The invention discloses a multilayer-film filling type composite medium nanometer period
grating structure and a manufacturing method of the multilayer-film filling type composite medium nanometer period
grating structure. The multilayer-film filling type composite medium nanometer period
grating structure is composed of a one-dimensional periodicity multi-layer
film structure formed by medium gratings in a compounded mode, the duty ratio of the medium gratings is 1:1, and the period of the medium gratings is 100 nanometers to 1
micrometer. Medium materials with the
refraction index different from the
refraction index of the medium gratings and the heights same as the heights of the medium gratings are deposited at the positions of gaps of the concave portions of the medium gratings, and the multi-layer
film structure is composed of two different kinds of medium materials in an alternative mode. The manufacturing method includes the main steps that (1) an
ion beam assists an
electron beam evaporating
coating technology to manufacture a periodicity multi-layer film
photonic crystal on the substrate, and (2) the nanometer coining technology, the reaction
ion etching process and the
electron beam
evaporation coating and lifting-away technology are used for manufacturing the one-dimensional filling type composite medium on the medium multilayer films. The manufacturing method of the multiplayer-film filling type composite medium nanometer period grating structure is convenient to use and reliable. According to the filling type composite medium nanometer period grating structure, spectrum sidebands can be effectively restrained, the transmissivity or the reflection rate of a mode guiding
resonant filter is improved, and the performance of the mode guiding
resonance filter is improved.