The invention discloses a horizontal control and automatic focusing
system for a
silicon chip platform of a photoetching
machine and a method thereof. The
system comprises a
mask plate, a lens, a
silicon chip object stage, a focal plane space image collection
detector array and a
feedback controller system, moreover, the system also comprises a
projection lens and a
beam splitting plate which can conduct light splitting on the reflected
light beam; the
projection lens and the focal plane space image collection
detector array collect the image formed by reflection on the surface of the
silicon chip and amplify the image. According to the principle of reversibility of
optical path, as the invention adopts the
confocal detecting method usually used in
optics, the invention improves detecting accuracy of the
silicon chip horizontal
control system and realizes automatic focusing, therefore, the invention improves the accuracy of the
silicon chip horizontal
control system and enlarges the photoetching technique window, moreover, the invention greatly decreases the requirement of the photoetching technology for the photoetching equipment while the cost of the equipment is reduced and manufacturing technique is improved; the invention can conduct horizontal
position control and automatic focusing on the
silicon chip in real time, accurately and automatically.