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Apparatus and method for generating three-layer plasma photonic crystal

A plasma and photonic crystal technology, which is applied in the field of plasma application technology and optics, can solve the problems of limited application fields and application prospects, limited wavelength bands, and insufficient modulation methods, so as to achieve diversified modulation of beams, widened wavelength bands, and a wide range of Effects of application areas and application prospects

Inactive Publication Date: 2016-01-06
HEBEI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, their modulation of light still has great restrictions on the wavelength band, and the modulation method is not wide enough, so it is limited in application fields and application prospects.

Method used

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  • Apparatus and method for generating three-layer plasma photonic crystal
  • Apparatus and method for generating three-layer plasma photonic crystal
  • Apparatus and method for generating three-layer plasma photonic crystal

Examples

Experimental program
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Embodiment 1

[0035] like figure 1 As shown, the device for producing three layers of plasma photonic crystals provided by the present invention is to symmetrically arrange two airtight dielectric containers in a horizontal cylindrical vacuum reaction chamber 1, and inject water into the airtight dielectric containers to form two Water electrode6. The two water electrodes 6 are electrically connected to a plasma generating power source 7 . The water electrode 6 is made of a plexiglass tube which is sealed by quartz glass baffles 3 at both ends. The plexiglass tube is filled with water, and a copper ring 2 is set in the plexiglass tube. The two copper rings 2 are respectively electrically connected to the positive pole and the negative pole of the plasma generation power supply 7 outside the vacuum reaction chamber 1 through power lines. The thickness of the quartz glass block 3 is between 0.1 mm and 5 mm.

[0036] The space between the two water electrodes 6 is a discharge gap 10 , and t...

Embodiment 2

[0040] The method for producing three layers of plasma photonic crystal provided by the present invention comprises the following steps:

[0041] a. A vacuum reaction chamber 1 is provided, an air inlet 8 and an air outlet 9 are provided on the wall of the vacuum reaction chamber 1 , and two water electrodes 6 are installed in the vacuum reaction chamber 1 . The water electrode 6 adopts a plexiglass tube sealed with quartz glass baffles 3 on both sides and filled with water, and a built-in copper ring 2 is electrically connected with the plasma generating power supply 7 .

[0042] b. Between the two water electrodes 6, three frames 4 with different thicknesses are arranged side by side as the boundary of the discharge gap, and the thickness of the frames 4 is between 1 mm and 10 mm; a dielectric plate is arranged between two adjacent frames 4 5. Two dielectric plates 5 divide the discharge gap 10 into a three-layer structure. The frame 4 and the dielectric plate 5 are respect...

Embodiment 3

[0047] Compared with Example 2, the specific experimental parameters of this embodiment are: the thickness of the quartz glass baffle 3 is 1.5 mm, the thickness of the quartz dielectric plate 5 is 1 mm, and the thicknesses of the three quadrangular glass frames 4 are respectively 2 mm, 2 mm and 1 mm from left to right. 4mm and 1mm, the vacuum reaction chamber 1 is pure air, the air pressure is 0.4 atmospheres, the frequency of the plasma generating power supply 7 is 60kHz, and the peak voltage is 5.2kV.

[0048] The pattern photo (i.e. the end view) and the side view of the three-layer plasmonic photonic crystal produced in this embodiment are respectively as follows figure 2 and image 3 shown. Depend on figure 2 It can be seen that the bright spots are arranged in a hexagonal structure, and there is a bright spot in the center of each hexagon; the dark spots are distributed around each bright spot, and the dark spots are also arranged in a hexagonal structure; the diamet...

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Abstract

The invention provides an apparatus and a method for generating a three-layer plasma photonic crystal. The apparatus comprises a vacuum reaction chamber, two water electrodes arranged in the vacuum reaction chamber, and a plasma generation power supply electrically connected with the water electrodes, three frames serving as discharging gap boundaries and with different thicknesses are arranged between the two water electrodes side by side, dielectric plates are arranged between two adjacent frames, and the frames and the dielectric plates are respectively vertical to the axes of the two water electrodes. By employing the apparatus, the three-layer plasma photonic crystal with different symmetries is firstly realized; the three-layer plasma photonic crystal can modulate light beams via one layer of the plasma photonic crystal, or modulate the light beams via two adjacent layers of the plasma photonic crystal together, or modulate the light beams via three layers of the plasma photonic crystal together; and the modulation of the light beams is more diversified, and the waveband of the modulated light beams is widened.

Description

technical field [0001] The invention relates to a plasma application technology and an optical technology, in particular to a device and a method for producing a three-layer plasma photonic crystal. Background technique [0002] Photonic crystals, also known as photonic bandgap materials, are an artificial "crystal" structure formed by arranging two dielectric materials with different dielectric constants in space at a certain period (the size is on the order of the wavelength of light). The dielectric constant of a photonic crystal is a periodic function of space. If the periodic modulation of photons by the dielectric coefficient is strong enough, the photon energy propagating in the photonic crystal will also have an energy band structure, and photon "forbidden" will appear between the bands. band", photons whose frequency falls in the forbidden band cannot propagate in the crystal. The position and shape of the photonic forbidden band depend on the refractive index rati...

Claims

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Application Information

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IPC IPC(8): G02B6/136H05H1/24
CPCG02B6/136H05H1/24
Inventor 董丽芳冯建宇魏领燕杨京
Owner HEBEI UNIVERSITY
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