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69results about How to "Reduce exchange frequency" patented technology

Method For Controlling Communication Route of Wireless Multi-Hop Network System and Communication Terminal

A wireless multi-hop network is formed by exchanging a control message including a HELLO message and a topology message between a plurality of communication terminals. A communication terminal adjusts a control message transmission interval so as to reduce the control load according to its movement state and transmits a control message at a longer transmission interval as the movement becomes smaller. Moreover, when link information is updated, the communication terminal includes the sequence number of the HELLO message in the topology message transmitted. Thus, it is possible to realize stable communication in accordance with a movement characteristic with a small message transmission frequency.
Owner:NEC CORP

Film formation apparatus and method for semiconductor process

A film formation apparatus for a semiconductor process includes a source gas supply circuit to supply into a process container a source gas for depositing a thin film on target substrates, and a mixture gas supply circuit to supply into the process container a mixture gas containing a doping gas for doping the thin film with an impurity and a dilution gas for diluting the doping gas. The mixture gas supply circuit includes a gas mixture tank disposed outside the process container to mix the doping gas with the dilution gas to form the mixture gas, a mixture gas supply line to supply the mixture gas from the gas mixture tank into the process container, a doping gas supply circuit to supply the doping gas into the gas mixture tank, and a dilution gas supply circuit to supply the dilution gas into the gas mixture tank.
Owner:TOKYO ELECTRON LTD

Working method for sapphire substrate

A working method for a sapphire substrate for dividing a sapphire substrate along a set planned dividing line includes a cutting groove forming step of positioning a cutting blade, which includes a cutting edge to which diamond grain is secured by nickel plating, to a planned dividing line of the sapphire substrate and feeding the cutting blade and the sapphire substrate relative to each other for working while rotating the cutting blade to form a cutting groove, which serves as a start point of break, along the planned division line on the sapphire substrate, and a breaking step of applying external force to the sapphire substrate, for which the cutting groove forming step is carried out, to break the sapphire substrate along the planned dividing line along which the cutting groove is formed. The cutting groove forming step is set such that a rotational speed of the cutting blade is 20000 to 35000 rpm, a cutting-in depth of the cutting blade is 5 to 15 μm and a working feeding speed is 50 to 150 mm / second.
Owner:DISCO CORP

Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof

The present invention intends to provide an agent and a method for removing harmful gas, which exhibits high harm-removing ability per unit volume for harmful halogen-containing gas contained in the exhaust gas from the etching or cleaning step in the manufacturing process of a semiconductor device, and which is inexpensive. The invention is characterized by that halogen-containing gas is removed using a harm-removing agent comprising a specific iron oxide, an alkaline earth metal compound and activated carbon in the specific amount. In the case where the exhaust gas contains halogen gas such as chlorine or a gas such as sulfur dioxide, the gas is rendered harmless by using in combination a harm-removing agent comprising activated carbon or zeolite.
Owner:SHOWA DENKO KK

Apparatus and method for treating etching solution

An apparatus and method for treating an etching solution, where the replacement frequency of the etching solution is reduced, while the inclusion of impurities in the treated etching solution is prevented. An apparatus for treating an etching solution in order to reuse the etching solution used in etching treatment of silicon, where the apparatus includes: membrane separation means 3 which performs membrane separation treatment on the etching solution supplied from an etching bath 2; and circulating means 6 which circulates a permeated solution supplied from the membrane separation means 3 to the etching bath 2. The membrane separation means 3 includes a UF membrane module 4 and an NF membrane module 5. Alkaline and organic substances may be added to the etching solution supplied from the membrane separation means 3.
Owner:KURITA WATER INDUSTRIES LTD

Urinal drain trap

Provided is a urinal drain trap which is capable of preventing diffusion of odor for a long period of time. The urinal drain trap (10) is equipped with a lid (11) having an inlet (11A); a body (12) having an outlet (12C); and a tubular partition wall (13). The interior of the body (12) is divided into a first region (31) and a second region (32). The first region (31) and the second region (32) are linked with each other by a third region (33). Sealing liquid is injected into the first region (31), this sealing liquid being non-water-soluble, having a lower specific gravity than urine, and forming a sealing layer (S) at an elevation above retained urine. In a peripheral area of the lower end of the partition wall (13), there is formed a connecting portion (14) which extends laterally. In a peripheral area of the tip of the connecting portion (14), there is formed a folded portion (15) which extends upward. Between the partition wall (13) and the folded portion (15), the inlet (11A) is provided, in such a way as to form a through opening, at a location where urine flows in from above. The outlet (12C) is located in the second region (32) and is open at an elevation above the upper end of the folded portion (15).
Owner:LIXIL CORP

Mobile terminal and power control method

A mobile terminal includes: a tamper-detection circuit (17), an information processor (13) that is capable of executing a suspend function, a first battery (23) supplying power to the information processor (13) and the tamper-detection circuit (17), and a switch (27) that is provided on a power-source supply line (431) that connects the first battery (23) and the information processor (13) and the switch that is capable of switching between a state in which information processor (13) is connected to first battery (23) and a state in which information processor (13) is not connected to first battery (23).
Owner:NEC PLATFORMS LTD

