124 results about "Ruthenium Compounds" patented technology

A ring-opened metathesis copolymer and its hydrogenated product having a desired monomer unit ratio and a high molecular weight and having hydroxyl groups or hydroxycarbonyl groups can be obtained by conducting a ring-opening metathesis copolymerization of a norbornene-type monomer having hydroxyl groups or hydroxycarbonyl groups with an unsubstituted norbornene-type monomer having at least three rings in the presence of a catalyst predominantly comprised of an organic ruthenium compound having coordinated therewith a neutral electron-donating ligand, and, if desired, hydrogenating the resulting copolymer. The thus-obtained ring-opened metathesis copolymer and its hydrogenation product are characterized by having a low water absorption, good adhesion to metal and other materials, good compatibility with a curing agent and other compounds, and high heat resistance, and exhibiting reduced signal retardation and signal noise.

A process is described for preparing sorbitol by catalytic hydrogenation of a monosaccharide forming sorbitol on hydrogenation in the liquid phase, which comprises the catalyst being obtainable by:i) single or multiple treatment of an amorphous silicon dioxide based support material with a halogen-free aqueous solution of a low-molecular-weight ruthenium compound and subsequent drying of the treated support material at below 200° C.,ii) reducing the solid obtained in i) with hydrogen at from 100 to 350° C.,step ii) being carried out immediately after step i).

The invention discloses a beta-carboline ruthenium compound. The molecular formula of the beta-carboline ruthenium compound is [Ru (N^N) 2 (Nh) XClY] (A^A)z, wherein N^N is selected from bpy or phen; A^A is selected from PF6 or SO3CF3; X is equal to 1 or 2, Y is equal to 2-X, and Z is equal to 1 or 2; or the molecular formula of the beta-carboline ruthenium compound is [Ru (N^N) 2 (1-Py-betaC)] (PF^)2, wherein N^N is selected from bpy, phen or DIP. On a molecular mechanism, the invention proves that the beta-carboline ruthenium compound can be used for treating cancers and has a better effectthan the effects of that of the traditional metal compound cisplatin with wide application and ruthenium compounds NAMI-A in clinical tests; . Thethe beta-carboline ruthenium compound for treating the cancers as an autophagic cell inducer fills the blank of the prior art and develops a new line for developing a new generation of high-efficiency medicaments for treating malignant tumors.

Processes are disclosed comprising: (a) providing a gas phase comprising hydrogen chloride and oxygen; and (b) oxidizing the hydrogen chloride with the oxygen in the presence of a catalyst comprising tin dioxide and at least one oxygen-containing ruthenium compound.

Provided is a glucose sensor that is capable of measuring a glucose concentration even in the case where Aspergillus oryzae type FAD-GDH (flavin adenine dinucleotide-glucose dehyrogenase) and a ruthenium compound are used in combination. The glucose sensor includes an insulative substrate, an electrode system having a working electrode and a counter electrode provided on the substrate, and a reagent layer provided on the electrode system, wherein the reagent layer contains Aspergillus oryzae type FAD-GDH, a ruthenium compound, and PMS (phenazine methosulfate).

A new class of compounds is disclosed that in preferred embodiments relate to Ru-based catalysts suitable for use in olefin metathesis reactions. Such compounds demonstrate high rates of catalytic turnover in comparison with other Ru catalysts known in the art. Moreover, the catalysts are highly stable, and readily suited to attachment to a solid support via the anionic ligands. The invention also pertains to methods of producing the catalysts, and their use in catalyzing olefin metathesis reactions.

This invention relates to processes for the production of organometallic compounds represented by the formula M(L)3 wherein M is a Group VIII metal, e.g., ruthenium, and L is the same or different and represents a substituted or unsubstituted amidinato group or a substituted or unsubstituted amidinato-like group, which process comprises (i) reacting a substituted or unsubstituted metal source compound, e.g., ruthenium (II) compound, with a substituted or unsubstituted amidinate or amidinate-like compound in the presence of a solvent and under reaction conditions sufficient to produce a reaction mixture comprising said organometallic compound, e.g., ruthenium (III) compound, and (ii) separating said organometallic compound from said reaction mixture. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.

This invention provides raw material compounds for use in CVD which contain organic ruthenium compounds as a main ingredient, the organic ruthenium compounds having two beta-diketones plus one diene, one diamine or two organic ligands which are coordinated with ruthenium. In this invention, the vapor pressures of the organic ruthenium compounds are made preferable by specifying the number of the carbon atoms contained in the above beta-diketones and the types of the above diene etc.

