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51 results about "Phase shifting interferometry" patented technology

Phase shifting interferometry is a well-established technique for areal surface characterisation that relies on digitisation of interference data acquired during a controlled phase shift, most often introduced by controlled mechanical oscillation of an interference objective.

Surface plasmon resonance shifting interferometry imaging system for biomolecular interaction analysis

A novel surface plasmon resonance (SPR) imaging system based on modified Mach-Zehnder phase-shifting interferometry (PSI) measures the spatial phase variation of a resonantly reflected light during chemical or biological detection. The SPR microarray can diagnose the target analyte without additional labeling in the real-time analysis. Experimental results demonstrate that the detection limit of the SPR PSI imaging system is improved to about 1 pg / mm<2 >surface coverage of chemical or biological material for each individual spot over that of the conventional SPR imaging system. Therefore, the SPR PSI imaging system and its SPR microarray can provide the capability of real-time analysis, with high resolution and at high-throughput screening rates.
Owner:U VISION BIOTECH

System for in vivo analysis of tear film in the human eye via phase shifting interferometry

An in vivo method of characterizing dynamic tear films has been developed using a near infrared phase-shifting interferometer. This interferometer continuously measures light reflected from the tear film, allowing precision analysis of the dynamic surface topography. Movies showing the tear film behavior may be generated along with quantitative metrics describing the tear film surface as it changes in time.
Owner:THE ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIV OF ARIZONA +1

Photo-etching machine projection objective wave aberration on-line detection method

The invention relates to an on-line detection method for detecting the wave aberration of a projection objective of a photoetching machine. The on-line detection, revising, and controlling are done to the wave aberration of the projection objective by integrating an interferometer device on the photoetching machine. The interferometer device is a point-diffraction interferometer or a slit-diffraction interferometer and is provided with two measuring modules: a PSI measuring module and an FTM measuring module. The PSI measuring module adopts phase shifting interferometry with high measuring precision and is mainly used to detect the error calibration in an interferometer device system; the FIM measuring module adopts fourier transform method to treat with interference fringes with high measuring speed, and is mainly used to on-line detect and control the wave aberration of the projection objective. The method improves the measuring precision without reducing the measuring speed, and improves the measuring precision and reproducibility of the interferometer device by adopting a higher quality spherical reference wave to calibrate the systematic error caused by each component of the interferometer device without reducing the contrast ratio of the interference fringes.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Optical freeform surface interference detection system

The invention discloses an optical freeform surface interference detection system. A point light source array is adopted to generate a multi-field-of-view sloped wavefront to illuminate a measured optical freeform surface, the point light sources located on the optical axis are always lit up as reference light, and according to the phase-shifting interferometry, subregion wavefront data are recovered from a multi-field-of-view interferogram; a standard spherical surface is used for calibrating the positional relation between CCD (Charge Coupled Device) pixels and the multi-field-of-view interferogram, the position of the multi-field-of-view interferogram is shifted when the optical freeform surface is measured, and wavefront slope information is obtained from the offset; and according to the slope information and multi-field-of-view subregion wavefront data, the surface form information of the measured surface is reconstructed. A controllable point light source array-lighting scheme is generated according to the characteristics of the measured surface, and the system can cover a variety of test objects (convex-concave aspheric surfaces and freeform surfaces). The invention overcomes the defects of simplicity and high cost of the conventional freeform surface detection method, the defect of great error caused by the non-common path in the conventional detection method and the defect of high displacement precision requirement of the subaperture method.
Owner:NANJING UNIV OF SCI & TECH

Coaxial Fizeau synchronous phase shifting interferometer capable of adjusting extended light illumination

The invention relates to a coaxial Fizeau synchronous phase shifting interferometer capable of adjusting extended light illumination and belongs to the field of an optical interference measuring device. The coaxial Fizeau synchronous phase shifting interferometer comprises an extended light source assembly, a fronting Michelson type interferometer assembly and a Fizeau main interferometer. In the invention, the fronting interferometer assembly is adopted to generate two illumination light waves of orthogonal polarization state; polarization phase shifting interferometry between a measured surface and a reference surface is realized through match of spatial coherence of the fronting interferometer and the main interferometer; and an additional fringe is removed by using the characteristic of a short coherent optical length of an extended light source space. The coaxial Fizeau synchronous phase shifting interferometer has the characteristics of long measuring distance, continuous and adjustable contrast ratio, continuous and adjustable coherent optical length, easy operation, lower error requirement on a high frequency surface shape of the reference surface and the like; and the coaxial Fizeau synchronous phase shifting interferometer can be used in the fields of high precision detection of an optical element, optical element on-line detection and super-smooth surface detection and the like.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Dual-wavelength phase-shift interference-based method for measuring optical heterogeneity