Process for producing alpha, beta-unsaturated ether

A process of producing α,β-unsaturated ethers includes pyrolyzing an acetal represented by Formula (2) below in a gas phase in the presence of a catalyst and a compound having at least one hydrogen atom capable of hydrogen bonding to produce an α,β-unsaturated ether represented by Formula (3) below:R1R2CH—CR3(OR4)2  (2)R1R2C═C—R3(OR4)  (3)In Formulae (2) and (3), R1, R2 and R3 are each independently a hydrogen atom, an alkyl group, an alkenyl group or an aryl group; R4 is an alkyl group, an alkenyl group or an aryl group; the plurality of R4 in Formula (2) may be the same or different from each other.
Owner:SHOWA DENKO KK

Plasma processing apparatus

A plasma processing apparatus includes: a vessel which includes a reaction chamber, atmosphere within the reaction chamber capable of being depressurized; a lower electrode which supports an object to be processed within the reaction chamber; a dielectric member which comprises a first surface and a second surface opposite to the first surface, and which closes an opening of the vessel such that the first surface opposes an outside of the reaction chamber and the second surface opposes the object to be processed; and a coil which opposes the first surface of the dielectric member, and which generates plasma within the reaction chamber. An electrode pattern and an insulation film which covers the electrode pattern are formed on the second surface of the dielectric member.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD

Image forming device, powder supply device, and powder storage unit

In an image forming device including an image support object which supports an electrostatic latent image, and a developing device which turns the electrostatic latent image formed on the surface of the image support object, into a visible image with toner, a powder storing unit stores powder for image formation which is either a developing agent containing a toner and a carrier or a toner. A powder supplying unit supplies the powder stored in the powder storing unit, to the developing device. The powder storing unit includes a gas supplying unit which blows off a gas from an exhaust outlet of the gas supplying unit into the powder storing unit, and a powder passage which allows the powder storing unit to communicate with the developing device.
Owner:RICOH KK

Thin plate stacked structure and ink-jet recording head provided with the same

ActiveUS20050162485A1Reduce the amount requiredSuppress adhesion of adhesiveSpray nozzlesFire rescueAdhesiveEngineering
A stacked structure is formed such that a plurality of thin plates, which include at least one liquid flow passage thin plate provided with a liquid flow passage having a predetermined pattern formed on at least one surface, are stacked with an adhesive. A release groove for releasing the adhesive is formed on the liquid flow passage thin plate. An air release hole, which is communicated with the release groove and which penetrates in the stacking direction, is bored through a thin plate stack stacked on the liquid flow passage thin plate. An opening, which allows the air release hole to be open to the outside, is formed on the thin plate disposed at the outermost layer of the thin plate stack. The air release hole has a diameter which is larger than the width of the release groove and which is larger than the opening disposed on the outermost layer. Any excessive adhesive is accumulated in the air release hole, and it is possible to greatly decrease the amount of the adhesive outflowing to the outside of a cavity unit.
Owner:BROTHER KOGYO KK

Surface-Treated Doctor Blade

The surface-treated doctor blade having nickel-phosphorus-based alloy plating which does not include irregularities of planar diameter exceeding 50 μm at least at the blade edge end can have an improved conformability of blade edge and at the same time improved wear resistance of the blade edge, thereby enabling reduction in exchange frequency of the blades. Moreover, it is preferable that the plating include 20 or less irregularities of planar diameter more than 30 μm per 1 m in the longitudinal direction, more preferably the plating includes 10 or less irregularities of planar diameter more than 20 μm per 1 m in the longitudinal direction, particularly preferably the plating includes 5 or less irregularities of planar diameter more than 10 μm per 1 m in the longitudinal direction.
Owner:NIHON NEW CHROME

Memory management method and memory management device

The invention provides a memory management method and a memory management device. The memory management device is applicable to a memory which comprises a working region and a compressed region. The working region is used for storing uncompressed data. The memory management device comprises a management module and a compression / decompression module. The management module is used for determining whether or not to move target data stored in the working region to the compressed region according to a recent use index and a compression ratio of the target data. If the management module decides to move the target data to the compressed region; the compression / decompression module compresses the target data and moves the compressed target data to the compressed region.
Owner:MEDIATEK INC

Long life welding electrode and its fixing structure, welding head and welding method

The present invention provides a fixing structure for a welding electrode and a welding head which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and reduction of time required for welding and also which make it possible to execute welding for a long time with high reliability.In this fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to fix the welding electrode to the fixing base.
Owner:FUJIKIN INC +1

