Disclosed is a high-precision film thickness measuring
system and method. According to the
system, a film thickness meter, an oscillation bag, an
encoder and a
slip ring are mounted at the top of a rotating shaft of a workpiece frame outside a vacuum cavity, a
wafer probe, a
quartz crystal and a temperature sensor are mounted on the surface of the workpiece frame inside the vacuum cavity, signals of the
wafer probe and the temperature sensor are led out through a vacuum feed-in
flange, and the rotating shaft of the workpiece frame drives the components to rotate horizontally. The film thickness meter selects the
optimal test position of the
quartz crystal according to data of the
encoder, performs temperature calibration on the frequency of the
quartz crystal according to data of the temperature sensor, accurately calculates real film thickness by using the calibrated frequency, and realizes
data transmission with a static industrial
personal computer outside the cavity through the
slip ring. Therefore, accurate measurement of the film thickness during rotary
coating is realized, the influence of temperature is effectively eliminated, and reliable
data transmission between moving and non-moving components is ensured.