Double-layer sleeve type corona plasma generating device
A plasma and generating device technology, applied in the field of ion generating devices, can solve the problems of high energy consumption for single-stage reactor processing, complex industrial waste gas composition, wide equipment footprint, etc., and achieves compact structure and electric field non-uniformity coefficient. The effect of large and small operating energy consumption
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0027] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0028] see Figure 1 to Figure 4 , a double-layer sleeve type corona plasma generating device of the present invention includes a metal base 18 and an outer metal sleeve 9 arranged on the metal base 18, and the top of the outer metal sleeve 9 is sequentially provided with insulating baffles 10 and an outer insulating shell 19, the center of the insulating baffle 10 is provided with a through hole, and a number of air passage holes 11 are evenly opened in the upper direction of the insulating baffle 10; the inner metal sleeve 8 passes through the insulating baffle The central through hole of the plate 10 is fixed on the insulating baffle 10, a number of needle electrodes 7 are arranged on the side wall of the inner metal sleeve 8, and the number of needle electrodes 7 are perpendicular to the side wall of the inner metal sleeve 8, The inner ground electrode 6...
PUM
Property | Measurement | Unit |
---|---|---|
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com