A high-temperature-resistant non-
silicon release film includes a release substrate layer, one surface of the release substrate layer is coated with an
adhesive coating, the other side of the release substrate layer is provided with a polyphenylene
sulfide high-temperature resistant layer, the outer side of the polyphenylene
sulfide high-temperature resistant layer is bonded with an antistatic layer, a
polyethylene waterproof layer and a buffer layer are arranged between the polyphenylene
sulfide high-temperature resistant layer and the release substrate layer, the
polyethylene waterproof layeris positioned between the polyphenylene sulfide high-temperature resistant layer and the buffer layer, and the buffer layer is bonded on the side of the release substrate layer away from the adhesivecoating. The advantages of that invention are simple structure, good use performance and good heat insulation and
flame retardancy, the film enhances the high-
temperature resistance of the product, improves the service life of the product even when the release film is used in a high-temperature environment, has a good antistatic effect, can effectively reduce
static electricity generated in the use process of the product, prevents accidents caused by
static electricity fire, and enhances the safety of the product in use.