The invention provides a ruthenium-based adsorbent for deeply removing thiophene of benzene as well as a preparation method and application of the ruthenium-based adsorbent. The ruthenium-based adsorbent comprises metal ruthenium loaded on a carrier, wherein the carrier is selected from aluminum oxide, silicon oxide, titanium oxide and a molecular sieve, and a mixture of any two or more thereof. The preparation method comprises the following steps: adopting a molded porous grain-shaped carrier; carrying out modification treatment on the carrier in advance and loading pre-blended ruthenium-containing compound slurry by an immersion or spraying method; adding an inorganic alkali solution to carry out sedimentation and transformation; and carrying out liquid-phase reduction and / or gas-phase reduction to obtain the ruthenium-based adsorbent. The benzene, which is treated by the novel ruthenium-based adsorbent, can meet the requirements on content and quality of thiophene in the raw material benzene in a process of preparing cyclohexene through hydrogenating the benzene. Compared with the prior art, the ruthenium-based adsorbent has high thiophene removal precision, high sulfur capacity, low price and simple production process and equipment; and industrialized production is easy to realize and the ruthenium-based adsorbent has good application prospect and great economic benefits.

The present invention is an organoruthenium compound for use in production of a ruthenium or ruthenium compound thin film by chemical vapor deposition, including ruthenium and an arene group and norbornadiene both coordinated to the ruthenium and represented by the following formula. The present invention is an organoruthenium compound for use in chemical vapor deposition which does not require the coexistence of oxygen during the thin film formation, and moreover, is liquid at ordinary temperature, thereby having good handleability and recyclability.wherein the substituents, R1 to R6, of the arene group are each hydrogen or an alkyl group, and the total number of carbons of R1 to R6 (R1+R2+R3+R4+R5+R6) is 6 or less.

The invention relates to the field of catalysis, in particular to a method for preparing aryl ketone through reacting aldehyde with aryl boric acid under the catalysis of a ruthenium catalyst. In the method, an organic phosphide is used as a ligand, potassium phosphate is used as alkali, pinacolone or acetone is used as an additive, toluene or / and water is (are) used as a solvent(s), aldehyde and aryl boric acid which are used as reaction substrates react at 95-100 DEG C for 10-24h in the presence of a ruthenium compound used as a catalyst to prepare aryl ketone, wherein the catalyst is one of [Ru(cymene)Cl2]2, [Ru(CO)3Cl2]2, RuH2(CO)PPh3, Ru2(OAc)4, [Ru(benzene)Cl2]2, Ru(S-BINAP)Cl2 or Ru3(CO)12. In the invention, the used catalyst has relatively low price and low toxicity, thereby reducing the preparation cost and being more environmentally friendly.

A chemical vapor deposition material comprising a ruthenium compound having a ligand represented by the following formula: wherein R1, R2 and R3 are each independently a hydrogen atom, fluorine atom, trifluoromethyl group or hydrocarbon group having 1 to 10 carbon atoms, and a method of forming a ruthenium film from the chemical vapor deposition material by chemical vapor deposition. A high-quality ruthenium film even when it is very thin can be obtained.

Process to recover ruthenium in the form of ruthenium halide, particularly ruthenium chloride, from a ruthenium-containing supported catalyst material comprising:a) chemically decomposing the ruthenium-containing supported catalyst material;b) producing a raw ruthenium salt solution;c) purifying the raw ruthenium salt solution and optionally stripping gaseous ruthenium tetroxide from the raw ruthenium salt solution; andd) treating the purified ruthenium compound obtained in c), particularly the ruthenium tetroxide, with hydrogen halide or hydrohalic acid to obtain ruthenium halide, particularly with hydrogen chloride or hydrochloric acid to obtain ruthenium chloride.

According to the present invention, it becomes possible to collect ruthenium or a ruthenium compound, which is expensive, with high efficiency even from an aqueous solution containing a water-soluble salt, a lower alcohol, an organic acid or the like by adding at least one specific inorganic adsorbent to an aqueous solution containing ruthenium or the ruthenium compound, dissolving the entire or a portion of the inorganic adsorbent under acidic conditions, and adding an alkali to the solution to adjust the pH value of the solution to an alkaline pH value of 7 or more to thereby adsorb the ruthenium compound onto the inorganic adsorbent while precipitating the inorganic adsorbent.

A reflective mask blank and a reflective mask each have, on a multilayer reflective film, a protective film that protects the multilayer reflective film from etching during pattern formation of an absorber layer or a buffer layer formed on the protective film. The protective film is formed by a ruthenium compound containing ruthenium (Ru) and at least one selected from the group consisting of molybdenum (Mo), niobium (Nb), zirconium (Zr), yttrium (Y), boron (B), titanium (Ti), and lanthanum (La). A reflection enhancement film of Ru may be further formed on the surface of the protective film.

A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition.The ruthenium compound as a material for chemical vapor deposition is represented by the following formula (1), for example

Processes comprising: providing a catalyst comprising a catalytic component selected from the group consisting of ruthenium, ruthenium compounds, and combinations thereof, wherein the catalyst is sulfur-poisoned with one or more sulfur compounds; and treating the catalyst with a gas stream comprising a hydrogen halide under nonoxidative conditions such that the catalyst is regenerated.

