44results about How to "Avoid uneven film thickness" patented technology

An optical element is provided with an optical layer in which a concavo-convex surface is formed on the surface thereof, and a wavelength-selective reflection layer formed on the concavo-convex surface. The wavelength-selective reflection layer directionally reflects light having a specific wavelength band selectively, while transmitting light having wavelength bands other than the specific wavelength band. The concavo-convex surface is provided with a plurality of first structural elements that are extended in a first direction within the surface of the optical layer and a plurality of second structural elements that are extended in a second direction within the surface of the optical layer, and placed to be spaced apart from each other, with the first direction and the second direction intersecting with each other.

A non-light-emitting cell 100c is provided between pixels 100a and 100b. In formation of the pixel 100a, ink for forming an organic light-emitting layer is dripped into sub-pixels 100a1, 100a2, 100a3 in this order. This also applies to the pixel 100b. However, such ink is not dripped into the non-light-emitting cell 100c since the organic light-emitting layer is not formed in the non-light-emitting cell 100c. Regarding banks 105c and 105d defining the sub-pixel 100a3 of the pixel 100a, an inclination angle θd3 of a wall 105d3 of the bank 105d is larger than an inclination angle θc3 of a wall 105c3 of the bank 105c. Meanwhile, regarding banks 105e and 105f defining the sub-pixel 100b1, an inclination angle θe1 of a wall 105e1 of the bank 105e is equivalent to an inclination angle θf1 of a wall 105f1 of the bank 105f.

A non-light-emitting cell 100c is provided between pixels 100a and 100b. Ink for forming an organic light-emitting layer is dripped substantially simultaneously into sub-pixels 100a1, 100a2, and 100a3 in the pixel 100a and a sub-pixel 100b1 in the pixel 100b. On the other hand, such ink is not dripped into the non-light-emitting cell 100c since the organic light-emitting layer is not formed in the non-light-emitting cell 100c. In a bank 105d, an inclination angle θd3 of a wall 105d3 facing the sub-pixel 100a3 is larger than an inclination angle θdc of a wall 105dc facing the non-light-emitting cell 100c. Similarly, in a bank 105e, an inclination angle θe1 of a wall 105e1 facing the sub-pixel 100b1 is larger than an inclination angle θec of a wall 105ec facing the non-light-emitting cell 100c.

A non-light-emitting cell 100c is provided between pixels 100a and 100b. Ink for forming an organic light-emitting layer is dripped substantially simultaneously into sub-pixels 100a1, 100a2, and 100a3 in the pixel 100a and a sub-pixel 100b1 in the pixel 100b. On the other hand, such ink is not dripped into the non-light-emitting cell 100c since the organic light-emitting layer is not formed in the non-light-emitting cell 100c. Regarding two banks 105c and 105d defining the sub-pixel 100a3, an inclination angle θd3 of a wall 105d3 of the bank 105d is larger than an inclination angle θc3 of a wall 105c3 of the bank 105c. Similarly, regarding banks 105e and 105f defining the sub-pixel 100b1, an inclination angle θe1 of a wall 105e1 of the bank 105e is larger than an inclination angle θf1 of a wall 105f1 of the bank 105f.

A non-light-emitting cell 100c is provided between pixels 100a and 100b. In formation of the light-emitting cell 100a, ink for forming an organic light-emitting layer is dripped into sub-pixels 100a1, 100a2, 100a3 in this order. This also applies to the light-emitting cell 100b. However, such ink is not dripped into the non-light-emitting cell 100c since the organic light-emitting layer is not formed in the non-light-emitting cell 100c. Regarding a bank 105d between the sub-pixel 100a3 and the non-light-emitting cell 100c, an inclination angle θd3 of a wall 105d3 is larger than an inclination angle θdc of a wall 105dc. On the other hand, regarding a bank 105e between the sub-pixel 100b1 and the non-light-emitting cell 100c, an inclination angle θe1 of a wall 105e1 is equivalent to an inclination angle θec of a wall 105ec.

