32results about How to "Low number of scratches" patented technology

The invention discloses a preparation method of marble composite polishing powder and application of the preparation method in a polishing process of marble production and refurbishment. The method comprises dissolving 5%-18% of zirconium oxychloride in water, adding 50%-65% of aluminum oxide, adding 10%-22% of stannic oxide, adding 2%-8% of silicon dioxide, stirring to be slurry, adding 10%-25% of urea, conducting heating reaction, solid-liquid separation, drying and roasting, mixing with lead powder according to the proportion of 10-25:1, and then obtaining the marble composite polishing powder. The preparation process is simple, preparation methods are easy to control, production cost is low, and industrial production is easy to achieve. The preparation method is used for a marble polishing procedure, the marble composite polishing powder has good polishing effects, glossiness can achieve more than 98 degrees, scratches are fewer, evenness is high, and using amount of the powder is less.

The invention relates to a chemical mechanical polishing abrasive particle CeO2 and a method for preparing the same, belonging to the rare earth powder material chemical preparation technical field. The invention is to prepare the CMP abrasive particle by utilization of cerous inorganic salt solution and homogeneous precipitation agent. The method comprises the following steps that: the cerous inorganic salt and the precipitation agent are prepared into solution with certain proportion; the solution is uniformly mixed through ultrasonic vibration; deposits are generated after the solution is heated to a certain temperature; serum is kept stand, aged, filtered and calcined, and then the CeO2 abrasive particle is prepared. The method also accelerates the nucleation rate through addition of surface active agent so as to reduce the reaction temperature, and simultaneously the nodulizing degree of the abrasive particle obtained is also good. The method prepares the CMP abrasive particle, wherein, the CMP abrasive particle belongs to the single-phase cubic crystal system; the space group is O<5>H-FM3M; the dispersibility is good; the grain fineness distribution is uniform; the shape is similar to a sphere; and the specific surface area BET is more than 0 and less than 50m<2> / g.

The invention provides an axillary osmidrosis suction and scraping needle with a pointed end. The axillary osmidrosis suction and scraping needle with the pointed end is composed of a sucker body, a connector and a handle, wherein the front end of the sucker body is the pointed end, a positive side hole is formed in a sharp inclined face in an open state and is located in the same direction with the inclined face, a left side hole and a right side hole are formed in the two sides of the positive side hole, and a three-hole suction and scraping needle is formed; or a negative side hole is formed in the back face of the positive side hole, and a four-hole suction and scraping needle is formed. According to the axillary osmidrosis suction and scraping needle with the pointed end, the number, the size and the arrangement design of the side holes are reasonable, a whole holding portion can be covered, sucked and scraped by the needle at a time, the suction and scraping holes are reasonable in arrangement, and the portion within the small range can also be sucked and scraped. The pointed end inclined face facilitates inserting of the needle tightly attached to the dermis deep face, meanwhile, the inclined face of the pointed end is an effective suction and scraping part, requirements of a surgery are met, using is safe and effective, and population and using are easy.

The invention discloses a preparation method of granite polishing powder. The preparation method is characterized by comprising the steps of (1) preparation of ZrN-CeO2-SiO2 compounds: the following ingredients including 38 to 44 percent of water, 25 to 30 percent of cerium chloride, 15 to 20 percent of zirconium nitride and 8 to 12 percent of silicon dioxide are added; after stirring and dissolution, 4 to 8 percent of ammonium hydroxide is added; room-temperature stirring and reaction are performed for 40 min; solid-liquid separation is performed; drying and roasting are performed for 2h; cooling and smashing are performed to prepare the faint yellow ZrN-CeO2-SiO2 compound; (2) preparation of granite polishing powder: the following ingredients including 22 to 28 percent of ZrN-CeO2-SiO2 compounds, 10 to 15 percent of oxalate dihydrate and 15 to 20 percent of sodium oxalate are added, are ground and are uniformly mixed; 20 to 25 percent of ammonium fluozirconate and 20 to 25 percent of palmitic acid are added, and are ground and uniformly mixed; 2.0 to 4.0 percent of paraffin powder is added; grinding and uniform mixing are performed to obtain the faint yellow granite polishing powder. The characteristic of chemical polishing is realized, so that the polishing effect of the chemical polishing powder is good; the glossiness can reach 98 degrees or higher; the scratch number is small; the flatness is high; the consumption is low.