PCT No. PCT / JP99 / 00566 Sec. 371 Date Sep. 24, 1999 Sec. 102(e) Date Sep. 24, 1999 PCT Filed Feb. 10, 1999 PCT Pub. No. WO99 / 42211 PCT Pub. Date Aug. 26, 1999The oxidation catalyst system of the invention is composed of (A) a ruthenium compound and (B) a dioxybenzene or its oxidant. The ruthenium compound (A) includes dichlorotris(triphenylphosphine)ruthenium (II) and other ruthenium complexes and Ru / C. The dioxybenzene or its oxidant (B) includes hydroquinone. The oxidation of an alcohol by molecular oxygen in the presence of the oxidation catalyst system can give the corresponding carbonyl compound in high yield. A primary alcohol is more selectively oxidized than a secondary alcohol.

The presently-disclosed subject matter includes light-activated ruthenium compounds. In some embodiments the compounds release one or more ligands when exposed to light, and in specific embodiments the light includes a wavelength of about 500 nm to about 1000 nm. The present compounds can also comprise an overall charge, wherein the overall charge can be a positive overall charge or a negative overall charge. Further still, embodiments include methods of treating cancer in a subject by administering a compound and then exposing a site of the subject to light.

The invention discloses a method for preparing a synthetic natural gas low-ruthenium methanation catalyst, and belongs to the field of catalysts and fine chemical engineering. According to the method, gamma-type aluminum oxide is infiltrated by the solution of soluble titanium compounds, dried and roasted to obtain composite support TiO2 / Al2o3, and is then impregnated in the solution of soluble ruthenium compounds in an equivalent-volume impregnation mode, the obtained impregnant is dried and roasted to obtain the synthetic natural gas low-ruthenium methanation catalyst, and the carrying capacity of Ru is 0.3-2.0% by weight. The prepared Ru / TiO2-Al2O3 catalyst gets a good result in a CO methanation reaction evaluation. The synthetic natural gas low-ruthenium methanation catalyst has big specific surface area, is high in catalytic activity,low in sensibility to poisons, good in stability, low in starting temperature, simple in preparation process, feasible economically and used for the inlet of a synthetic natural gas one-stage methanator, can reduce synthetic natural gas preheating temperature, and reduces heat energy consumption.

The present invention discloses a ruthenium base temary series catalyst for preparing cycloalkene by means of monocyclic aromatic hydrocarbon partial hydrogenation, its preparation method and application. Said catalyst is formed from metal ruehtnium and cocatalyst zinc (iron) and platinum, in which the metal ruthenium content is 60-98.9% of total weight, zinc (iron) content is 1-50% of metal ruthenium weight and the platinum content is greater than 0-15% of metal ruthenium weight. Said invented catalyst has high cycloalkane selection rate, high activity, subsidence and higher life.

Ruthenium compounds, either alone or in combination with other remediating compounds, can be used to oxidize, remove and sequester contaminants in water and soil or sediments.

Provided is a method for manufacturing a catalyst with which it is possible to obtain a supported metal ammonia synthesis catalyst, in which there are restrictions in terms of producing method and producing facility, and particularly large restrictions for industrial-scale producing, in a more simple manner and so that the obtained catalyst has a high activity. This method for manufacturing an ammonia synthesis catalyst includes: a first step for preparing 12CaO.7Al2O3 having a specific surface area of 5 m2 / g or above; a second step for supporting a ruthenium compound on the 12CaO.7Al2O3; and a third step for performing a reduction process on the 12CaO.7Al2O3 supporting the ruthenium compound, obtained in the second step. This invention is characterized in that the reduction process is performed until the average particle diameter of the ruthenium after the reduction process has increased by at least 15% in relation to the average particle diameter of the ruthenium before the reduction process.

A supported ruthenium can be produced by collecting a ruthenium compound from a supported ruthenium which has been used as a catalyst in the production of chlorine by oxidation of hydrogen chloride with oxygen, and then supporting the ruthenium compound on a carrier. Chlorine can be produced by oxidizing hydrogen chloride with oxygen in the presence of the supported ruthenium.

Hydrosilylatable compositions employ ruthenium compounds with a ligand sphere comprising at least two independent carbon π-bonded ligands, at least one of these ligands being selected from the group consisting of η6-bonded arene ligands, η6-bonded triene ligands, η4-bonded 1,5-cyclooctadiene ligands and η4-bonded 1,3,5-cyclooctatriene ligands as a hydrosilylation catalyst.

Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.

The catalyst disclosed is a catalyst including palladium-ruthenium alloy fine particles in which palladium and ruthenium form a solid solution. The palladium-ruthenium alloy fine particles used in this catalyst can be produced by a production method including the step of maintaining a solution containing a protective agent, a reducing agent, a palladium compound or palladium ions, and a ruthenium compound or ruthenium ions at a temperature equal to or higher than a predetermined temperature.