126 results about "Fluoromethane" patented technology

A rechargeable lithium cell comprising a cathode, an anode, an optional ion-permeable membrane disposed between the anode and the cathode, a non-flammable salt-retained liquefied gas electrolyte in contact with the cathode and the anode, wherein the electrolyte contains a lithium salt dissolved in or mixed with a liquefied gas solvent having a lithium salt concentration greater than 1.0 M so that the electrolyte exhibits a vapor pressure less than 1 kPa when measured at 20° C., a vapor pressure less than 60% of the vapor pressure of the liquefied gas solvent alone, a flash point at least 20 degrees Celsius higher than a flash point of the liquefied gas solvent alone, a flash point higher than 150° C., or no flash point, wherein the liquefied gas solvent is selected from methane, fluoromethane, difluoromethane, chloromethane, dichloromethane, ethane, fluoroethane, difluoroethane, tetrafluoroethane, chloroethane, dichloroethane, tetrachloroethane, propane, fluoropropane, chloropropane, ethylene, fluoroethylene, chloroethylene, or a combination thereof.

A method of etching a barrier layer in an integrated circuit (IC) wherein said barrier layer is composed of silicon nitride or silicon carbide. The method comprises receiving an etched IC structure having an exposed barrier layer. The method then proceeds to apply an etchant gas mixture comprising a nitrous oxide (N2O) gas and a fluoromethane (CH3F) gas. The etchant gas mixture provides a relatively high selectivity between the barrier layer to an adjacent dielectric layer.

The invention provides a method for preparing ultrapure fluoromethane through an adsorption process. Impurities in crude fluoromethane are removed by adopting A-type molecular sieve and / or active carbon with the particle size of 1.5-3.0mm, and the A-type molecular sieve and active carbon are activated before use. Highly pure fluoromethane with the purity of above 99.99 even 99.9999% can be obtained through the preparation method, and the prepared ultrapure fluoromethane can be used in the semiconductor / electron industry as an etching gas.

The invention discloses a mixed working medium containing fluoroethane and trifluoroethylene, and belongs to the field of power engineering and engineering thermophysics. The mixed working medium containing fluoroethane and trifluoroethylene comprises the first component trifluoroethylene and the second component fluoroethane, and other one or two compounds must be mixed into the first component trifluoroethylene and the second component fluoroethane. When a ternary mixture is formed, any one of pentafluoroethane, difluoromethane, trifluoroiodomethane and hexafluoropropylene needs to be added;when a quaternary mixture is formed, two of pentafluoroethane, difluoromethane, trifluoroiodomethane, hexafluoropropylene, propane and dimethyl ether need to be added, but any two of propane, dimethyl ether and difluoromethane are not added at the same time. Compared with R-404A, the greenhouse effect potential of the multi-component mixed working medium provided by the invention is greatly reduced. The condensation pressure of the mixed working medium is equivalent to that of the R-404A, and the mixed working medium has the technical advantage that main related systems or components of the current R-404A continue to be used. Compared with the R-404A, the mixed working medium has higher heat conduction capacity and lower flow resistance, and further optimization and improvement of a heatexchanger are facilitated. The refrigeration cycle performance coefficient of the mixed working medium is higher than that of the R-404A, and the energy-saving significance is achieved.

The invention relates to a test chamber (10) for conditioning air, comprising a test space (12) for holding test material, which test space, with respect to surroundings, can be closed off and is temperature-isolated, and comprising a temperature-control device (11) for the temperature control of the test space. A temperature in a temperature range of -80 DEG C to +180 DEG C, preferably -100 DEG Cto +200 DEG C, can be formed within the test space by means of the temperature-control device. The temperature-control device has a cooling device (16). Said cooling device has a cooling circuit (17)having a refrigerant, a heat exchanger (18), which is arranged in the test space, a compressor (19), a condenser (20), and an expansion element (21). The refrigerant is a nearly azeotropic and / or zeotropic refrigerant mixture of a mass fraction of carbon dioxide and a mass fraction of at least one of the components ethane, ethylene, hexafluoroethane, pentafluoroethane, monofluoroethane, 1,1-difluoroethylene, fluoromethane, and / or propane and / or xenon, wherein the refrigerant has a global warming potential<sb / >, with respect to 20 years, of < 3000, preferably < 500, especially preferably < 10.

The invention discloses a method for preparing high purity tetrafluoromethane through combination of rectification and adsorption. The method is mainly characterized in that: equipment for generating tetrafluoromethane continuously supplies the tetrafluoromethane, and fluorochloromethane and potassium bifluoride are subjected to gas-phase reaction to form the tetrafluoromethane. In the method for preparing the high purity tetrafluoromethane, a raw material preparation system, a tetrafluoromethane gas preparation system and a liquefying and gasifying system for the tetrafluoromethane purified through combination of rectification and adsorption. The method has the advantages that: the product has high yield and high purity (99.0-99.9 percent), has a few impurities which are easy to separate; and besides the product, other harmful and toxic byproducts are absent, the operation is convenient, and the method is an ideal technology for preparing the high purity tetrafluoromethane.

A group of known refrigerants, (R-227ea, R-124, R-134a, R-143a, R-125, R-E125, R-E143a, R-E227ca2, R-254cb, R-600a, R-142b, R-22, R-290, R-E170, R-1270, R-1216, R-218, R-C318, R-C270), that may be combined in novel ways to produce several excellent “drop-in” substitutes for refrigerants R-12 or R-500. The performance of the preferred “drop-in” substitutes for R-12 or R-500 of the present invention often exceeds that of the refrigerant being replaced, while maintaining acceptable oil circulation with existing mineral oils used in R-12 or R-500 refrigeration and air conditioning systems.

To provide a method for efficiently producing HFC-41 having high purity and usable as an etching gas for semiconductor and provide a product produced by the method. The method for producing fluoromethane comprises reacting methyl chloride with hydrogen fluoride in gaseous phase in the presence of a fluorination catalyst to obtain a mixture containing the fluoromethane and hydrogen chloride, introducing the mixture into a distillation column, separating the fluoromethane and hydrogen chloride as a column top fraction and purifying the fluoromethane.