InactiveCN102252823AAutomatically eliminate errorsTesting optical propertiesPhase differenceRefractive index
The invention discloses a dual-wavelength phase-shift interference-based method for measuring optical heterogeneity, wherein according to dispersion characteristics of a material, an interferometer which comprises two lasers with different optical wavelengths or a wavelength tunable laser is adopted, and refractive index heterogeneity of a sample to be measured under optical waves of two wavelengths is considered as the same as optical heterogeneity to be measured of the sample to be measured; a phase-shift interferogram of the sample to be measured under the optical waves of the two wavelengths before being put into the interferometer, and a phase-shift interferogram of the sample to be measured under the optical waves of the two wavelengths after being put into the interferometer are obtained by using phase-shifting interferometry;and physical light wave phase difference of the sample to be measured under the optical waves of the two wavelengths before / after being put into the interferometer is obtained by using a phase-shift interference phase recovery algorithm, and then the optical heterogeneity of the sample to be measured is obtained. According to the dual-wavelength phase-shift interference-based method for measuring the optical heterogeneity, system errors are automatically eliminated, the sample to be measured does not need to be adjusted during a process of measuring, no special requirements for surface shape, parallelism and machining accuracy of a front and a rear surfaces of the sample to be measured exist, thus the dual-wavelength phase-shift interference-based method for measuring the optical heterogeneity is a genuine absolute measuring method and has high measuring accuracy.
Owner:SHANDONG UNIV

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry

Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and / or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and / or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
Owner:CARL ZEISS SMT GMBH

Real-time observation method of crystal growing surface microstructure

InactiveCN101561401AThe working principle is simple and reliableHigh degree of automationMaterial analysis by optical meansPlane mirrorFizeau interferometer
The invention relates to the technical field of real-time quantitative test and analysis of a surface microstructure in the process of crystal growth by a solution method in the 3-D direction and belongs to a method of real-time observation of water-soluble crystal and organic crystal growing surface microstructures by adopting a laser digital phase-shifting interferometer system device. The invention is characterized in that a Fizeau interferometer is introduced into an interference light path; one of two reference plane mirrors in the Fizeau interferometer is replaced by a growing crystal surface so as to ensure laser reflected by the reference plane mirrors and the growing crystal surface to interfere so as to lead interference fringes to contain information of the crystal growing surface; phase shifting interferometry is applied to extract the information of the crystal growing surface structure and then contour maps and three dimensional perspective images of the crystal growing surface are obtained by computation and analysis of computer software to realize real-time observation. The method has simple and reliable working principle, high degree of automation of used equipment, good real-time observation effect and strong image intuition, which particularly can convert the process of crystal growth to display information in omni direction.
Owner:QINGDAO UNIV

Error compensation in phase shifting interferometry

In certain aspects, disclosed methods include combining reference light reflected from a reference surface with test light reflected from a test surface to form combined light, the test and reference light being derived from a common source, sinusoidally varying a phase between the test light and reference light, where the sinusoidal phase variation has an amplitude u, recording at least one interference signal related to changes in an intensity of the combined light in response to the sinusoidal variation of the phase, determining information related to the phase using a phase shifting algorithm that has a sensitivity that varies as a function of the sinusoidal phase shift amplitude, where the sensitivity of the algorithm at 2 u is 10% or less of the sensitivity of the algorithm at u.
Owner:ZYGO CORPORATION

Device and method for measuring gas film gap of dynamic pressure motor on basis of simultaneous phase shifting interferometry

The invention discloses a device and method for measuring a gas film gap of a dynamic pressure motor on the basis of the simultaneous phase shifting interferometry and relates to a device and method for measuring the gas film gap of the dynamic pressure motor. The invention solves the problems of a short measurement working distance of a capacitive sensor and limitation to measurement accuracy of a laser triangular sensor currently. The device disclosed by the invention mainly comprises an interference system, an orthogonal grating light splitting and phase shifting device and an image acquisition system; and the device respectively uses a round light spot and a strip light spot as axial / radial measurement light spots, adopts an orthogonal Ronchi grating to implement light splitting, adopts a four-quadrant polarizer to implement phase shifting and adopts a CCD (Charge Coupled Device) to carry out image acquisition. According to the scheme adopted by the invention, a probe of the device is vertically fixed at a certain distance relative to an axial / radial measurement plane of the dynamic pressure motor to be measured; and the simultaneous phase shifting interferometry principle, the grating diffraction light splitting principle, the polarization phase shifting characteristic and the image acquisition principle are utilized to measure axial and radial displacement change values corresponding to stiffness variation of a gas film of the dynamic pressure motor. The device has high stability and common-path, large-working-distance high-resolution measurement can be implemented.
Owner:HARBIN INST OF TECH

