Methods for forming an improved bump structure on a
semiconductor device are provided. In one embodiment, a substrate is provided having at least one
contact pad formed thereon. A first
passivation layer is formed over the substrate, the first
passivation layer having at least one opening therein exposing a portion of the
contact pad. A first patterned and etched conductive
metal layer is formed on the
contact pad and above a portion of the first
passivation layer. A second patterned and etched passivation layer is formed above the first passivation layer and a portion of the first conductive
metal layer, wherein a portion of the ends of the first conductive
metal layer is wedged between the first and second passivation
layers. A second conductive metal layer is formed above the second passivation layer and the first conductive metal layer. A patterned and etched
photoresist layer is then formed over a portion of the second passivation layer, the
photoresist layer having an opening overlying the contact pad, and a
solder material is deposited in the opening to form a solder column. The
photoresist layer is thereafter removed and the second conductive metal layer is etched to the second passivation layer by using the solder column as an
etching mask. The solder column is then reflown to create a solder bump.