44results about How to "Quick exposure" patented technology

Systems and methods of manufacturing ophthalmic lenses, for example, soft, extended wear silicone hydrogel contact lenses, are provided. The systems generally include a housing having an illuminated chamber, a carrier, for example a tray, movable in the illuminated chamber from an inlet portion to an outlet portion of the housing, and the tray configured to carry a plurality of contact lens molds. Polymerizing light energy is provided, for example, by multiple fluorescent lamps, to the molds at an intensity effective to at least initiate polymerization of a monomer composition located in each of the molds. The light may be illuminated onto two opposing sides of each mold. In some cases, the intensity of the light provided to one side of the mold may be different to the light intensity provided to the opposing side of the mold. In addition, the system may include features that are effective to provide for an instantaneous start and an instantaneous end to the light induced cure of the monomer in the molds. The system may include DALI protocol based technology for controlling the fluorescent lamps.

The present invention describes an edible product comprising a core composition comprising a sweetener and a shell or coating composition comprising at least one dietary fiber component, wherein the core composition is at least partially coated or encapsulated by the shell composition, a method of production of such an edible product, and its use.

The invention relates to the field of photolithography based on computer-to-plate techniques and provides a photolithographic machine exposure system and a control method thereof. The photolithographic machine exposure system comprises a light source, a light path assembly, a photolithographic lens and a substrate, which are connected in sequence. The light path assembly modulates the optical signal emitted by the light source and then outputs the optical signal. The photolithographic lens focuses the optical signal output from the light path assembly onto the substrate to form a first light spot. The photolithographic machine exposure system further comprises an optical device, a controller and an exposure lens assembly, wherein the controller controls the optical device to emit the optical signal from the light source, and the exposure lens assembly focuses the optical signal emergent from the optical device onto the substrate to form a second light spot. The diameter of the second light spot is larger than that of the first light spot. The photolithographic machine exposure system adopts the optical device to change the travel direction of the optical signal, adopts the exposure lens assembly to focus the optical signal on the substrate to form the large light spot, achieves the effect of rapid exposure of the large clear area without affecting the exposure of the fine pattern, and increase the work efficiency of the photolithographic machine.

Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and / or switch reticles between exposures.

A multilayer sliding member is provided that contains no lead but has superior friction and abrasion properties under the conditions of high PV values and can be used suitably in dry lubrication environments. The multilayer sliding member includes: a porous metal layer that is formed on a back metal; and a sliding layer that is formed by impregnating and coating the porous metal layer, wherein the sliding layer includes 1 to 25% by volume of an oxybenzoyl polyester resin, 1 to 15% by volume of a phosphate, 1 to 20% by volume of barium sulfate, and polytetrafluoroethylene resin. The oxybenzoyl polyester resin (POB) improves the strength and abrasion resistance of the sliding material, and the synergistic effect of the phosphate and barium sulfate facilitates the transfer of PTFE to a counter material during sliding, so that the coefficient of friction can be decreased and the abrasion resistance can be improved.

The invention discloses a 3D printing device and a printing method thereof. The 3D printing device comprises a base, a printing mechanism, a scraper mechanism, an exposure mechanism and a control mechanism, wherein a solution tank used for containing a printing solution is installed in the base; the printing mechanism comprises a module and a printing platform slidably installed on the module; the scraper mechanism comprises guide rails arranged on the two sides of the solution tank, and a scraper slidably installed on the guide rails; the exposure mechanism comprises a projector and a movement assembly driving the projector to move above the solution tank, and an exposure opening of the projector directly faces the printing platform during exposure; and the control mechanism is electrically connected with the printing mechanism, the scraper mechanism and the exposure mechanism and used for controlling the action of all the mechanisms. According to the 3D printing device and the printing method thereof, large 3D articles can be printed; and the 3D printing device and the printing method thereof have the characteristics of being high in printing precision, high in speed, easy to operate and the like.

An economical X-ray apparatus that allows a rapid exposure of comparatively large-format digital X-ray images has an exposure unit, with which a predetermined surface segment of an exposure plane can be exposed with X-ray radiation, and a digital X-ray detector that is moved in the exposure plane, with the X-ray detector being continuously periodically driven.

