Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

54results about How to "Small contamination" patented technology

Disperse black and blue dye composition

The invention discloses a disperse black and blue dye composition which basically comprises the following components in percentage by weight: 20-80% of component A, 15-40% of component B, 1-35% of component C, 0-10% of component D and 0-5% of component E, wherein the component A is one or more than one of compounds represented by formula (I); the component B is a compound represented by formula (II); the component C is one or more than one of compounds represented by formula (III); the component D is one or more than one of compounds represented by formula (IV); and the component E is one or more than one of compounds represented by formula (V). The disperse black and blue dye composition provided by the invention has small contamination to spandex, excellent compatibility and high dye uptake rate, various fastnesses such as sunlight fastness, rubbing fastness, sublimation fastness and the like of dyeing on terylene / spandex fabrics are excellent, and especially the washing fastness isextremely good.
Owner:ZHEJIANG RUNTU

Ink jet printing apparatus

InactiveUS20050200649A1Stable print qualitySuppress generationPrintingEngineeringInkjet printing
An ink jet printing apparatus can prevent or suppress the generation, by a reaction liquid and ink, of a reaction product on the face surface of a discharge head, and can remove the ink, the reaction liquid or the reaction product adhering to the face surface so as to constantly maintain a stable printing quality. Immediately before a printing operation is initiated, an anti-coagulation liquid is sprayed on the face surface of a discharge head, and the discharge head performs the discharge operation (printing operation) with the anti-coagulation liquid applied to the face surface. When the printing operation has been completed, or when the printing of a predetermined amount of data has been performed, the face surface of the discharge head is wiped by blades to remove the ink and the reaction liquid. Since the anti-coagulation liquid is applied to the face surface in advance, the generation of the reaction product on the face surface is prevented or suppressed. Furthermore, even when a reaction product is adhered to the face surface, the coagulation of this product on the face surface can be prevented.
Owner:CANON KK

Stabilization in gamma-ray spectometry

A calibration source (20) for a gamma-ray spectrometer (40) is provided. The calibration source comprises a radioactive material (30) comprising a radioactive isotope having a decay transition associated with emission of a radiation particle and a gamma-ray having a known energy, e.g. Na-22, and a solid-state detector (26A, 26B), e.g. a PIN photodiode, arranged to receive radiation particles emitted from the radioactive material. A gating circuit (32) is coupled to the solid-state detector and is operable to generate a gating signal in response to detection of a radiation particle in the solid-state detector. The gating signal may thus be used as an indicator that an energy deposit in a nearby gamma-ray spectrometer is associated with a decay transition in the radioactive isotope. Since these energy deposits are of a known energy, they can be used as reference points to calibrate the spectrometer response. Thus with calibration sources according to embodiments of the invention, spectral stabilization (i.e. accounting for a changing spectrometer response, as well as base calibration) may be performed in real time and in parallel with obtaining a spectrum of observed signal events (i.e. the spectrum of interest). Furthermore, this is achieved with little contamination of the spectrum events of interest.
Owner:SYMETRICA

Recycled plastic material, electronic apparatus having the recycled plastic material, method of manufacturing plastic part, method of manufacturing the recycled plastic material, and method of reusing plastic material

A recycled plastic material is made from laser-engraved thermoplastic, metal-containing thermoplastic, thermoplastic used in an inkjet apparatus, or thermoplastic to which an ink or its composition have stuck. This recycled plastic material is manufactured by pulverizing any of these thermoplastics, cleaning the pulverized thermoplastic, removing a cleaning solution from the cleaned thermoplastic to dry it, and removing the dried thermoplastic solid matter other than the thermoplastic.
Owner:CANON KK

Low gain pressure relief valve for a fluid pump

ActiveUS20120248362A1Reduce gainPreserving good robustness against small particle contaminationCheck valvesEqualizing valvesMetallic materialsEngineering
A pressure relief valve for use in regulating discharge fluid pressure of a pump includes a casted, metal material housing including a passage therein along a longitudinal axis and inlet and outlet ports substantially perpendicular to the longitudinal axis and each having walls that are at an angle less than perpendicular to the longitudinal axis wherein the angle of the wall from being perpendicular to the longitudinal axis is substantially equal to the draft angle from the casting of the housing. A first wall of the outlet intersects with the wall of the passage of the pressure relief valve. A valve body disposed in the passage is movable in the passage against the biasing force of a spring biasing the valve body in a first or closed direction wherein the inlet port and the outlet port are disconnected, until the force at the inlet applied to the valve body overcomes the biasing Force of the spring and the inlet fluid is communicated through the passage and to the outlet. The housing includes a counterbore at the intersection of the wall of the passage and the wall of the outlet port to provide a counterbore surface that is perpendicular to the wall of the passage around the outer circumference of the valve body. The top end of the valve body includes a reduced diameter portion and a tapered portion between the reduced diameter portion and the top of the valve body.
Owner:HANON SYST EFP CANADA LTD