The present invention relates to a sapphire substrate submerged chemical mechanical polishing method. The polishing method is as follows: (1) Pretreatment: attach the sapphire substrate to a hard ceramic disk and install it on the main shaft of the polishing machine; install the polishing pad on the On the rotating chassis; mix reverse osmosis pure water and silica polishing liquid into the polishing machine, and keep the liquid level between the upper limit liquid level line of the polishing liquid and the lower limit liquid level line of the polishing liquid; (2) Polishing: start the polishing machine, Carry out the polishing of sapphire substrate, the polishing processing time is 40-80min, and the polished sapphire substrate is obtained; (3) the finished sapphire substrate is obtained after cleaning; , The adsorption pad has a long service life, and at the same time, it is a chemical mechanical polishing method with no micro scratches on the surface of the sapphire substrate during the polishing process.

The invention discloses a method for manufacturing a circuit board, comprising: obtaining a plate to be punched; wherein, the plate has N plate areas to be punched; N≥1; punching from the plate area Cutting out the circuit board; pressing the punched out circuit board back to the corresponding panel area so that the circuit board is fixed in the remaining material of the panel; inspecting the circuit boards in the panel one by one; Take out the qualified circuit board from the board. By adopting the embodiment of the present invention, the production efficiency and inspection accuracy of the circuit board can be improved.

The invention discloses a preparation method of marble polishing powder. The method is characterized by comprising the following process steps of adding the following ingredients in percentage concentration by mass into a grinding machine: 47 to 53 percent of oxalate dihydrate, 12 to 15 percent of aluminum oxide and 5 to 10 percent of stannic oxide; performing grinding and uniform mixing; adding 6 to 10 percent of sodium binoxalate and 15 to 21 percent of stearic acid; performing grinding and uniform mixing; then adding 2 to 4 percent of paraffin powder and 0.3 to 1.0 percent of fatty alcohol polyoxy ether, wherein the sum of all ingredients is hundred percent; performing grinding and uniform mixing; obtaining the marble polishing powder with the particle diameter being 2.0 to 10 mu m. The polishing powder has the advantages that chemical reaction is taken between the polishing powder and marble in the polishing process; the chemical polishing characteristics are realized, so that the polishing effect of the polishing powder is good; the luster degree is high; scratch marks are few; the flatness and smoothness degree is high; the consumption is low; the corrosion of oxalic acid can be buffered through the addition of the sodium binoxalate.

The invention discloses undaria pinnatifida stem slicing and shredding integrated equipment which comprises a rack, a connecting frame, a cutting device base, a shredding device support, a belt conveyor and the like, fixing parts are fixedly installed on the two sides of the cutting device base, blades are embedded in the fixing parts, and undaria pinnatifida stems are sliced through the blades; a sliding rail is fixedly installed on the shredding device support, a sliding block is connected into the sliding rail in a sliding mode, the sliding block is fixedly connected with a knife rest, and a shredding knife is installed on the knife rest in a rotating mode and can be used for shredding flaky undaria pinnatifida stems into shreds. And finally conveying the undaria pinnatifida stems. In the using process, the interval between the cutters can be changed according to the requirements of a user, and the applicability is high. According to the undaria pinnatifida stem shredding machine, undaria pinnatifida stems are firstly sliced in a full-automatic mode, then the shredding device is used for shredding, the structure is simple, the processing efficiency and the quality of undaria pinnatifida stem shreds can be improved, and the production cost is reduced.

The invention provides an axillary osmidrosis pumping and scraping needle with a round head. The axillary osmidrosis pumping and scraping needle with the round head is composed of a sucking pipe body, a connector and a handle. The sucking pipe body is a cylindrical hollow pipe, the connector is located at the tail end of the sucking pipe body, the sucking pipe body is connected with the handle through the connector, the front end of the sucking pipe body is in the shape of a closed cone, a relatively-pointed head end is arranged at the front end of the sucking pipe body, and three or four side holes are formed in the portion close to the head end. According to the axillary osmidrosis pumping and scraping needle with the round head, the number, size, arrangement and the like of the side holes are reasonable in design, the side holes can pump, scrape and cover the whole holding position at a time, the pumping and scraping holes are reasonable in arrangement, and a small range can also be pumped and scraped. The design of the conical front end enables the needle to be tightly attached to and inserted into the deep face of the corium along the original layer face, the situations that the skin is penetrated, an operator is injured, and muscles in the deep face are damaged are avoided, and the axillary osmidrosis pumping and scraping needle with the round head meets operation requirements, is safe and effective to use, and easy to popularize and use.