The invention discloses a pipeline optimization method based on BIM. The method comprises the following steps of S1, constructing a three-dimensional building model by using BIM software; S2, adjusting the arrangement of pipelines in the building model; S3, coloring the pipelines in different elevation intervals or different net height dimensions in sequence according to colors corresponding to the corresponding heights; S4, compiling nodes for coloring a beam plate structure by utilizing a plug-in dynamo of Revit software, and running the nodes to carry out coloring in sequence according to the colors corresponding to the corresponding heights of beams; and S5, defining a position where the colors in the step S3 and the step S4 are intersected as a net height tension region in the building model, and carrying out optimization and adjustment on the pipelines in the net height tension region in the building model. According to the method, the net height situations of the pipelines are reflected by different colors, so that a net height problem can be rapidly and visually exposed; the visual advantage is more beneficial to cooperative communication of different specialty, and the problems encountered in construction can be prejudged more comprehensively, a space problem which cannot be expressed by a two-dimensional drawing is avoided, and the accuracy and the efficiency of pipeline construction are improved.

The invention discloses enteric nano-microparticles loaded with insulin as well as a preparation method and applications of the enteric nano-microparticles. The nano-microparticles are composed of nanoparticles obtained by compounding quaternization chitosan, insulin and sodium tripolyphosphate through the electrostatic interaction, and eudragit coating the surfaces of the nanoparticles. The compound nanoparticles loaded with insulin and having positive charges on the surface are prepared first by utilizing the FNC technology, and then eudragit coats the surfaces of the compound nanoparticles;the preparation method has the advantages that the continuous preparation is realized, the controllability is high, the batch repeatability is high, etc., and the obtained medicine-carrying particleshave high medicine loading capacity and high encapsulation efficiency. The enteric material coats the surfaces of the particles, after oral medication of the medicine-carrying particles, the loaded protein medicine can be effectively protected against the degradation of gastric acid and gastrointestinal tract protease, and thus the oral medication absorption efficiency of insulin at the small intestine part is improved. Compared with the subcutaneous injection, the enteric nano-microparticles loaded with insulin have the advantages that after oral medication, the good and stable effect of reducing blood glucose is shown, the high oral medication bioavailability is also obtained, and thus the application prospect is great.

A high-speed photographic printer having an imaging active matrix liquid crystal display with a corrective lens arrangement confronting the imaging active matrix liquid crystal display. The high-speed photographic printer includes a light sealable housing, a lens drawer located between the imaging active matrix liquid crystal display, an operating system that perceives RAM as a hard drive, and a light stream having an orange hue that is conventionally provided by a film negative. Image information is provided to the imaging active matrix liquid crystal display. Customer information associated with the image information is imprinted on the photosensitive material adjacent to the image with an optical marker in the light sealable housing. Such imprinted information is sensed down line from the high-speed photographic printer such as at a cutting station.

The invention provides a method and apparatus for quickly positioning reliability weak links of an intelligent electric energy meter. The apparatus comprises a temperature stepping test module, a vibration stepping test module, a temperature cycling test module and an environmental stress test module. The specific method is as follows: 1) performing a temperature stepping test on the intelligent electric energy meter to be tested to determine a temperature weak link of the intelligent electric energy meter; performing a vibration stepping test on the intelligent electric energy meter to be tested to determine a vibration weak link of the intelligent electric energy meter; and 2) performing a temperature cycling test on the intelligent electric energy meter to determine a temperature weak link of the intelligent electric energy meter; and performing an environmental stress test on the intelligent electric energy meter to determine an environment weak link of the intelligent electric energy meter. The weak links of the intelligent electric energy meter are positioned, and the stability of the intelligent electric energy meter is improved.

A method of treating an orally ingestible item having an original taste to be enhanced or reduced without imparting bitterness to the item, includes exposing the item to a magnetic field and oxygen.

A drawing apparatus which can create an exposure pattern rapidly. The drawing apparatus has a raster conversion processing module for converting vector images as wiring patterns into bitmap image data, an image cache module for temporarily storing a predetermined-size cached image supplied from the raster conversion processing module, a first compression module for compressing the cached image stored in the image cache module, a second compression module for compressing the cached image stored in the image cache module in a compression ratio differing from that of the first compression module, a comparison module for comparing data sizes of compressed data generated by the first and second compression modules and selecting one having a smaller data size, a memory access module for writing the compressed data selected by the comparison module, into a storage module, and a cache region control module for controlling a compression status of the cached image.

