Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

44results about How to "Quick exposure" patented technology

Exposure system of photo-etching machine and control method thereof

The invention relates to the field of photolithography based on computer-to-plate techniques and provides a photolithographic machine exposure system and a control method thereof. The photolithographic machine exposure system comprises a light source, a light path assembly, a photolithographic lens and a substrate, which are connected in sequence. The light path assembly modulates the optical signal emitted by the light source and then outputs the optical signal. The photolithographic lens focuses the optical signal output from the light path assembly onto the substrate to form a first light spot. The photolithographic machine exposure system further comprises an optical device, a controller and an exposure lens assembly, wherein the controller controls the optical device to emit the optical signal from the light source, and the exposure lens assembly focuses the optical signal emergent from the optical device onto the substrate to form a second light spot. The diameter of the second light spot is larger than that of the first light spot. The photolithographic machine exposure system adopts the optical device to change the travel direction of the optical signal, adopts the exposure lens assembly to focus the optical signal on the substrate to form the large light spot, achieves the effect of rapid exposure of the large clear area without affecting the exposure of the fine pattern, and increase the work efficiency of the photolithographic machine.
Owner:深圳清溢光电股份有限公司

Exposure control for phase shifting photolithographic masks

Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and / or switch reticles between exposures.
Owner:SYNOPSYS INC

Pipeline optimization method based on BIM

The invention discloses a pipeline optimization method based on BIM. The method comprises the following steps of S1, constructing a three-dimensional building model by using BIM software; S2, adjusting the arrangement of pipelines in the building model; S3, coloring the pipelines in different elevation intervals or different net height dimensions in sequence according to colors corresponding to the corresponding heights; S4, compiling nodes for coloring a beam plate structure by utilizing a plug-in dynamo of Revit software, and running the nodes to carry out coloring in sequence according to the colors corresponding to the corresponding heights of beams; and S5, defining a position where the colors in the step S3 and the step S4 are intersected as a net height tension region in the building model, and carrying out optimization and adjustment on the pipelines in the net height tension region in the building model. According to the method, the net height situations of the pipelines are reflected by different colors, so that a net height problem can be rapidly and visually exposed; the visual advantage is more beneficial to cooperative communication of different specialty, and the problems encountered in construction can be prejudged more comprehensively, a space problem which cannot be expressed by a two-dimensional drawing is avoided, and the accuracy and the efficiency of pipeline construction are improved.
Owner:广东天元建筑设计有限公司

Enteric nano-microparticles loaded with insulin as well as preparation method and applications of enteric nano-microparticles

ActiveCN108379560AImprove oral absorption efficiencyStable hypoglycemic effectPowder deliveryPeptide/protein ingredientsMicroparticleControllability
The invention discloses enteric nano-microparticles loaded with insulin as well as a preparation method and applications of the enteric nano-microparticles. The nano-microparticles are composed of nanoparticles obtained by compounding quaternization chitosan, insulin and sodium tripolyphosphate through the electrostatic interaction, and eudragit coating the surfaces of the nanoparticles. The compound nanoparticles loaded with insulin and having positive charges on the surface are prepared first by utilizing the FNC technology, and then eudragit coats the surfaces of the compound nanoparticles;the preparation method has the advantages that the continuous preparation is realized, the controllability is high, the batch repeatability is high, etc., and the obtained medicine-carrying particleshave high medicine loading capacity and high encapsulation efficiency. The enteric material coats the surfaces of the particles, after oral medication of the medicine-carrying particles, the loaded protein medicine can be effectively protected against the degradation of gastric acid and gastrointestinal tract protease, and thus the oral medication absorption efficiency of insulin at the small intestine part is improved. Compared with the subcutaneous injection, the enteric nano-microparticles loaded with insulin have the advantages that after oral medication, the good and stable effect of reducing blood glucose is shown, the high oral medication bioavailability is also obtained, and thus the application prospect is great.
Owner:SUN YAT SEN UNIV

Beverage pourer with magnetic enhancement

InactiveUS20060011629A1Enhance and change organoleptic propertyQuick exposureClosuresWater/sewage treatment by magnetic/electric fieldsMagnetEngineering
A pourer for improving organoleptic properties for various beverages includes a base and a tubular member extending longitudinally through the base. A spout extends outwardly from the tubular member and at least two magnets disposed longitudinally along the tubular member are provided for exposing the beverage to a magnetic field as the beverage passes through the tubular member and spout.
Owner:INVENTIVE TECH

Exposure method for exposure device

The present invention provides an exposure method of an exposure device capable of accurately aligning a substrate and a mask in a short process and rapidly exposing the entire substrate. It calibrates a substrate with calibration marks and a mask with mask marks and a predetermined pattern, and performs exposure in a state where the mask is closely attached to the substrate. The step of assigning points MA and MB obtained by intersecting diagonal lines of half area and the whole; based on the calibration mark, calculating the distribution points WA and WB obtained by intersecting diagonal lines of half area of ​​the substrate and the whole step; a comparison step of comparing the distribution point MB with the distribution point WB; through the comparison step, a judgment step of judging whether the distribution point WB is within the allowable range relative to the distribution point MB; and when the judgment step judges that it is within the allowable range, the A step of irradiating the entire substrate with exposure light.
Owner:ORC MFG

Exposal system and control method thereof

The invention claims an exposure system capable of reducing scan time and scan distance and a control method thereof. Low cost of production may be implemented and exposure accuracy may be improved by using the exposure system and control method thereof. Moreover, rapid exposure of a substrate of exposure regions with different sizes may be implemented. The exposure system has several optic module components used for radiating lights with patterns onto exposure regions that differ from each other. The optic module components are arranged to permit adjustment of space distance there-between. Control method of the exposure system comprises the following steps: determining whether the exposure mode is changed; and adjusting space distance between several optic module components according to the changed exposure mode if it is.
Owner:SAMSUNG ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products