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161results about How to "Uniform intensity distribution" patented technology

Optical system with laser beam uniform irradiation

An optical system with laser beam uniform irradiation, comprises: a wave-guide space-dividing a laser beam from a light source into divided beams; a superposition lens by which the divided beams are superposition-irradiated on an irradiation face; a delay plate by which beam intensity on the irradiation face is uniform. The wave-guide makes width of the divided beams more than 1 / 2 times large of a space interference distance on a laser beam section; the delay plate makes a delay of the adjacent divided beams longer than an interference distance of the time of the laser beam, and reduces interference on the irradiation face. An other optical system comprises: a laser beam dividing component for dividing the laser beam into divided beams; a superposition-irradiation component for superposition-irradiating the divided beams on the irradiation face; a homogenization component for homogenizing beam intensity on the irradiation face. The homogenization component includes an optical delay component which makes a delay of the adjacent divided beams longer than an interference distance of the time of the laser beam, a light rotation component which makes polarization directions of the adjacent divided beams actual orthogonal.
Owner:MITSUBISHI ELECTRIC CORP

Charged-particle beam exposure apparatus and method

This invention makes it possible to provide a charged-particle beam exposure apparatus which implements highly accurate pattern drawing by detecting the intensity distribution of irradiation charged-particle beams and controlling the distribution to be uniform. The charged-particle beam exposure apparatus splits a charged-particle beam irradiated from a charged-particle beam source into a plurality of charged-particle beams by a plurality of apertures formed in an aperture array (3a). The charged-particle beam exposure apparatus includes a detection unit which detects the intensity of the charged-particle beam passing through the aperture formed in the aperture array (3a), and a grid array which adjusts the intensity of the charged-particle beam on the basis of the detection result obtained by the detection unit. The charged-particle beam exposure apparatus makes the intensity distribution of the charged-particle beams which reach a wafer (5) through the plurality of apertures uniform.
Owner:CANON KK

Image display aparatus

An image display apparatus including a liquid crystal display unit having a display surface and rear surface facing a display surface, a light conducting plate having a front surface, a bottom surface facing the front surface, and a side end surface perpendicular to the front surface and the bottom surface, the light conducting plate being arranged to face the rear surface of the liquid crystal display unit, the front surface of the light conducting plate facing the rear surface of the liquid crystal display unit, wherein the light conducting plate has a reflective sheet on the bottom surface, wherein incident light from a side end surface of the plate is reflected on the reflective sheet on the bottom surface so as to be conducted toward the front surface, and an LED element that has a light emitting surface facing the side end surface of the light conducting plate, for radiating light from the light emitting surface to the side end surface, wherein the LED element is arranged in the manner that the central axis of the light emitting surface of the LED element is shifted onto either of the bottom surface side or the front surface side of the light conducting plate from the middle surface of the light conducting plate between the front surface and the bottom surface of the light conducting plate.
Owner:PANASONIC CORP
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