The invention relates to a method for manufacturing a micromechanical
shutter, which comprises the following steps of: 1) selecting a stainless steel substrate, preparing a layer of positive
photoresist on the upper and lower surfaces of the substrate respectively, and pre-curing the
photoresist; 2) exposing a rectangular hole array serving as a
mask, wherein the pre-cured
photoresist on the lower surface is not exposed; 3) developing the substrate, finishing full curing of the photoresist, then performing
corrosion, removing the photoresist and cleaning the substrate; 4) spraying the positive photoresist on the upper and lower surfaces of the substrate, and pre-curing the photoresist; 5) on the photoresist on the lower surface of the substrate, exposing a twist beam type
shutter corroding pattern array serving as a
mask, wherein the upper surface of the substrate is not exposed; 6) developing the substrate, finishing full curing of the photoresist, then performing
corrosion, removing the photoresist and cleaning the substrate; 7) manufacturing a
shutter substrate; and 8) assembling and fixing the shutter blade structure and the substrate, and finishing upper and lower
electrode leads. According to the method, the stainless steel is used as a
structural material, so the micromechanical shutter has longer service life and higher reliability.