Gamma-Ray Spectrometry

A calibration source for a gamma-ray spectrometer is provided. The calibration source comprises a scintillator body having a cavity in which a radioactive material is received. The scintillator body may be generally cuboid and the cavity may be formed by a hole drilled into the scintillator body. The radioactive material comprises a radioactive isotope having a decay transition associated with emission of a radiation particle and a gamma-ray having a known energy e.g. Na-22. A photodetector, for example a silicon photomultiplier, is optically coupled to the scintillator body and arranged to detect scintillation photons generated when radiation particles emitted from the radioactive material interact with the surrounding scintillator bod. A gating circuit is arranged to receive detection signals from the photodetector and to generate corresponding gating signals for a data acquisition circuit of an associated gamma-ray spectrometer to indicate that gamma-ray detections in the gamma-ray spectrometer occurring within a time window defined by the gating signal are associated with a decay transition in the radioactive isotope. Thus a calibration source is provided based around a simple scintillator body design. Furthermore, the radioactive material may be introduced into the scintillator body in a separate step after manufacture of the scintillator body, thereby reducing the risk of radioactive contamination during manufacture.
Owner:SYMETRICA

Laboratory Incubator Having Improved Interior Humidification

The invention relates to a laboratory climatic cabinet, in particular a gassed incubator, having an interior enclosed by a housing and the steam generator arranged outside the interior, which is connected to the interior via a steam feed line. The steam generator is designed as an essentially unpressurized container having a base area and a steam region located above it, the base area being designed to accommodate a water reservoir and being provided with a heating device for heating the water reservoir, the steam feed line leaving the steam generator in the area of the steam region and an air feed line opening into the steam generator, in order to feed ambient air to the steam generator and to introduce air enriched with water steam via the steam feed line in essentially unpressurized form into the interior of the incubator.
Owner:THERMO ELECTRONICS LED GMBH

Preparation method of low-contamination lignosulfonate

The invention discloses a preparation method of low-contamination lignosulfonate. The method comprises the steps as follows: after precipitating slurrying waste liquor for 0.5-2 h, removing water insoluble matter and cellulose impurities by a filter; condensing the slurrying waste liquor by membrane filter equipment to increase the concentration of the slurrying waste liquor from 8wt%-15wt% to 15wt%-30wt%; putting a sulfonating agent accounting for 5wt%-40wt% of concentrated liquor and a condensing agent accounting for 5wt%-40wt% of concentrated liquor once, conducting a reaction at 70-100 DEGC for 1-6 h, and performing sulfonation and polycondensation on the concentrated liquor; adding 0-10wt% of a reaction reagent to the concentrated liquor after sulfonation and polycondensation reaction, and conducting a reaction at 40-80 DEG C for 1-5 h; performing spray drying by a hot blast stove reaction solution to obtain lignosulfonate powder with finer particles. The invention also relates to lignosulfonate prepared with the preparation method. The low-contamination lignosulfonate is prepared from the slurrying waste liquor, particularly soda process slurrying waste liquor, waste utilization is realized, and the lignosulfonate has high thermal stability, good dispersity and low contamination while environmental pollution is reduced.
Owner:SHANGHAI CHANGFA NEW MATERIAL CO LTD

Silicon wafer etching method and apparatus, and impurity analysis method

A wafer etching and impurity analysis method is presented in which a wafer is held in a vessel having gas introduction and exhaust ports, a solution including a mixture of hydrofluoric acid and nitric acid alone or together with sulfuric acid is bubbled with a carrier gas without being heated, which generates a gas containing vaporized hydrofluoric acid and nitric acid, and the inside of the vessel is purged so that the amount of gas supplied is kept constant at all times. All or a specific portion of the wafer is cooled to a specific temperature. Consequently, the gas is condensed on the surface of the wafer, which allows the required portion of the wafer to be etched. The method reduces the amount of liquid needed for residue recovery, the amount of admixed silicon during impurity analysis, and the concentration time.
Owner:SUMITOMO MITSUBISHI SILICON CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products