The present invention is an apparatus and process for storing and delivering a low
vapor pressure process chemical to a process tool for
semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a
solvent container containing a quantity of
solvent, e) a second manifold for delivering the process chemical from the process container to a process tool; f) a
solvent recovery container for containing used solvent and removed process chemical, and, g) a solvent
evaporator to differentially remove solvent from process chemical in the solvent
recovery container by entrainment in a carrier gas, vacuum removal, heating or combinations thereof. The containers can be baffled on their
inert gas inlets. The cabinet can be heated.