A planar magnetron sputtering target
A magnetron sputtering and planar technology, which is applied in the field of planar magnetron sputtering targets, can solve the problems of low utilization rate of magnetron sputtering targets, and achieve the advantages of avoiding magnetic short circuit, improving utilization rate, and large magnetic field adjustment range Effect
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Embodiment 1
[0035] A planar magnetron sputtering target, which is characterized in that it is composed of a flange 1, a pressure sleeve 2, a water-passing cylinder 3, an excitation coil 4, an electrical pure iron sleeve 5, an insulating sleeve 6, a water nozzle 7, a pressure plate 8, Set screw 9, electrician pure iron pressure rod 10, sealing ring 11, washer 12, insulating sleeve 13, pressure ring 14, bolt 15, insulating spacer 16, shielding cover 17, slotted countersunk screw 18, compression ring 19 , NdFeB permanent magnet column 20 and positioning bracket 21, in which the large end of the positioning bracket 21 is horizontally placed in the circular deep groove in the center of the flange 1; the electrical pure iron sleeve 5 and the positioning bracket 21 are fixed In the circular deep groove in the center of the flange 1; the neodymium iron boron permanent magnet column 20 is stacked in the insulating sleeve 6, one end of the neodymium iron boron permanent magnet column 20 is inserted i...
Embodiment 2
[0050] A plane magnetron sputtering target, the structure is the same as that in Example 1.
[0051] among them:
[0052] ①The insulating sleeve and insulating spacer are processed by polytetrafluoroethylene. Both the insulating sleeve and the insulating spacer are in the shape of a through-bottom, secondary stepped cylindrical cylinder. The total height of the insulating sleeve is 21.5mm, the center hole diameter is Φ6mm, the outer diameter of the small end cylinder is Φ10mm, and the outer diameter and height of the big end cylinder are Φ20mm and 3.5mm respectively. The total height of the insulating spacer is 35mm, the center hole diameter is Φ132mm, the outer diameter of the small end cylinder is Φ150mm, and the outer diameter and height of the big end cylinder are Φ175mm and 5mm respectively.
[0053] ②The pressure ring is processed by phenolic resin, the pressure ring is ring-shaped, its inner diameter and outer diameter are respectively Φ146mm and Φ205mm, the height is 8mm, wi...
Embodiment 3
[0064] A plane magnetron sputtering target, the structure is the same as that in Example 1.
[0065] among them:
[0066] ①The insulating sleeve and insulating spacer are processed by polytetrafluoroethylene. Both the insulating sleeve and the insulating spacer are in the shape of a through-bottom, secondary stepped cylindrical cylinder. The total height of the insulating sleeve is 21.5mm, the center hole diameter is Φ6mm, the outer diameter of the small end cylinder is Φ10mm, and the outer diameter and height of the big end cylinder are Φ20mm and 3.5mm respectively. The total height of the insulating spacer is 35mm, the center hole diameter is Φ132mm, the outer diameter of the small end cylinder is Φ150mm, and the outer diameter and height of the big end cylinder are Φ175mm and 5mm respectively.
[0067] ②The pressure ring is processed by phenolic resin, the pressure ring is ring-shaped, its inner diameter and outer diameter are respectively Φ146mm and Φ205mm, the height is 8mm, wi...
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