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Method for producing three-dimensional plasma photon crystal

A technology of plasma and photonic crystals, which is applied in the field of ionic materials and optics, can solve problems such as failure to form three-dimensional plasma photonic crystals, achieve rich lattice structures and energy level band gaps, wide application fields, and high selectivity strong effect

Inactive Publication Date: 2017-06-13
HEBEI UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for producing three-dimensional plasmonic photonic crystals, to solve the problem of failing to form three-dimensional plasmonic photonic crystals in the prior art

Method used

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  • Method for producing three-dimensional plasma photon crystal
  • Method for producing three-dimensional plasma photon crystal
  • Method for producing three-dimensional plasma photon crystal

Examples

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Effect test

Embodiment 1

[0024] Embodiment 1, a method for producing a three-dimensional plasmonic photonic crystal.

[0025] For the device used in this example, see figure 1 (You can also refer to the prior patent application number 201510878651.5), the method for producing a three-dimensional plasmonic photonic crystal includes the following steps:

[0026] a. A vacuum reaction chamber 1 is provided, an air inlet 10 and an air outlet 11 are provided on the wall of the vacuum reaction chamber 1 , and two water electrodes 2 are installed in the vacuum reaction chamber 1 . The water electrode 2 adopts a plexiglass tube sealed with glass baffles 3 on both sides and filled with water, and a built-in copper ring 4 is electrically connected to the plasma generating power supply 5 .

[0027] b. Between the two water electrodes 2, three layers of left, middle and right layers of glass are sequentially stacked and laminated. On the three layers of glass, a discharge gap 9 with a cavity cross-section in an H...

Embodiment 2

[0039] The present embodiment is compared with embodiment 1, and concrete experimental parameter is: the structure of three layers of glass is figure 1 In the structure shown, the thickness of the three layers of glass is 1.4mm. In the discharge gas in the vacuum reaction chamber 1, the volume content of argon accounts for 5% of the total volume of the discharge gas. The pressure of the discharge gas is 0.12 standard atmospheric pressure, the discharge frequency of the plasma generating power supply 5 is 54kHz, and the effective value of the discharge voltage is 2.72kV.

[0040] The pattern photos of the three-dimensional plasmonic photonic crystals in which straight and oblique plasmonic photonic crystals coexist in the discharge gap produced in this embodiment are as follows image 3 shown. image 3 Among them, the plasmonic photonic crystals at the middle horizontal position (corresponding to the single air gap position) and the plasmonic photonic crystals at the upper an...

Embodiment 3

[0042] Compared with Embodiment 2, this embodiment differs in that: the effective value of the discharge voltage of the plasma generating power supply 5 is 2.36 kV.

[0043] The pattern photos of the three-dimensional plasmonic photonic crystals in which straight and oblique plasmonic photonic crystals coexist in the discharge gap produced in this embodiment are as follows Figure 4 shown. Figure 4 The three-dimensional plasmonic photonic crystal shown in image 3 Similar to the three-dimensional plasmonic photonic crystal in .

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Abstract

The invention provides a method for producing a three-dimensional plasma photon crystal. The method comprises the steps that two water electrodes are installed in a vacuum reaction chamber, three layers of laminated glass are arranged between the water electrodes, and a discharge gap with a cavity cross section of an H-shaped structure is formed in the three layers of glass; air and argon mixed gas is injected into the vacuum reaction chamber, gas content, gas pressure, discharge frequency and discharge pressure are adjusted, and the three-dimensional plasma photon crystal consisting of straight and oblique plasma photon crystals can be produced at the H-shaped discharge gap. The oblique plasma photon crystal is found for the first time. The energy band structure and band gap width of the three-dimensional plasma photon crystal consisting of straight and oblique plasma photon crystals are richer and can be controlled in a tuned mode, the research blank of the three-dimensional plasma photon crystal is filled, wave bands of modulation light beams are further widened, and diversified, convenient and efficient light beam modulation is achieved.

Description

technical field [0001] The invention relates to the field of plasma application technology and optical technology, in particular to a method for producing a three-dimensional plasma photonic crystal. Background technique [0002] As a new type of photonic crystal, plasmonic photonic crystal is a periodic structure formed by the periodic distribution of the density of plasma itself or interlaced with other dielectric materials. It not only has the characteristics of conventional photonic crystals such as photon band gap and photon localization, but also has special properties such as anomalous refraction and special frequency band relationship due to the existence of plasma (dispersion characteristics and dissipation characteristics). In particular, by adjusting the external drive, changing the time or space parameters of the plasma, the control of the energy band structure of the plasma photonic crystal can be realized, and then the propagation of electromagnetic waves of di...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00H05H1/24
CPCG02B1/005H05H1/2406
Inventor 董丽芳高星
Owner HEBEI UNIVERSITY
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