Method and device for detecting precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry

The invention relates to a device for detecting a precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry. The device comprises a light source, a spatial filter, a beam expander, a polarizer, a depolarizing dispersion prism, a parallel optical flat, a quarter-wave plate and an analyzer, wherein the light source, the spatial filter, the beam expander and the polarizer are arranged on a first optical axle in sequence, the analyzer, the quarter-wave plate, the depolarizing dispersion prism, the parallel optical flat and the surface of an externalobject to be measured are arranged on a second optical axle in sequence, and the first optical axle is perpendicular to the second optical axle.
Owner:HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL

Optical fiber point diffraction phase shifting interferometry of optical plane surface shape

InactiveCN101709956ASolve the problem that only concave spherical surfaces can be measuredSolve the problem of not being able to measure the planeUsing optical meansBeam splitterPlane mirror
The invention relates to an optical fiber point diffraction phase shifting interferometry of an optical plane surface shape, belonging to the field of optical measuring technique. The interferometry of the invention comprises the following steps: penetrating a beam splitter from a spheric wave for measuring the optical fiber diffraction, and refracting after reflecting on the surface of the plane mirror to be measured; reflecting the spheric wave front by the beam splitter, diffracting with the reference optical fiber, and converging with the spheric wave front of the beam splitter to generate interference; analyzing and processing the interference figure by using a standard method; measuring to obtain the surface shape of the measured plane mirror and the aberration introduced by the beam splitter; removing the plane mirror to be measured, moving the measuring optical fiber to the end surface of the reference optical fiber in the conjugate position relative to the beam splitter, and converging the spheric wave front diffracted from the reference optical fiber and the spheric wave front diffracted from the measuring optical fiber to generate interference again; measuring to obtain the aberration introduced by the beam splitter; and subtracting the measuring result obtained in step 2 from the measuring result obtained in step 1 to obtain the surface shape of the measured plane mirror. The interferometry of the invention has high precision of the measuring result of the plane surface shape, is an absolute measurement method of the plane surface shape, and extends the application range of the point diffraction interferometry.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Method and device for measuring laser pulse width and relative phase by simultaneous phase-shifting interferometry

The invention discloses a method and a device for measuring a laser pulse width and a relative phase by a simultaneous phase-shifting interferometry, which can measure a femtosecond pulse and an attosecond pulse of which the pulse width is very narrow. In the technology, a component prism is used for splitting light beams, and simultaneously, a plurality of simultaneous phase-shifting interference fringe patterns are obtained once in a spatial domain through a polarization interference method. By computational analysis on interference fields of a plurality of paths, the pulse width and the phase of an ultra-short pulse can be directly measured. The method provided by the invention is simple, clear in principles and excellent in shock resistance of the measuring result, and can implement on-site dynamic measurement and monitoring on the pulse width and the relative phase of the ultra-short pulse in an ultra-fast process. The measuring process is simple and convenient.
Owner:BEIJING UNIV OF TECH

Digital watermark embedding and detecting method based on phase-shifting interferometry and singular value decomposition

The invention discloses a digital watermark embedding and detecting method based on phase-shifting interferometry and singular value decomposition. The method includes two processes of watermark embedding and watermark detection, the embedding process includes watermarking information encryption is achieved by double random phase encoding and the phase-shifting interferometry of a Fresnel domain, and after encryption, a watermark image is embedded into a singular value transform domain of a host image; and an extraction method includes extracting encrypted information from a watermark image contained singular value matrix to be detected, and deciphering through double random phase decoding and the phase-shifting interferometry of the Fresnel domain to obtain a gray-scale watermark image. Compared with prior digital watermarking methods, the digital watermark embedding and detecting method based on the phase-shifting interferometry and the singular value decomposition has the advantages that the invisibility and robustness are remarkably improved, the shear-resistant capability is greatly improved, a series of image processing modes can be resisted, and high robustness and excellent safety are achieved.
Owner:SHANDONG UNIV

