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87results about How to "Increase ion density" patented technology

Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density

A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer while inductively coupling RF plasma source power into the process region. A particular plasma ion density level is established by maintaining the total amount of plasma source power inductively and capacitively coupled into the chamber at a level that provides the desired plasma ion density. Chemical species distribution or content in the process region plasma is controlled by adjusting the ratio between the amounts of the capacitively coupled power and the inductively coupled power while continuing to maintain the level of total plasma source power. The method further includes applying independently adjustable LF bias power and HF bias power to the workpiece and adjusting the average value and population distribution of ion energy at the surface of the workpiece by adjusting the proportion between the LF and HF bias powers.
Owner:APPLIED MATERIALS INC

Electrolytic machining method and apparatus

An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
Owner:MORI YUZO +1

Non-ambipolar electric pressure plasma uniformity control

This disclosure relates to a plasma processing system for controlling plasma density near the edge or perimeter of a substrate that is being processed. The plasma processing system may include a plasma chamber that can receive and process the substrate using plasma for etching the substrate, doping the substrate, or depositing a film on the substrate. This disclosure relates to a plasma processing system that may be configured to enable non-ambipolar diffusion to counter ion loss to the chamber wall. The plasma processing system may include a ring cavity coupled to the plasma processing system that is in fluid communication with plasma generated in the plasma processing system. The ring cavity may be coupled to a power source to form plasma that may diffuse ions into the plasma processing system to minimize the impact of ion loss to the chamber wall.
Owner:TOKYO ELECTRON LTD

Ultrasonic atomization atmospheric-pressure glow-discharge ionization apparatus

The invention relates to an ultrasonic atomization atmospheric-pressure glow-discharge ionization apparatus. The apparatus comprises an ultrasonic atomization apparatus, an atmospheric-pressure glow-discharge apparatus, a high-voltage power supply and a sample inlet interface, wherein the ultrasonic atomization apparatus comprises a sample inlet pipe, a sample container, a liquid inlet pump, an ultrasonic atomizer and a spraying nozzle; the sample inlet pipe is connected with the sample container and the liquid inlet pump; the liquid inlet pump is used for extracting a water sample of a liquid sample; the liquid outlet end of the liquid inlet pump is connected with the ultrasonic atomizer; and the atmospheric-pressure glow-discharge apparatus comprises a discharging needle, a high-voltage glow reaction chamber and a sample inlet conical opening. By virtue of ultrasonic atomization, the liquid sample, which is not suitable for volatilization, can be directly sampled, without requiring complex pretreatment, so that sensitive and rapid mass spectrometry can be realize; and therefore, the ultrasonic atomization atmospheric-pressure glow-discharge ionization apparatus is wide in application prospect in rapid mass spectrometry of food, pesticides, environment and the like.
Owner:CHINA UNIV OF PETROLEUM (EAST CHINA)

Liquid crystal display device

The present invention relates to a liquid crystal display device that uses a particular liquid crystal composition and a color filter that uses a particular pigment.The present invention provides a liquid crystal display device that prevents a decrease in voltage holding ratio (VHR) and an increase in ion density (ID) of a liquid crystal layer and resolves the problems of display defects, such as missing dots, alignment variation, and ghosting.Since the liquid crystal display device of the present invention prevents a decrease in voltage holding ratio (VHR) and an increase in ion density (ID) of a liquid crystal layer and resolves the problems of display defects, such as ghosting, it is particularly useful for active matrix drive VA-mode and PSVA-mode liquid crystal display devices and can be applied to liquid crystal display devices such as liquid crystal televisions, monitors, cellular phones, and smart phones.
Owner:DAINIPPON INK & CHEM INC

Plasma Sterilization System

An improved system relating to sterilizing the surfaces of objects using a dual-frequency plasma-based process.
Owner:FRLIN MARK A +1
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