The invention relates to a
photon sieve phase contrast objective lens which comprises a
photon sieve lens formed by a substrate and a plurality of light-transmitting holes arranged on the substrate, and a phase-changing plate arranged on the surface of the
photon sieve lens, wherein the phase-changing plate is positioned at the middle part of the
photon sieve lens or on the edge around the
photon sieve lens, and the center of the
photon sieve lens and the center of the phase-changing plate are positioned on the same axial line. In addition, the invention further provides a manufacturing method of the photon sieve phase contrast objective lens and an imaging method. In the photon sieve phase contrast objective lens, the manufacturing method and the imaging method, the photon sieve lens is adopted for suppressing
side lobe and high-order
diffraction focus, thereby realizing high imaging resolution and high imaging contrast; and the photon sieve lens and the phase-changing plate are etched on the same substrate, the phase-changing plate is arranged on the surface of the photon sieve lens, and the center of the photon sieve lens and the center of the phase-changing plate are positioned on the same axial line, thereby being capable of realizing precise alignment, simultaneously reducing
exposure time and
exposure dose and being capable of realizing non-destructive detection with high imaging resolution and high imaging contrast of a minute structure in a weakly absorbing material.