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Metal film etchant composition and conductive pattern forming method using same

A conductive pattern and composition technology, which is applied in the field of metal film etching solution composition, can solve the problems of poor wiring side profile, wiring bulge or peeling, and no countermeasures are provided, and achieves reduction of bad pixels and excellent etching properties. Effect

Active Publication Date: 2021-06-29
DONGWOO FINE CHEM CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] However, since silver (Ag) has extremely poor adhesion to insulating substrates such as glass or semiconductor substrates formed of pure amorphous silicon or doped amorphous silicon, etc., it is difficult to vaporize, and it is easy to cause swelling of wiring. warping or peeling
In addition, when a silver (Ag) film is vapor-deposited on a substrate, an etchant is used for patterning it. However, when a conventional etchant is used, the silver (Ag) may be excessively etched or unevenly etched. Bulking or peeling of the wiring occurs, and the side profile of the wiring becomes poor
[0007] Korean Registered Patent No. 10-0579421 discloses a silver etchant composition, but does not provide countermeasures against the above problems

Method used

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  • Metal film etchant composition and conductive pattern forming method using same
  • Metal film etchant composition and conductive pattern forming method using same
  • Metal film etchant composition and conductive pattern forming method using same

Examples

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experiment example

[0143] In order to test the performance of the metal film etchant composition, the following substrates are prepared: an organic insulating film is evaporated on the substrate, and the A substrate with a size of 680mm X 880mm obtained by vapor-depositing ITO / Ag / ITO three-layer film.

[0144] Afterwards, using the metal film etchant compositions of Examples and Comparative Examples, performance tests were performed as follows.

[0145] 1. Determination of critical dimension deviation (CD bias)

[0146] Put the metal film etchant compositions of the above-mentioned examples and comparative examples into the experimental equipment (model: ETCHER, K.C.Tech company) of the jet etching method respectively, set the temperature to 40° C. and heat it, and when the temperature reaches 40 At ±0.1°C, the above-mentioned etching process of the test piece was carried out. The total etching time was set to 100 seconds and implemented.

[0147] Specifically, a photoresist pattern is forme...

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Abstract

The present invention relates to a metal film etching solution composition and a method for forming a conductive pattern using the same. More specifically, it relates to the following metal film etching solution composition. The total weight of the composition includes: 40-60% by weight of phosphoric acid; 3-8% by weight of nitric acid; 5-20% by weight of acetic acid; 0.1-3% by weight of phosphate; 0.1-6% by weight of anti-adsorption agent containing at least one of diol-based compounds and compounds containing multiple phosphoric acid groups; And the remaining water, so as to effectively prevent the etched metal from re-adsorbing on the substrate, without damaging the lower film, and show excellent etching characteristics for the etching target film.

Description

technical field [0001] The present invention relates to a metal film etchant composition and a method for forming a conductive pattern using the composition. Background technique [0002] Examples of flat panel display devices include liquid crystal display devices (Liquid Crystal Display device: LCD), plasma display devices (Plasma Display Panel device: PDP), field emission display devices (Field Emission Display device: FED), electroluminescent Display devices (Electroluminescence Display device: ELD), Organic Light Emitting Diodes (Organic Light Emitting Diodes: OLED), etc., such flat-panel display devices are used not only in the field of home appliances such as TVs and video recorders, but also in computers such as notebook computers and mobile phones. use for various purposes. The reality is that these flat panel display devices are rapidly replacing the conventionally used Braun tube (Cathode Ray Tube (Cathode Ray Tube): NIT) due to their excellent performance such a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/30
CPCC23F1/30H01L27/124H01L21/32134G02F1/13439C09K13/06
Inventor 金镇成金兑勇梁圭亨
Owner DONGWOO FINE CHEM CO LTD
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