System for in vitro analysis of fluid dynamics on contact lenses via phase shifting interferometry

A system and method for analyzing the dynamics of fluid layers on contact lenses utilizes phase shifting interferometry to quickly and accurately model the time-evolution of the fluid layers. The system and method are utilized for in vitro studies.
Owner:JOHNSON & JOHNSON VISION CARE INC

Method for detecting material uniformity of spherical lens

ActiveCN105572050AUniformity obtainedUniformity can be measuredMaterial analysis by optical meansFlat glassPhase shifting interferometry
The invention discloses a method for detecting material uniformity of a spherical lens and belongs to the technical field of optical interferometry. The method includes that phase-shifting interferometry technology, refractive index matching liquid and a pasting plate are combined to realize detection on material uniformity of the spherical lens; by matching the refractive index matching liquid with refractive index of a detected lens, the detected lens can be detected by utilizing plane waves of an interferometer; influence, on detection results, of uniformity of the refractive index matching liquid is eliminated by stirring the refractive index matching liquid and repeatedly measuring interference detection results in a full-cavity state; material uniformity of the detected lens can be acquired by subtracting full-cavity and empty-cavity interference detection results. The method has the advantages that material uniformity of flat glass can be measured, and material uniformity of the spherical lens can be measured.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Digital watermarking embedding and detecting method based on three-step phase shift interferometry

The invention provides a digital watermarking embedding and detecting method based on a three-step phase shift interferometry. The method includes a watermarking embedding process and a watermarking detecting and extracting process. The method utilizes a propagation law of a numeric field simulation optical process, so that processes that the watermarking is embedded in a digital image to be protected and the watermarking is detected from an image embedded with the watermarking are achieved, and an encryption and a decryption for information are achieved through a double random phase code and a phase shift interferometry of a Fresnel field. The digital watermarking embedding and detecting method based on the three-step phase shift interferometry has the advantages that a phase shift algorithm is introduced to a digital holography, the disadvantages and the shortages of a coaxial digital holography and an off-axis digital holography are overcome by the phase shift interferometry, and a novel information hiding encryption / decryption method is formed; the decryption can be directly performed without original plain code images in the watermarking detecting process, and the method belongs to a blind watermark algorithm; compared with traditional data encryption processes, the method is highly free and safe; and the method is high in measurement accuracy, easy to operate, rapid in processing speed, high in portability, capable of achieving the overall measurement, and the like.
Owner:SHANDONG UNIV

Phase Shift Interference in Vibration Fields

The present invention provides a phase-shifting interferometry (PSI) method and corresponding system including: (i) recording an interferogram for each phase in a sequence of phases between test light reflected from a test surface and reference light reflected from a reference surface, the interferograms defining an interferometry signal for each of different transverse locations of a cavity defined by the test and reference surfaces; (ii) calculating an initial phase map for the cavity based on at least some of the recorded interferograms; (iii) calculating an estimate for each of at least some of the phase shift increments based on the initial phase map and at least some of the recorded interferograms; and (iv) calculating an improved phase map based on the calculated estimates for the phase shift increments and at least some of the recorded interferograms.
Owner:ZYGO CORPORATION

Method for compensating error of fringe order in white-light phase-shifting interferometry

The present invention relates to a method of compensating a fringe order error in white-light phase-shifting interferometry, including: an interference signal acquisition step, an index determination step, and a real position calculation step. The interference signal acquisition step includes acquiring at least two color interference signals, using a color camera, from among a red interference signal, a green interference signal, and a blue interference signal. The index determination step includes determining a position where a phase difference between the at least two interference signals reaches a minimum value as an index of the zero order interference signal position. The real position calculation step includes determining, as a zero order interference signal measured position, a position corresponding to the index of the zero order interference signal position from among positions where interference signals are measured from black-and-white interference signals acquired through a black-and-white camera, and calculating a zero interference signal real position where the intensity of light is a maximum value by adding or subtracting a phase value of the zero order interference signal measured position to or from the zero order interference signal measured position.
Owner:SNU PRECISION CO LTD

Method and device for detecting precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry

The invention relates to a device for detecting a precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry. The device comprises a light source, a spatial filter, a beam expander, a polarizer, a depolarizing dispersion prism, a parallel optical flat, a quarter-wave plate and an analyzer, wherein the light source, the spatial filter, the beam expander and the polarizer are arranged on a first optical axle in sequence, the analyzer, the quarter-wave plate, the depolarizing dispersion prism, the parallel optical flat and the surface of an externalobject to be measured are arranged on a second optical axle in sequence, and the first optical axle is perpendicular to the second optical axle.
Owner:HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL

System and method for super-resolution full-field optical metrology on far-field nanometre scale

A system of super-resolution full-field optical metrology for delivering information on the surface topography of a sample or object (6) on the far-field nanometre scale, comprising a light source (2), an interferometer (1a, 1b, 1c, 1d) comprising a reference arm incorporating a microbead (9) and a mirror (10), an object arm including a microbead (7) similar to said microbead (9) and arranged in immediate proximity to the surface (22) of the object (6), receiving means (5) for capturing the interference figures, and means for processing these interference figures in such a way as to produce surface topography information. The light source (2) is temporally coherent or partially coherent. The interferometer and the means for processing interference figures are designed to reconstruct the surface of the object (6) by phase shifting interferometry.
Owner:UNIVERSITY OF STRASBOURG +1

System and method for super-resolution full-field optical metrology on the far-field nanometre scale

A system of super-resolution full-field optical metrology for delivering information on the surface topography of a sample or object on the far-field nanometre scale, including a light source, an interferometer (1a, 1b, 1c, 1d) including a reference arm incorporating a micro bead and a mirror, an object arm including a micro bead similar to the micro bead and arranged in immediate proximity to the surface of the object, receiving structure for capturing the interference figures, and a processor for processing these interference figures in such a way as to produce surface topography information. The light source is temporally coherent or partially coherent. The interferometer and the processor for processing interference figures are designed to reconstruct the surface of the object by phase shifting interferometry.
Owner:UNIVERSITY OF STRASBOURG +1

Dual-wavelength phase-shift interference-based method for measuring optical heterogeneity

InactiveCN102252823BAutomatically eliminate errorsTesting optical propertiesPhase differenceRefractive index
The invention discloses a dual-wavelength phase-shift interference-based method for measuring optical heterogeneity, wherein according to dispersion characteristics of a material, an interferometer which comprises two lasers with different optical wavelengths or a wavelength tunable laser is adopted, and refractive index heterogeneity of a sample to be measured under optical waves of two wavelengths is considered as the same as optical heterogeneity to be measured of the sample to be measured; a phase-shift interferogram of the sample to be measured under the optical waves of the two wavelengths before being put into the interferometer, and a phase-shift interferogram of the sample to be measured under the optical waves of the two wavelengths after being put into the interferometer are obtained by using phase-shifting interferometry;and physical light wave phase difference of the sample to be measured under the optical waves of the two wavelengths before / after being put into the interferometer is obtained by using a phase-shift interference phase recovery algorithm, and then the optical heterogeneity of the sample to be measured is obtained. According to the dual-wavelength phase-shift interference-based method for measuring the optical heterogeneity, system errors are automatically eliminated, the sample to be measured does not need to be adjusted during a process of measuring, no special requirements for surface shape, parallelism and machining accuracy of a front and a rear surfaces of the sample to be measured exist, thus the dual-wavelength phase-shift interference-based method for measuring the optical heterogeneity is a genuine absolute measuring method and has high measuring accuracy.
Owner:SHANDONG UNIV

A two-step phase-shift interferometric phase microscopy primary imaging system and method

The invention discloses an interferometric phase microscopy one-step imaging system and method based on two-step phase shift, and adopts the technical scheme that based on a typical Mach-Zehnder interference light path, lateral displacement beam splitting mirrors are adopted to perform light splitting on sample light and reference light respectively, a wave plate is utilized as a phase shifter, and two interference figures can be acquired at the same time through single exposure, and phase imaging can be realized quickly through corresponding phase recovery operation, and a spatial form structure of a phase body is further deconstructed. The interferometric phase microscopy one-step imaging system and method are suitable for all interferometric phase microscopy imaging systems, such as traditional coaxial interference, off-axis interference and slight off-axis interference, and have high practical value and wide application prospect in the aspect of phase microscopy, particularly in the field of application and identification of biological cell morphology.
Owner:JIANGSU UNIV

Single black and white ccd phase shift dual wavelength interferometry method based on specific phase shift