The invention discloses a metal grating coupling SPR (Surface Plasmon Resonance) detection chip and a manufacturing method thereof. The detection chip comprises a transparent substrate, a metal grating coupling layer formed on the substrate, and a microfluid layer covered on the metal grating coupling layer. The manufacturing method comprises the following steps: applying a laser hologram photoetching process to form strip gratings on photoresist uniformly coated on the surface of the substrate, forming a metal film by a metal film coating process, further stripping the photoresist to obtain a metal grating coupling layer, and bonding the prepared microfluid layer and the metal grating coupling layer to obtain a target product. According to the invention, the laser hologram photoetching process is applied in the SPR detection chip, and in a grating manufacturing process, rapid and large-area exposure is available to obtain periodic striped patterns, i.e. one-dimensional gratings, so the process time and cost are greatly reduced, which is conductive to industrialized mass production.

The invention relates to a production processing method of a subway train, particularly to a method for constructing a station-system beating type production mode of a subway train, so that technical problems that the application scope of the production line is small, the workers grouped based on skill types for working with high variability, the working management is confused, the production efficiency is low, various management measures can not be done truly, and the traceability is poor in the prior art are solved. The method comprises: standard stations are established, a production line of a whole subway train is cut into separate standard stations, when products flow on the production line, workers completes regulated working contents within one beat, and the workers and delivery men are separated by relative stay areas of the products; the time for completing two same products, two same services, or two same batches of products continuously is determined and thus the beat is determined; and then, with a standard station as a working organization unit, production is organized by assembly line work in a beating type balanced production mode.

The present invention provides a delivery device for use in the control of a target animal species, the delivery device including:(a) a core containing a control agent for the target animal species,and(b) an impermeable coating enclosing the core, the coating being selected to provide exposure of the core in the gastrointestinal tract of the target animal species;wherein the coating of the delivery device has a hardness such that the coating is not readily breached upon mastication by a target or non-target animal species and further wherein the delivery device will not pass through a Tyler 5 mesh.

A pourer for improving organoleptic properties for various beverages includes a base and a tubular member extending longitudinally through the base. A spout extends outwardly from the tubular member and at least two magnets disposed longitudinally along the tubular member are provided for exposing the beverage to a magnetic field as the beverage passes through the tubular member and spout.

An exposure apparatus is used for calibrating a substrate and a photomask and carrying out exposure in a state of sealing the photomask in the substrate, wherein the substrate includes a plurality of calibration marks for location; and the photomask includes a plurality of photomask marks for aligning to the calibration marks and is provided with a prescribed pattern. The exposure device comprises a unit for calculating distribution point MB obtained by crossing diagonals of the entire region of the photomask on the basis of the plurality of photomask marks; a unit for calculating distribution point WB obtained by crossing diagonals of the entire region of the substrate on the basis of the calibration marks; a first comparison unit for comparing the distribution point MB of the photomask marks with the distribution point WB of the calibration marks; and a first determination unit determining whether the distribution point WB of the calibration marks lie in an allowable range with respect to the distribution point MB of the photomask marks according to the comparison result of the first comparison result, wherein an exposure beam is irradiated on the entire substrate when the first determination unit determines that the distribution points WB lie in the allowable range.

Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and / or switch reticles between exposures.

The invention relates to the field of intelligent visual recognition, in particular to an exposure method and system based on scene depth and an electronic device thereof. The exposure method based onthe scene depth includes the following steps: obtaining a depth map of a to-be-exposed scene, and obtaining a mask map by comparing the sizes of depth values of corresponding pixel points in the depth map; calculating the depth values of all pixel points in the depth map corresponding to the mask map to obtain corresponding weight maps; and adjusting the exposure value of the to-be-exposed scenebased on the weight maps. The exposure method based on the scene depth provided by the invention can carry out exposure value adjustment according to the scene requirements, has a small calculation amount, is especially suitable for the field of intelligent containers, and further achieves the exposure adjustment of the characteristic parts of commodities for sale.

Systems and methods for imaging objects are provided. An imaging device includes a sensor to provide an image of an object. The sensor can have a sensor exposure time and a sensor gain and the image includes a plurality of frames, each of the plurality of frames that can depict at least a portion of the object. The imaging device includes a motion detector to determine whether there is movement of the at least a portion of the object between adjacent frames of the plurality of frames. The imaging device also includes a controller. The controller can set the sensor exposure time to a first value in response to a determination by the motion detector that there is movement of the at least a portion of the object between adjacent frames. The controller can also set the sensor exposure time to a second value in response to a determination that there is no movement of the at least a portion of the object between adjacent frames. The controller can also adjust the sensor exposure time, the sensor gain, or both to maintain a luminance value of the plurality of frames at a target luminance value.

