The invention relates to a double-layer sleeve type
corona plasma generating device comprising a gas buffering chamber, an outer-layer
processing chamber and an inner-layer
processing chamber. A gas inlet is provided on the outer side of the gas buffering chamber. An insulation baffle is provided on the inner side of the buffering chamber.
Airway through holes are provided on the baffle. Gas to be processed sequentially enters the outer-layer
processing chamber and the inner-layer processing chamber through the
airway through holes. When the gas is completely processed, the gas is discharged from a gas outlet connected to an end of the inner-layer processing chamber. According to the invention, with the buffering chamber, the gas to be processed can be uniformly and stably delivered in the processing chambers. The chambers adopt a coaxial multi-pin-plate structure, such that
electric field unevenness coefficient is high,
discharge voltage is low, and thus operation
energy consumption is reduced. Also,
voltage adjustable range is wide, and application scope is wide. With the inner-outer double layer structure,
low temperature plasma dedusting and
waste gas degradation are separated, such that the influence of dust in
waste gas to
waste gas molecule degradation is avoided, and energy
utilization rate is improved. Also, reactor structure is compact. The device provided by the invention is suitable for the fields such as waste gas treatment, sterilization and disinfection,
ozone synthesis, and the like.