The invention relates to a device for producing novel
plasma photonic crystal with five refractive indexes and a method for producing the novel
plasma photonic crystal with five refractive indexes. The discharging condition is that the thickness of a discharging gap is 2.0mm, impressed
voltage is 3.5-5.1kV, frequency is 55-60kHz, discharging gas is 99.1%-99.9%Ar, the remainder is air, air gap pressure is 0.6-0.8atm, temperature range is 285-320K, and
humidity range is 70%-90%. According to the device and method, the conditions of the discharging gap, the impressed
voltage amplitude and frequency, the content of
argon and the like are changed, while the size of a water
electrode is optimized, a
temperature control adjusting device and a
humidity control adjusting device are added, and four types of
plasma channels formed by a plasma sheet, a thick
plasma column and two types of plasma columns are obtained. The novel plasma
photonic crystal structure with the five refractive indexes is formed by the plasma channels and a periodic arrangement self-organization in a non-discharging area. The novel plasma
photonic crystal structure is more complex and has wider application prospects.