41results about How to "Excellent etching properties" patented technology

The invention relates to an etching liquid composition which is used for controlling lateral erosion of a molybdenum film or a molybdenum alloy film to realize stable etching processes when a copper-and-molybdenum-containing film is etched. The etching liquid composition can improve etching characteristics such as an etching taper angle, etching deviation, etching straightness and the like. The etching liquid composition comprises 10 to 30 weight% of a hydrogen peroxide, 0.1 to 5 weight% of an etching inhibitor, 0.1 to 5 weight% of a chelating agent, 0.1 to 5 weight% of an etching additive, 0.01 to 2 weight% of fluoride and 0.01 to 2 weight% of lateral erosion inhibitor; the total weight is enabled to be 100 weight% of water.

An etchant composition includes an etchant composition that includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.1 wt % to about 10 wt % of an aliphatic sulfonic acid, about 1 wt % to about 20 wt % of an organic acid or an organic acid salt, and water based on a total weight of the etchant composition.

The present invention provides an antireflection coating composition, which can strongly absorb radiation of 100 to 300 nm by using the matting resin of the present invention, especially has high light absorption performance at 248 nm, and the extinction coefficient K reaches 0.4 or more or 0.5 or more, thereby Allows the use of thinner coatings and shorter etching times, and the prepared anti-reflection coating material is easy to remove, and is particularly suitable for use in thin-layer photoresists to obtain high-resolution photolithographic patterns; at the same time, the present invention The BARC layer also has an improved plasma etch rate relative to the photoresist material, enabling the integrity of the image to be transferred to the substrate for a good photoresist image. Further, through the interaction of solid components, the interference effect in the photoresist can be eliminated; and through the joint action of the catalyst, the crosslinking agent and the matting resin of the present invention, a kind of photoresist with good storage properties can be obtained. Stable, highly differential solubility antireflective coating composition after curing.

There is provided a titanium-copper alloy in which the adhesion strength with solder can be increased. The titanium-copper alloy comprises a base material and a plating layer provided on a surface of the base material, wherein the base material contains 1.5 to 5.0% by mass of Ti with a balance consisting of copper and unavoidable impurities, and the plating layer is selected from the group consisting of a Ni plating layer, a Co plating layer, and a Co—Ni alloy plating layer.