A photoresist film forming process through a spin coating method is included, the photoresist film forming process is performed by rotating a square wafer (65), a spin chuck (70) is provided with a column portion (96), a penetration hole (89a) through which the column portion (96) penetrates is formed in a flow regulating plate (88), a plurality of blowing holes (96) blowing gas toward a second surface (65b) of a square wafer (65) are provided in the upper surface (88a) of the flow regulating plate (88) at the inner side in relation to the outer edge (66) of the square wafer (65) in the radial direction of the wafer maintaining portion (72) and at the outer side in relation to the inner circumferential surface of the penetration hole (89a) in a radial direction of the wafer maintaining portion.

The present invention provides an optical laminate in which cissing occurring when an optically anisotropic layer is formed and film thickness unevenness are suppressed, and a polarizing plate and an organic EL display device using the same. The optical laminate includes an optically anisotropic layer A, and an optically anisotropic layer B, where layer A and layer B come into direct contact, either or both of layer A and layer B are formed of a composition containing a liquid crystal compound, surface energy A of a surface of layer A on a side in contact with layer B is 30 to 40 mN / m, surface energy B1 of a surface of layer B on a side in contact with layer A is 35 mN / m or more, and surface energy B2 of a surface of layer B opposite to the side in contact with layer A is 25 mN / m or less.

A photoresist film forming process to form a film through a spin coating method is included, a plurality of groove portions (90) and a plurality of wall portions (95) are formed in an upper surface (88a) of a flow regulating plate (88), among the plurality of groove portions (90), the diameter of the outer side surface (91a) of a first groove portion (91) is set to be smaller than the longest distance (alpha) from the rotation center (K) to the outer edge (66) of the square wafer (65), and is set to be larger than the shortest distance (beta) from the rotation center (K) to the outer edge (66) of the square wafer (65), and among the plurality of groove portions (90), the diameter of the outer side surface (92a) of a second groove portion (92) is set to be smaller than the shortest distance (beta) from the rotation center (K) to the outer edge (66) of the square wafer (65).

The present invention provides an optical laminate which is suppressed in film thickness unevenness of an optically anisotropic layer and is free from point defects, a method of producing the same, and a polarizing plate and an organic EL display device using the optical laminate. The method of producing an optical laminate having an optically anisotropic layer A and an optically anisotropic layer B, includes where the layer A and the layer B are provided in direct contact with each other. The method further includes where both a composition a for forming the layer A and a composition b for forming the layer B contain a fluorine compound, and when the layer A is formed using composition a and layer B is formed using composition b, layer A and layer B are formed in this order under the condition that composition a and composition b satisfy predetermined surface tension relationships.

The invention relates to an ink-jet printing method, device, and system, computer equipment, and a storage medium. The ink-jet printing method includes the following steps: the number of multiple participation spray nozzles is obtained for multiple preset ink-jet angles; the number of the participation spray nozzles includes the number of spray nozzles participating in ink-jet when a printing taskis performed; an ink-jet angle with a maximum number of the participation spray nozzles is utilized as a target ink-jet angle; and the target ink-jet angle is transmitted to ink-jet printing equipment for the ink-jet printing equipment to perform the printing task according to the target ink-jet angle. Through the ink-jet printing method of the invention, the performance of an OLED device is improved.

The invention relates to an inkjet printing method and device, computer equipment and a storage medium. The inkjet printing method comprises the steps that printing parameter information and to-be-printed pixel unit arrangement information are obtained, a repeated pixel unit set is selected according to the arrangement information, ink dripping position information corresponding to the repeated pixel unit set is identified according to the repeated pixel unit set, and inkjet printing is conducted according to the printing parameter information and the ink dripping position information. By adopting the inkjet printing method to conduct inkjet printing, the printing efficiency can be improved, the problem that the printing time is excessively long in the inkjet printing process is solved, the phenomenon of uneven film thickness after an ink material is dried is avoided, and the better printing effect is achieved.