The invention discloses a single-black-and-white CCD phase-shift dual-wavelength interferometric method based on a specific phase shift amount, which includes step 1: constructing a co-path coaxial dual-wavelength interference system, and injecting lasers with two wavelengths of wavelength λ1 and λ2 into the interferometric In the system, adjust the lasers with two wavelengths to form an interferogram along the exact same path; second: adjust the parameters of a single black and white CCD to simultaneously collect two wavelengths of the interferogram; third: use a single black and white CCD to collect the dual waves generated by two wavelengths at the same time Long phase-shift interferogram; 4: From the collected dual-wavelength phase-shift interferogram, separate two sets of single-wavelength phase-shift interference signal images that eliminate the background; 5: Separate two sets of single-wavelength phase-shift interference signal images Carry out normalization processing; Sixth: Calculate the single-wavelength package phase diagram under the wavelengths λ1 and λ2, Seventh: Calculate the synthetic wavelength phase of the wavelengths λ1 and λ2, so as to obtain the surface three-dimensional topography information of the object to be measured. The method is simple and easy to implement.
Owner:SOUTH CHINA NORMAL UNIVERSITY

Second confocal measuring method and apparatus based on movable phase interfere

InactiveCN100567884CAchieve direct solutionEnables absolute position measurementUsing optical meansBeam splitterMeasurement point
The invention discloses a secondary confocal measurement method and device based on phase-shifting interference. In the device, a laser emits a linearly polarized beam, which becomes an approximate ideal plane wave after passing through a collimating beam expander group; After one-half of the wave plate, it becomes a circularly polarized beam; it is divided into two beams by the beam splitter, the first beam is transmitted by the beam splitter, reflected by the mirror, reflected by the beam splitter, and converged by the second pinhole and detected by the collecting objective lens. A point detector composed of detectors; the second beam of light is reflected by the beam splitter, converges on the measurement surface through the detection focusing objective lens and the beam splitter, is reflected on the measurement surface, passes through the detection focusing objective lens, and converges on the point detector through the collecting objective lens; the first The micro-driver is used to drive the mirror to change the phase difference between the reference light and the measurement light to realize phase-shifting interference; the initial position of the measurement point is the first confocal state. The invention also discloses a secondary confocal measurement method based on phase-shifting interference.
Owner:HARBIN INST OF TECH

Parallel prism phase shifter used for phase-shifting interferometry

The invention discloses a parallel prism phase shifter used for phase-shifting interferometry. The parallel prism phase shifter of the invention comprises parallel prisms, a stepper motor, a high-reflection mirror and a beam splitter. Five parallel prisms are fixed on a platform of the stepper motor as different deviation angles relative to an incident light beam. The deviation angle of each prism is determined by the phase difference of p light and s light which are to be caused by the deviation angle. Incident light is divided in two beams of light through the beam splitter; one beam of light is emitted to the parallel prisms, and is subjected to total internal reflection of the parallel prisms, and reaches the high-reflection mirror, and is made to be vertical to an emergent light path through adjusting the high-reflection mirror; and after being reflected by the high-reflection mirror, the light is returned according to original paths; and finally, the light is separated out from the beam splitter to form modulated emergent light. The parallel prism phase shifter used for phase-shifting interferometry of the invention has the advantages of being simple, high stability, high precision of a modulation effect, low cost and long service life.
Owner:ZHEJIANG UNIV

Phase shifting interferometry-based sphere diameter absolutely-precise measuring system and method thereof

The invention relates to a phase shifting interferometry-based sphere diameter absolutely-precise measuring system and a method thereof. The phase shifting interferometry-based sphere diameter absolutely-precise measuring system comprises a tunable laser, a polarization-maintaining optical fiber system, a laser frequency locking system, a laser frequency tracing system and a sphere diameter interferometer which are mutually connected. According to the invention, the method which is used for interfering phase control based on frequency scanning by the tunable laser is adopted, thus the phenomena of mechanical vibration and nonlinearity caused when piezoelectric ceramic is used for interfering phase control are avoided and the accuracy for phase shift control is enhanced; a Fabry-Perot cavity is additionally adopted, the outputted laser frequency is locked at a transmission peak of the Fabry-Perot cavity, and then an assumption of equally-spaced phase shift required by an asynchronous sampling phase shift algorithm is strictly ensured and the calculating accuracy of the phase shift algorithm is enhanced; and in addition, the femtosecond optical frequency combing system-based laser frequency tracing system is further adopted, the output laser frequency of the tunable laser can be traced to the microwave frequency standard, thus a diameter measuring result of a sphere to be measured has metrological significance.
Owner:TSINGHUA UNIV
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