Multilayer-film filling type composite medium nanometer period grating structure and manufacturing method of multilayer-film filling type composite medium nanometer period grating structure

Abstract

The invention discloses a multilayer-film filling type composite medium nanometer period grating structure and a manufacturing method of the multilayer-film filling type composite medium nanometer period grating structure. The multilayer-film filling type composite medium nanometer period grating structure is composed of a one-dimensional periodicity multi-layer film structure formed by medium gratings in a compounded mode, the duty ratio of the medium gratings is 1:1, and the period of the medium gratings is 100 nanometers to 1 micrometer. Medium materials with the refraction index different from the refraction index of the medium gratings and the heights same as the heights of the medium gratings are deposited at the positions of gaps of the concave portions of the medium gratings, and the multi-layer film structure is composed of two different kinds of medium materials in an alternative mode. The manufacturing method includes the main steps that (1) an ion beam assists an electron beam evaporating coating technology to manufacture a periodicity multi-layer film photonic crystal on the substrate, and (2) the nanometer coining technology, the reaction ion etching process and the electron beam evaporation coating and lifting-away technology are used for manufacturing the one-dimensional filling type composite medium on the medium multilayer films. The manufacturing method of the multiplayer-film filling type composite medium nanometer period grating structure is convenient to use and reliable. According to the filling type composite medium nanometer period grating structure, spectrum sidebands can be effectively restrained, the transmissivity or the reflection rate of a mode guiding resonant filter is improved, and the performance of the mode guiding resonance filter is improved.

Description

technical field [0001] The invention relates to a one-dimensional photonic crystal multilayer film-filled composite dielectric grating structure based on nanoimprinting technology to manufacture optical high-performance reflection elements and high-transmission ultra-narrow-band filters. Background technique [0002] Compared with traditional optical filters, such as F-P optical filters, fiber Bragg gratings, etc., the guided mode resonant filter (GMRF) has relatively simple structure, ultra-narrow peak half-width, ultra-wide cut-off frequency domain width, etc. Advantages, it can be well used in most complex and precise optical systems, such as high-performance reflective elements, high transmittance devices, narrow-band filters, optical switches, wavelength division multiplexers, and polarization separation. Moreover, the periodic structure can provide the possibility of phase matching, and the guided mode resonance effect can occur even under the condition of normal incid...

AI Technical Summary

Problems solved by technology

In order to overcome the problem that the metal grating absorbs large incident waves, a dielectric film grating is used to replace the metal film grating; in order to overcome the deficiencies in the transmission or reflection performance of the relief grating, a filled grating is used to replace the relief grating, by replacing the filled grating layer The optimal adjustment of the two dielectric materials and structural parameters is aimed at artificially adjusting the modulation factor of the grating layer, and then used to improve or improve the related optical properties of the guided mode resonant grating

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