The invention provides a deep-ultraviolet lithography illumination system which comprises a deep-ultraviolet laser source, a cylindrical beam expander sub-system, a spherical beam expander sub-system, a compound eye light evening sub-system, a condenser sub-system, a round diaphragm and an aperture diaphragm, wherein the order of the components along the advancing direction of the laser path is as follows: the deep-ultraviolet laser source, the cylindrical beam expander sub-system, the round diaphragm, the spherical beam expander sub-system, the compound eye light evening sub-system, the aperture diaphragm and the condenser sub-system; the aperture diaphragm is located on the front focal surface of the condenser sub-system; and the centers of the components are superposed with the center of a laser beam. The deep-ultraviolet lithography illumination system provided by the invention adopts a simple spherical and cylindrical structure, and can meet the requirements of a lithography illumination system.