Data storage system

A data storage system including a processor configured to execute a plurality of tasks, wherein the processor is configured to generate writing status information based on the data relevant information and otre the data relevant information and the writing status information in association with each other in the nonvolatile memory when the processor write data in the recording medium based on demand of the task and writing to the recording medium is configured to be controlled based on the data relevant information and the write-in status information stored in nonvolatile memory.
Owner:FANUC LTD

Electron beam proximity exposure apparatus and mask unit therefor

In an electron beam proximity exposure apparatus comprising an electron beam source, which emits a collimated electron beam, a mask substrate on which a plurality of masks with apertures are formed, a mask moving mechanism, which moves the mask substrate, and a stage, which holds and moves an object, the mask moving mechanism moves the mask substrate so that one of the plurality of masks is arranged on a path of the electron beam in proximity to a surface of the object, and a pattern corresponding to the aperture of the one of the plurality of masks is exposed on the surface of the object with the electron beam having passed through the aperture. Thus, the frequency of taking the mask out of the apparatus to exchange the mask is reduced, so that the throughput of the apparatus is improved.
Owner:TOKYO SEIMITSU

Hollow-fiber membrane and process for production of hollow-fiber membrane

A module provided with a hollow-fiber membrane which has a dense layer either on the inside or on the outside and in which the aspect ratios of pores formed on the dense-layer-side surface of the membrane are 3 to 5. The module exerts purification performance higher than that expected to be attained by an increase in membrane area and can reduce the frequency of cartridge replacement.
Owner:TORAY IND INC

Magnetic carrier and two-component developer

ActiveUS20200166862A1Improve image qualityExcellent durable stability of image densityDevelopersCoatingsInorganic particleInorganic particles
A magnetic carrier comprising a magnetic carrier particle having a magnetic carrier particle having a magnetic carrier core particle and a resin coat layer formed on the magnetic carrier core particle surface, and inorganic fine particles A present on a surface of the magnetic carrier particle, wherein each of the inorganic fine particles A has a rectangular parallelepiped particle shape, the inorganic fine particles A have D1 of 10 to 60 nm, the inorganic fine particles A are inorganic particles which have been surface treated with a surface treatment agent or silane coupling agent-treated particles, SP1 of the resin coat layer and SP2 of the surface treatment agent satisfies SP1−SP2≤14.00, and the coverage ratio of the magnetic carrier surface by the inorganic fine particles A as measured by ESCA is 5.0 to 20.0 atom %: and a two-component developer comprising at least the magnetic carrier and a toner.
Owner:CANON KK

Etching liquid

Provided is an etching liquid that contains: hydrofluoric acid (A); ammonium fluoride (B); a salt (C) that comprises an acid (C1) having a higher pKa than hydrofluoric acid (which has a pKa of 3.17) and a base (C2) having higher pKa than ammonium (which has a pKa of 9.24); and water (D). As a result, the liquid chemical does not change much in composition upon evaporation and the like, has a low exchange frequency, and can etch silicon dioxide films with uniformity over time as well.
Owner:DAIKIN IND LTD

Method for wiping surface of strip steel

InactiveCN103741160ASqueeze is effectiveRemove residual moistureStrip steelEngineering
The invention provides a method for wiping the surface of strip steel. The method comprises the following steps: 1, removing water: providing an upper roller and a lower roller which are opposite up and down, wherein the strip steel is extruded by the upper roller and the lower roller so that the water in the surface of the strip steel is removed, the middle parts of the upper roller and the lower roller are cylindrical rollers, circular truncated cone-shaped rollers are arranged at two ends of each cylindrical roller, and the width of the strip steel is more than that of each cylindrical roller; and b, drying, namely, sending the strip steel in drying equipment after the water of the strip steel is removed. According to the method for wiping the surface of the strip steel, provided by the invention, the strip steel can be effectively extruded, the water remained on the surface of the strip steel is removed as much as possible, the quality of the strip steel is effectively improved, and the purposes of reducing the changing frequency of the rollers and prolonging the service life of the roller can be reached.
Owner:ZHANGJIAGANG POHANG STAINLESS STEEL

Stain preventing cover for coating machine

The stain preventing cover is formed from a composite sheet 24 having a three layer structure as a raw material which is produced by laminating a first sheet material 21 having a low dielectric constant and having insulation performance, a second sheet material 22 having a dielectric constant higher than that of the first sheet material 21 or having semiconductivity and a third sheet material 23 having a dielectric constant lower than that of the second sheet material 22 and having insulation performance, in which an end of the second sheet material 22 is positioned together with an end of the first and third sheet materials 21 and 23 adjacent to a electrostatic high voltage part 10 of a coating machine and another end thereof is positioned distant from an earth part 11 of the coating machine to be electrically insulated. The influence of the disturbance of the electric potential distribution on the surface of a coating machine main body 5 is alleviated by the first and second sheet materials 21 and 22 to cause the electric potential distribution on the surface of the third sheet material 23 to be homogeneous to thereby preventing the attaching of atomized coating particles to the surface.
Owner:TOYOTA JIDOSHA KK +1
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