System and method for super-resolution full-field optical metrology on far-field nanometre scale

An optical metrology, nano-scale technology, applied in the field of super-resolution optical profilometry, which can solve problems such as the limitation of lateral resolution of optical profilometers

Inactive Publication Date: 2020-02-07
UNIVERSITY OF STRASBOURG +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0014] However, the lateral resolution of optical profilers is limited by diffraction mainly from the microscope objective

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  • System and method for super-resolution full-field optical metrology on far-field nanometre scale
  • System and method for super-resolution full-field optical metrology on far-field nanometre scale
  • System and method for super-resolution full-field optical metrology on far-field nanometre scale

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Embodiment Construction

[0050] Since these embodiments are non-limiting, variants of the invention are conceivable, in particular comprising only a selection of features described or exemplified below, in isolation from other features described or exemplified (even if this selection is incorporated in these other have been separated in the expression of features), as long as the selection of features is sufficient to confer technical advantages or distinguish the present invention from the prior art. The selection includes at least one feature, preferably a functional feature, which has no structural details and / or only has a part of the structural details, as long as this part is sufficient to confer a technical advantage or to distinguish it from the prior art.

[0051] Referring to FIG. 1 , variants of optical metrology systems operating in reflective configurations based on Michelson interferometer 1a, Twyman-Green interferometer 1b and Mirau interferometer 1c, respectively, and in a Mach-Zehnder ...

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Abstract

A system of super-resolution full-field optical metrology for delivering information on the surface topography of a sample or object (6) on the far-field nanometre scale, comprising a light source (2), an interferometer (1a, 1b, 1c, 1d) comprising a reference arm incorporating a microbead (9) and a mirror (10), an object arm including a microbead (7) similar to said microbead (9) and arranged in immediate proximity to the surface (22) of the object (6), receiving means (5) for capturing the interference figures, and means for processing these interference figures in such a way as to produce surface topography information. The light source (2) is temporally coherent or partially coherent. The interferometer and the means for processing interference figures are designed to reconstruct the surface of the object (6) by phase shifting interferometry.

Description

technical field [0001] The present invention relates to a system and method for super-resolution full-field optical metrology for transferring information of sample surface topography on the far-field nanoscale. It also deals with the metering methods implemented in the system. [0002] The systems and methods relate, inter alia, to super-resolution optical profilometry. It is interesting with regard to the nanometer spatial resolution obtained in three spatial directions beyond the diffraction limit. Background technique [0003] An optical profilometer is a non-contact metrology instrument that reconstructs the surface topography of an object. Several optical profilometry techniques exist, such as confocal microscopy, structured light projection, and interference microscopy. [0004] The principle of optical interferometry is similar to echosonography in that it is able to reconstruct the depth information of an object by measuring the time-of-flight of waves reflected ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G01B9/04G02B21/00
CPCG01B9/0201G01B9/02042G01B9/04G02B21/14G02B27/58G01B9/0205G01B11/2441G02B21/32G02B21/365
Inventor 保罗·蒙哥马利西尔万·勒克莱斯蒂芬妮·佩兰奥黛丽·梁-荷伊
Owner UNIVERSITY OF STRASBOURG
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