A kind of preparation method of boron nitride composite polishing liquid

Abstract

The invention discloses a method for preparing a boron nitride composite polishing liquid, which is characterized in that, in the grinder, the following composition mass percentage concentration is added, water: 28-38%, ammonium dichromate: 18-26%, Zirconium oxychloride: 12~20%, nano-boron nitride: 24~32%, turn on the grinder, grind, dry, and roast to obtain the BN‑Cr2O3‑ZrO2 compound; then in the reactor, the composition mass is as follows Concentration added, water: 70~78%, lignosulfonate: 2.0~4.0%, isopropanol: 3.0~5.0%, potassium bromate: 1.0~5.0%, BN‑Cr2O3‑ZrO2 complex: 14~22 %, at a speed of 300 r / min, stir and react for 4~6h to obtain a boron nitride composite polishing solution. The preparation process is simple, the conditions are easy to control, the production cost is low, and the industrial production is easy. During the polishing process, it has a good liquid polishing effect, no scratches, high flatness, less dosage, anti-corrosion, and easy to wash.

Description

technical field [0001] The present invention relates to the technical field of preparation of a polishing liquid, in particular to a preparation method of a boron nitride composite polishing liquid [0002] And used in the polishing of disk substrates and magnetic heads. Background technique [0003] The disk substrate is generally made of aluminum-magnesium alloy or glass material. With the rapid development of the computer industry, especially with the rapid increase in the storage density of computer disks, the magnetic head is required to read smaller and weaker signals. Therefore, the magnetic head and The distance between the disk media is further reduced to increase the strength of the output signal. At present, the gap between the magnetic head and the magnetic disk has been reduced to about 10nm. The surface roughness, scratches and impurity particles of the magnetic head and magnetic disk will cause fatal damage to the computer magnetic disk. It is expected that ...

AI Technical Summary

Problems solved by technology

[0006] The traditional chemical mechanical polishing (CMP) technology is an important means of computer hard disk processing at present. It realizes the removal of materials and the flattening of the workpiece surface under the combination of chemical and mechanical effects. Although the material removal rate of the workpiece is high, the polishing process Due to the high hardness of nano-abrasive particles, easy agglomeration, and poor dispersion, the surface of the workpiece is prone to damage such as dents, corrosion, micro-scratches, and particle residues. However, it cannot well meet the current requirements for the surface smoothing process of atomic-level materials on the surface of hard disks.

[0007] The existing polishing liquid is acidic and corrosive to a certain extent. It is easy to damage the edge of the computer hard disk when it is applied to the computer hard disk, and it is easy to affect the life of the polishing machine.