The invention discloses a
planar magnetron sputtering target, which is composed of a
flange, a pressing sleeve, a water cylinder, an
excitation coil, an electrical pure iron sleeve, an insulating sleeve, a water
nozzle, a pressure plate, a
set screw, an electrical pure iron pressure rod, a sealing ring, a
gasket, an insulating cover, a pressing ring, bolts, an insulating spacer sleeve, a shielding cover, slotted countersunk head screws, a compressing ring, a
neodymium iron
boron permanent
magnet column, and a positioning bracket part. The
planar magnetron sputtering target is unique in shielding cover design, structural arrangement of the
excitation coil, electrical pure iron sleeve and permanent
magnet,
magnetic field adjustability of the magnetron
sputtering target, cooling structure design and other aspects, solves the common defects of point
discharge, low sputtering rate on magnetic materials, complex cooling structure and the like frequently encountered by magnetron sputtering targets, and improves the target material
utilization rate. The
planar magnetron sputtering target provided by the invention has the characteristics of simple structure, stable and reliable work, large
magnetic field adjustable range, high sputtering efficiency, convenient maintenance and low cost, and can be widely applied to vacuum magnetron sputtering
coating equipment.