77results about How to "Minimizes and remove" patented technology

A system and method for aligning and reducing the relative movement between adjacent fuel cells within a fuel cell stack. The inter-cell cooperation between fuel cells along a stacking dimension is enhanced by one or more datum placed along the edge of a bipolar plate that makes up a part of a cell-containing assembly. The datum is shaped along a thickness dimension that substantially coincides with the cell stacking dimension to promote a nested fit with a comparable datum on an adjacently-stacked bipolar plate. This nesting facilitates an interference fit that enhances the resistance to sliding movement between respective cells that may otherwise arise out of the occurrence of a significant acceleration along the dimension that defines the major surfaces of the plates, cells and their respective assemblies. In one form, the use of welding, bonding or related attachment of the datum to the plate promotes enhanced metallic support without the need for increasing the plate footprint and without having to overmold the datum directly onto the plate.

A semiconductor system includes: providing a dielectric layer; providing a conductor in the dielectric layer, the conductor exposed at the top of the dielectric layer; capping the exposed conductor; and modifying the surface of the dielectric layer, modifying the surface of the dielectric layer, wherein modifying the surface includes cleaning conductor ions from the dielectric layer by dissolving the conductor in a low pH solution, dissolving the dielectric layer under the conductor ions, mechanically enhanced cleaning, or chemisorbing a hydrophobic layer on the dielectric layer.

A graphical user interface is used along with an automated algorithm selection function to enable market participants to initiate automated, multi-algorithm trading strategies through a single drag and drop motion. A symbol representing a security can be dragged and dropped onto an icon representing a tactical or strategic algorithm. Other features of the graphical user interface show information such as the progress of the algorithms. Fast switching and safe mode are used to minimize a cost associated with algorithm switching.

A retractor and a surgical tool are positioned within a cannula, and a dissection cradle of the retractor is positioned at the distal end of the cannula. The retractor includes a dissection cradle that is resiliently supported along an axis skewed relative to the axis of the cannula. The dissection cradle, in operation, is extended to cradle the target vessel, and the retractor may be fully extended to urge the vessel away from the axis of the cannula to isolate a side branch for exposure to a surgical tool. The retractor includes a hollow support and a spray nozzle disposed in the distal end of the retractor to form an irrigation system and lens washer that can be selectively positioned to direct the spray of irrigation fluid at a remote surgical site or at an endoscopic lens.

A process for smoothing a rough surface on a substrate, such as a diamond or silicon carbide substrate, said rough surface including protruding peak portions separated by valleys, said smoothing comprising (a) depositing a coating on said rough surface so as to adhere to and to fill at least the valleys of said rough surface, (b) mechanically polishing the thus coated rough surface so as to achieve a smooth coated surface, and (c) dry etching the smooth coated surface, such as by PACE, so as to remove the remaining coating and at least protruding peak portions of the substrate so as to achieve a smooth surface on the substrate, wherein in the mechanical polishing step (b) the coating is removed at a rate of reduction of thickness greater than the rate at which the substrate is subject to reduction of thickness by the mechanical polishing, and in the dry etching step (c) the coating and substrate are removed at substantially the same or a similar rate of reduction of thickness, and, if necessary, steps (a), (b) and (c) are repeated, or the coating and substrate are removed in separate, alternate preferential etching steps.

The present invention provides a multi-step aqueous composition useful for polishing a tantalum barrier material and copper from a semiconductor wafer, comprising by weight percent 0.1 to 30 oxidizer, 0.01 to 3 inorganic salt or acid, 0.01 to 4 inhibitor, 0.1 to 30 abrasive, 0 to 15 complexing agent and balance water, wherein the aqueous composition has a pH between 1.5 to 6.

A method of repairing a defect in an annulus fibrosus of an intervertebral disc, without excising the entire nucleus pulposus of the disc. The method includes inserting an introducer needle through the annulus fibrosus by puncturing the annulus fibrosus with the introducer needle, injecting an in situ curable, bio-compatible polymerizable or polymeric material composition into the disc through the introducer needle directly or indirectly so that the in situ curable composition contacts a defect in the annulus fibrosus; and curing said material in situ.

A filter processing means removes periodic patterns caused by a scattered radiation removing means from radiation images, which are obtained by detecting radiation that has passed through the scattered radiation removing means with a radiation detector. The filter processing means removes only the spatial frequency components of the periodic pattern from the radiation images.

Devices, systems and methods for separation of magnetic particles with either hand held devices or automated instruments. Specifically, the production of magnetic fields for the separation of the particles within containers such as microtiter plates with a magnetic field that is substantially consistent for each well. Certain embodiments produce a magnetic field that is substantially uniform across each well bottom, while other embodiments produce a magnetic field that is stronger toward the outer region of each well.

An etchant for removing materials with a plurality of selectivities exhibits a first etch selectivity at a first temperature and a second etch selectivity at a second temperature. The etchant may include phosphoric acid, fluoboric acid, or sulfuric acid. The materials that the etchant is configured to remove may include dielectric materials, such as silicon nitride and silicon oxide. The first temperature may be about 175° C. and the second temperature may be about 155° C.

A semiconductor system includes: providing a dielectric layer; providing a conductor in the dielectric layer, the conductor exposed at the top of the dielectric layer; capping the exposed conductor; and modifying the surface of the dielectric layer, modifying the surface of the dielectric layer, wherein modifying the surface includes cleaning conductor ions from the dielectric layer by dissolving the conductor in a low pH solution, dissolving the dielectric layer under the conductor ions, mechanically enhanced cleaning, or chemisorbing a hydrophobic layer on the dielectric layer.

The present disclosure relates to a display for a personal immersion apparatus for embodying the virtual reality or the augmented reality. The present disclosure suggests a display for a personal immersion apparatus comprising: a display panel; and an imaging lens; wherein the display panel includes: a plurality of pixel areas disposed on a substrate; an emission area defined in the each pixel area; a non-emission area surrounding the emission area in the each pixel area; and a micro deflector configured to deflect lights scattered over the non-emission area from the emission area to a normal direction with respect to a surface of the substrate, and to provide the deflected lights to the imaging lens, and wherein the imaging lens is disposed apart from the display panel with a focal length of the imaging lens.

A method for manufacturing a nonlinear superelastic file comprising the steps of: providing a superelastic file having a shaft and a file axis; providing a fixture including a file groove being defined by one or more displacement members, the file groove configured for receiving the shaft; inserting at least a portion of the shaft into the fixture along the file groove, the portion of the shaft including a first portion of the shaft; contacting the first portion of the shaft with a first displacement member of the one or more displacement members such that the first portion of the shaft is displaced from the file axis thereby forming a first offset portion of the shaft; heating the portion of the shaft while inserted in the fixture to a temperature of at least about 300° C. for a time period of at least about 1 minute to shape-set the portion of the shaft thereby forming a shape-set nonlinear file.

A method and apparatus for remediating waster water holding areas and the like includes a closed, foraminous dewatering membrane that is positioned adjacent to the wastewater holding area. Sludge and adjacent water on the bottom of the wastewater holding area are pumped in the form of a sludge slurry into the interior of the dewatering membrane. The water is removed from the sludge slurry by allowing gravitational forces to flow water through the dewatering membrane. The dewatering membrane is then opened, and the dewatered sludge is removed for depositing at an appropriate site.