The invention discloses a preparation method of a terrazzo polishing powder. The preparation method is characterized in that the Al2O3 (aluminum oxide)-SiO2 (silicon dioxide)-Fe2O3 (ferric oxide) compound is used as a grinding material, oxalic acid is used as an acid polishing agent, and a dispersant, a surfactant and the like are used as additives, so as to prepare the polishing powder. The preparation method specifically comprises the following steps of adding the following components into a reactor, such as 50 to 58% of water, and 4 to 8% of ferric trichloride; after stirring and dissolving, adding 22 to 28% of aluminum oxide, and 10 to 15% of silicon dioxide, and adding 3 to 6% of ammonia water, wherein the sum of the components is 100%; stirring to react for 30min at room temperature, separating solid and liquid, drying at the temperature of 105+ / -2 DEG C, roasting for 2h at the temperature of 500+ / -10 DEG C, cooling, and crushing by air flow, so as to obtain the Al2O3-SiO2-Fe2O3 compound. The polishing powder has the advantages that the polishing effect is good, the glossiness is high, the number of scratches is fewer, the flatness is high, and the usage amount is small.

The invention discloses a method for preparing a boron nitride composite polishing liquid, which is characterized in that, in the grinder, the following composition mass percentage concentration is added, water: 28-38%, ammonium dichromate: 18-26%, Zirconium oxychloride: 12~20%, nano-boron nitride: 24~32%, turn on the grinder, grind, dry, and roast to obtain the BN‑Cr2O3‑ZrO2 compound; then in the reactor, the composition mass is as follows Concentration added, water: 70~78%, lignosulfonate: 2.0~4.0%, isopropanol: 3.0~5.0%, potassium bromate: 1.0~5.0%, BN‑Cr2O3‑ZrO2 complex: 14~22 %, at a speed of 300 r / min, stir and react for 4~6h to obtain a boron nitride composite polishing solution. The preparation process is simple, the conditions are easy to control, the production cost is low, and the industrial production is easy. During the polishing process, it has a good liquid polishing effect, no scratches, high flatness, less dosage, anti-corrosion, and easy to wash.

The invention discloses a preparation method of polishing powder for granite polishing. The preparation method is characterized by comprising the following steps: (1) preparation of a ZrN-ZrO2-SiN2 compound: adding the following components: 42-48% of water, 25-30% of zirconium oxychloride, 10-15% of zirconium nitride and 10-15% of silicon nitride, performing stirring for dissolution, adding 2-4% of sodium hydroxide, performing stirring reaction at a room temperature, performing solid-liquid separation, drying, roasting, and crushing to obtain the ZrN-ZrO2-SiN compound; and (2) preparation thepolishing powder for granite: adding 32-38% of the ZrN-ZrO2-SiN compound, 12-18% of oxalic acid and 12-18% of ammonium binoxalate, performing grinding and uniform mixing, adding 15-20% of ammonium fluoborate and 15-20% of stearic acid, performing grinding and uniform mixing, adding 1.0-2.0% of sodium dodecyl sulfate, and performing grinding and uniform mixing to obtain the polishing powder for granite. The polishing powder has the characteristics of chemical polishing, and has a good polishing effect, high glossiness, few scratches, and high flatness and a small usage amount, and the corrosionof oxalic acid can be buffered with the addition of the ammonium bioxalate.

The invention discloses a preparation method for marble polishing liquid and its application in the polishing process in marble production and renovation. It is characterized in that it is added according to the following composition mass percentage concentration, deionized water: 48~58%, polymaleic anhydride: 0.5~2.0%, polyethylene glycol: 0.5~2.0%, AlN-CeO2 complex: 40~ 50%, the sum of each component is 100%, stir, adjust the pH to neutral with ammonia water, and get the marble polishing solution. The preparation process is simple, the conditions are easy to control, the production cost is low, and the industrial production is easy. Used in marble polishing process, it has good powder polishing effect, glossiness can reach more than 98 degrees, less scratches, high flatness, and less powder consumption.