Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

168results about How to "Inhibit overall enlargement" patented technology

Exhaust gas purification system of internal combustion engine

An electronic control unit (ECU) of an internal combustion engine calculates a present deposition quantity of exhaust particulate matters based on operating states of the engine such as a differential pressure of a diesel particulate filter (DPF). If the present deposition quantity exceeds a predetermined upper limit value, the ECU performs compulsory regeneration of the DPF to compulsorily combust and reduce the deposited exhaust particulate matters. The ECU determines that spontaneous regeneration occurs if a temperature of exhaust gas in the DPF is equal to or higher than a reference temperature. Thereafter, the ECU completes the compulsory regeneration to eliminate the deposited exhaust particulate matters if the ECU determines that the spontaneous regeneration stops and the deposition quantity becomes equal to or less than a predetermined lower limit value.
Owner:DENSO CORP

Liquid crystal display apparatus

A columnar spacer is interposed between a first substrate and a second substrate for holding a liquid crystal layer between them. The columnar spacer is formed in such a manner as to have an area superposed, in each pixel, with the contact hole formed in the first substrate and an area not superposed with said contact hole. Even in the case where the first and second substrates attached to each other are displaced from each other, the columnar spacer never falls in the contact hole and a desired cell gap can be positively secured. Also, since the columnar spacer is not located in the contact hole, no margin for substrate attachment is required to form the contact hole in the first substrate, thereby improving the open area ratio effective for display for improved display quality.
Owner:UNIFIED INNOVATIVE TECH

Charging system, charging apparatus and battery pack

InactiveUS20080129252A1Increase battery capacityRestraining the secondary battery from deterioratingBatteries circuit arrangementsElectric powerVoltage referenceEngineering
A charging system is provided which includes: a secondary battery which includes a heat-resistant member having a heat-resistance property between a negative electrode and a positive electrode thereof; a charging-voltage supply section which supplies a charging voltage for charging the secondary battery; a charge control section which controls the operation of the charging-voltage supply section on the basis of a reference voltage corresponding to the voltage between the negative electrode and the positive electrode in a full-charge state where the lithium-reference electric potential of the negative electrode is substantially zero volts; and a mode-setting acceptance section which chooses and accepts the setting of either of an ordinary charge mode and a high-voltage charge mode, in which if the mode-setting acceptance section accepts the setting of the ordinary charge mode, then the charge control section allows the charging-voltage supply section to supply, to the secondary battery, a first set voltage equal to, or below, the reference voltage as the charging voltage, and if the mode-setting acceptance section accepts the setting of the high-voltage charge mode, then the charge control section allows the charging-voltage supply section to supply, to the secondary battery, a second set voltage above the reference voltage as the charging voltage, so that the secondary battery is charged.
Owner:PANASONIC CORP

Mist spraying apparatus and method, and image forming apparatus

InactiveUS20060209129A1Suppressing amount of chargeImprove the deposition effectPrintingElectricityAcceleration voltage
The mist spraying apparatus comprises: a pressure chamber into which liquid is filled; a charging electrode which is in contact with the liquid and charges the liquid; a vibration generating device which converts the liquid into droplets by applying vibrational energy to the liquid inside the liquid chamber, thereby generating a charged mist; a rear surface electrode which is disposed so as to oppose an ejection surface including an ejection port ejecting the charged mist, and holds an liquid receiving medium onto which the charged mist is deposited from the ejection port; an acceleration electrode which is disposed at a position separated by a prescribed distance in an outward radial direction from an edge of the ejection port, and generates an electric field for acceleration between the acceleration electrode and the opposing rear surface electrode; a charging voltage application device which applies a charging voltage to the charging electrode; and an acceleration voltage application device which applies an acceleration voltage that is higher than the charging voltage to the acceleration electrode, thereby generating, between the acceleration electrode and the rear surface electrode, the electric field for acceleration having an electric field intensity which is greater than an electric field intensity generated between the charging electrode and the rear surface electrode by the voltage applied from the charging voltage application device.
Owner:FUJIFILM CORP

High density ultra-fine fabrics

InactiveUS20110111666A1Soft silky feelEfficiently applyLayered productsBed linenPolyesterWater soluble
Provided is a high-density micro fabric, and more particularly, a high-density micro fabric which eliminates the necessity of a cire processing as a post-processing. The high-density micro fabric is woven using warp and weft yarns, wherein a single strand fineness of either of a warp or weft yarn or both of the warp and weft yarns is in the range of 5 denier to 100 denier, a fineness of a monofilament constituting one strand of either of a warp or weft yarn or both of the warp and weft yarns is in the range of 0.1 denier to 1.5 denier, the warp yarn is nylon, polyester, or a composite yarn including nylon and polyester, and the weft yarn is nylon, polyester, or a composite yarn including nylon and polyester, and a high shrinkage nylon yarn, a nylon partially oriented yarn, a nylon spin draw yarn having an elongation at break of 25% or higher, or a water soluble PVA-based yarn that is removed by water during a scouring process or a dyeing process is mixed or arranged with either of a warp or weft yarn, and k value of a shrunken fabric is 22 or greater.
Owner:KIM EE

Tube connection, in particular, for connecting two tubular fuselage portions of a missile

InactiveUS6098928AHighly stable and highly stiffHighly stable and highly stiff connectionFuselage framesSelf-propelled projectilesEngineeringFuselage
A connection is described for connecting two tubular fuselage portions of a missile. The inner diameter of the rim of a first tubular fuselage portion to be connected with a second tubular fuselage portion corresponds to the outer diameter of the rim of the second tubular fuselage portion to be connected to the first tubular fuselage portion, deducting a jointing tolerance, The rims of the tubular fuselage portion to be connected are provided with radial bores to accommodate connection screws, Clamp segments are mounted in the second tubular fuselage portion along the inner circumference thereof. The clamp segments define threaded bores, connection screws being screwed into these threaded bores.
Owner:BODENSEEWERK GERATETECHNIK GMBH

Substrate processing apparatus, substrate processing method and storage medium

A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.
Owner:TOKYO ELECTRON LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products