Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for generating uniform and continuous discharge or plasma photonic crystals

A plasma and photonic crystal technology, which is applied in the field of plasma application technology and optics, can solve the problems of inconvenient control of photonic crystal parameters, difficult to precisely control the propagation of electromagnetic waves, complex structure, etc., and achieves easy large-scale industrial application and high economy. , the effect of reducing production costs

Active Publication Date: 2016-11-02
HEBEI UNIVERSITY
View PDF8 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, the plasma column generated by the third electrode is used on the basis of the microdischarge generated by the coaxial dielectric barrier device (Appl. Phys. Lett. 2005, 87, 241505) to form a plasmonic photonic crystal, but this device The structure is relatively complex, and it is not convenient to control the parameters of photonic crystals
Plasma photonic crystals generated by self-organized patterns in dielectric barrier discharge (invention patent with publication number CN105319611A), the plasma formed is in the form of pulses, so its photonic band gap changes with time, which is not easy to be accurate Controlling the propagation of electromagnetic waves

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for generating uniform and continuous discharge or plasma photonic crystals
  • Device and method for generating uniform and continuous discharge or plasma photonic crystals
  • Device and method for generating uniform and continuous discharge or plasma photonic crystals

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Embodiment 1, a device capable of generating uniform continuous discharge or plasma photonic crystal.

[0040] Such as figure 1 As shown, the device provided by the present invention includes a discharge mechanism, an air supply mechanism and a power supply mechanism.

[0041] The discharge mechanism in this embodiment includes three hollow needle electrodes 1 , a dielectric block 2 and a liquid electrode 3 . Three hollow needle electrodes 1 are vertically connected on the dielectric block 2 at equal intervals side by side, and the upper and lower ends of the hollow needle electrodes 1 are exposed outside the dielectric block 2. The material of the dielectric block 2 can be rubber or polytetrafluoroethylene, etc. . The material of the hollow needle electrode 1 can be metal materials such as tungsten, copper or iron; the inner diameter of the hollow needle electrode 1 is 0.5-2mm, which can be selected according to the specific needs. The lower end of the hollow needle...

Embodiment 2

[0047] Embodiment 2, a method for generating uniform and continuous discharge.

[0048] The devices used in the method for generating uniform and continuous discharge in this embodiment are as described in Embodiment 1.

[0049] First follow figure 1 Connect the parts as shown. The dielectric tube 7 used in this embodiment has a length of 10 cm and an inner radius of 1 cm. The inner diameters of the three hollow needle electrodes 1 inserted on the dielectric block 2 are all 0.5 mm, and the distance between two adjacent hollow needle electrodes 1 is 5 mm. Both the upper end and the lower end of the hollow needle electrode 1 are exposed 2 cm outside the dielectric block 2 . The liquid contained in the open container 4 is tap water, the open container 4 is a beaker with an inner radius of 4 cm, and the horizontal plane of the liquid electrode 3 is circular. The material of the dielectric block 2 is rubber, and the material of the dielectric tube 7 is glass. The three high-vo...

Embodiment 3

[0053] Embodiment 3, a method for producing plasmonic photonic crystals.

[0054] This embodiment is carried out on the basis of embodiment 2. In this embodiment, the argon gas is contained in the gas cylinder 11, and the gas valve 10 is opened, so that the argon gas in the gas cylinder 11 enters the hollow needle electrode 1 through the gas supply pipeline 12 and the dielectric tube 7, and is discharged from the hollow needle electrode 1. The lower end sprays out. Plasma photonic crystals can be generated between the discharge end of the hollow needle electrode 1 and the level of the liquid electrode 3 . The flow rate of argon gas passed into the dielectric tube 7 is controlled at 4 L / min by a flow meter 8 .

[0055] The discharge photo of the plasma photonic crystal produced by argon gas in this embodiment is as follows Figure 4 shown. It can be seen that three periodically arranged plasmonic columns can be generated between the discharge end of the hollow needle electr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Resistanceaaaaaaaaaa
The inside diameter ofaaaaaaaaaa
Login to View More

Abstract

The invention provides a device and a method for generating uniform and continuous discharge or plasma photonic crystals. The device comprises a discharge mechanism, a gas supply mechanism and a power supply mechanism. The discharge mechanism includes a hollow needle electrode, a dielectric block, and a liquid electrode. The hollow needle electrode is vertically inserted into the dielectric block and is connected with a gas cylinder in the gas supply mechanism through a dielectric tube. The liquid electrode is located below the hollow needle electrode. The hollow needle electrode is electrically connected with the high-voltage output end of a high-voltage DC power supply in the power supply mechanism. The liquid electrode is connected with a ground wire. According to the technical scheme of the invention, only the air in the atmospheric environment is used as a working gas, and the uniform and continuous discharge can be generated between the two electrodes. When an inert gas is introduced into the hollow needle electrode through the dielectric tube, periodically arranged plasma photonic crystals can be generated between the two electrodes. The device utilizes different working gases to generate uniform and continuous discharge or plasma photonic crystals at the atmospheric pressure. Therefore, the diversification of functions is realized.

Description

technical field [0001] The invention relates to the field of plasma application technology and optical technology, in particular to a device and method capable of generating uniform continuous discharge or plasma photonic crystal. Background technique [0002] The non-equilibrium plasma generated by atmospheric pressure gas discharge has a wide range of application prospects, such as sterilization, wound healing, cancer treatment, etc. in the medical field; material growth, surface modification, and integrated circuit etching in the industrial field , sewage purification, etc.; used in the military field for aircraft drag reduction, aircraft stealth, etc. [0003] In recent years, how to generate large-area uniform and continuous discharge in the atmospheric environment has been a research hotspot in low-temperature plasma sources. Dielectric barrier discharge can produce a large area of ​​uniform discharge, but the discharge is unstable, and it is easy to transition to une...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H05H1/24H01J37/32
CPCH01J37/32348H01J37/3244H01J37/32532H05H1/2406
Inventor 李雪辰张盼盼贾鹏英
Owner HEBEI UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products