The invention discloses a surgical bent visual self-retaining laryngoscope system and a using method thereof. The self-retaining laryngoscope system comprises a self-retaining laryngoscope with a pipe cavity, a camera and an illuminating head which are arranged at the front end of the pipe cavity, image display equipment, an illuminating power supply, a first cable which is connected with the camera and the image display equipment, and a second cable which is connected with the illuminating head and the illuminating power supply, wherein the pipe cavity is of an arc-shaped structure. Since the structure of the self-retaining laryngoscope disclosed by the invention adopts a bending angle close to the geometrical size of a human body throat, the self-retaining laryngoscope can be easily inserted into the throat without using very great external force, human body tissues are not damaged and the surgical bent visual self-retaining laryngoscope system is more compliant with the ergonomic characteristic.

The present invention relates to an automatic test method, device and readable storage medium for frame synchronization, comprising the steps of: the client collects a key frame data packet of a game scene in the background, and the key frame data packet includes a key frame Hash value and a key frame operation data ; The client uploads the key frame data packet to the server; the test end downloads the key frame data packet from the server, and restores the game scene through the key frame operation data; the comparison Hash value of the key frame generated by the restored game scene will be compared Compare and verify the Hash value and the key frame Hash value; if the result of the comparison and verification is inconsistent, a prompt message is sent. This automated test method for frame synchronization key frame operation data restores the key frame of the game, calculates the Hash value, and compares the Hsah value with the downloaded key frame Hash value to determine whether there is a frame synchronization problem. The technical solution can quickly expose frame synchronization bugs, and the amount of data packets is not large, which will not cause an excessive burden on the system.

An exposure method for an exposure device has a good integrated accuracy of a substrate and a photomask and a short process time in performing exposure to a substrate rapidly. The invented method uses a substrate integrated with an integration mark and a patterned photomask having a photomask mark, and performs exposure in a state where the photomask is tightly connected to the substrate. The invented method comprises: using the photomask mark as a basis to obtain a point MA where the diagonal lines of half region of the photomask intersect, and a point MB where the diagonal lines of the whole region of the photomask intersect; using the integration mark as a basis to obtain a point WA where the diagonal lines of half of the region of the substrate intersect, and a point WB where the diagonal lines of the whole region of the substrate intersect; performing a comparison process of comparing the MB point of the photomask mark with the WB point of the integration mark; performing a determination process of determining whether the WB point of the integration mark relative to the MB point of the photomask mark is within a tolerance range; and irradiating the exposure light on the whole substrate when the determined result from the determination process falls within the tolerance range.

The invention relates to a liquid drop viewing method and apparatus. The method is used for viewing a dripping liquid drop discharged from a liquid spraying port. The method comprises: in a manner that first and second signals are utilized to start a light source and then a capturing device, performing capturing when the brightness of the LED light source is stable. Under the situation that exposure of the capturing device is started, the light source is closed first, and the time difference from when the capturing device is started till the light source is closed is set as exposure time. Without using a high-standard LED light source and a capturing device, a good dripping image of a liquid drop is obtained and fast exposure of the capturing device is achieved.

The present invention provides an exposure method of an exposure device capable of accurately aligning a substrate and a mask in a short process and rapidly exposing the entire substrate. It calibrates a substrate with calibration marks and a mask with mask marks and a predetermined pattern, and performs exposure in a state where the mask is closely attached to the substrate. The step of assigning points MA and MB obtained by intersecting diagonal lines of half area and the whole; based on the calibration mark, calculating the distribution points WA and WB obtained by intersecting diagonal lines of half area of ​​the substrate and the whole step; a comparison step of comparing the distribution point MB with the distribution point WB; through the comparison step, a judgment step of judging whether the distribution point WB is within the allowable range relative to the distribution point MB; and when the judgment step judges that it is within the allowable range, the A step of irradiating the entire substrate with exposure light.

The invention claims an exposure system capable of reducing scan time and scan distance and a control method thereof. Low cost of production may be implemented and exposure accuracy may be improved by using the exposure system and control method thereof. Moreover, rapid exposure of a substrate of exposure regions with different sizes may be implemented. The exposure system has several optic module components used for radiating lights with patterns onto exposure regions that differ from each other. The optic module components are arranged to permit adjustment of space distance there-between. Control method of the exposure system comprises the following steps: determining whether the exposure mode is changed; and adjusting space distance between several optic module components according to the changed exposure mode if it is.