state of sealing the photomask in the substrate, wherein the substrate includes a plurality of calibration marks for location; and the photomask includes a plurality of photomask marks for aligning to the calibration marks and is provided with a prescribed pattern. The exposure device comprises a unit for calculating distribution point MB obtained by crossing diagonals of the entire region of the photomask on the basis of the plurality of photomask marks; a unit for calculating distribution point WB obtained by crossing diagonals of the entire region of the substrate on the basis of the calibration marks; a first comparison unit for comparing the distribution point MB of the photomask marks with the distribution point WB of the calibration marks; and a first determination unit determining whether the distribution point WB of the calibration marks lie in an allowable range with respect to the distribution point MB of the photomask marks according to the comparison result of the first comparison result, wherein an exposure beam is irradiated on the entire substrate when the first determination unit determines that the distribution points WB lie in the allowable range.

Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and / or switch reticles between exposures.

Systems and methods for imaging objects are provided. An imaging device includes a sensor to provide an image of an object. The sensor can have a sensor exposure time and a sensor gain and the image includes a plurality of frames, each of the plurality of frames that can depict at least a portion of the object. The imaging device includes a motion detector to determine whether there is movement of the at least a portion of the object between adjacent frames of the plurality of frames. The imaging device also includes a controller. The controller can set the sensor exposure time to a first value in response to a determination by the motion detector that there is movement of the at least a portion of the object between adjacent frames. The controller can also set the sensor exposure time to a second value in response to a determination that there is no movement of the at least a portion of the object between adjacent frames. The controller can also adjust the sensor exposure time, the sensor gain, or both to maintain a luminance value of the plurality of frames at a target luminance value.

The invention relates to a liquid drop viewing method and apparatus. The method is used for viewing a dripping liquid drop discharged from a liquid spraying port. The method comprises: in a manner that first and second signals are utilized to start a light source and then a capturing device, performing capturing when the brightness of the LED light source is stable. Under the situation that exposure of the capturing device is started, the light source is closed first, and the time difference from when the capturing device is started till the light source is closed is set as exposure time. Without using a high-standard LED light source and a capturing device, a good dripping image of a liquid drop is obtained and fast exposure of the capturing device is achieved.

The invention provides a behavioristics device for testing negative emotion. The behavioristics device comprises a platform, a support frame and an arm body, wherein the platform is used for placing a to-be-tested object; the support is connected with the bottom of the platform; the arm body is arranged around the edge of the platform and is connected with the platform; the height of the arm body is greater than the maximum height of the to-be-tested object; the support frame is of a Y-shaped structure and comprises a first support frame end, a pivoting base, a second support frame end and a third support frame end, wherein one end of the first support frame end is connected with the bottom of the platform; the other end of the first support frame end is connected with the pivoting base; the second support frame end and the third support frame end are pivotally connected with the pivoting base; and an included angle between the second support frame end and the third support frame end is adjusted by rotation of the second support frame end and the third support frame end.