62results about How to "Suitable for utilization" patented technology

The present invention provides lubricating grease which is excellent in durability at a high temperature, restrains a reaction from occurring between fluorine and steel, and has a long life; and a rolling bearing in which the lubricating grease is enclosed. The lubricating grease contains perfluoropolyether oil as a base oil thereof and fluorocarbon resin powder as a thickener thereof. The lubricating grease further contains an additive containing a substance capable of forming a film on a metal surface. The substance is a diurea compound having an —NH— bond in a molecular structure thereof, an organic-acid metal salt such as sodium sebacate, molybdate such as potassium molybdate or sodium molybdate, or a bismuth-containing compound such as bismuth sulfate. The rolling bearing has an inner ring and an outer ring disposed concentrically with each other, a plurality of rolling elements interposed between the inner ring and the outer ring, and a retainer dividedly holding the rolling elements. The lubricating grease is enclosed on the periphery of the rolling elements.

A roller element (10) is provided which has a central body (1) and a roller unit (2). The roller unit (2) is mounted so as to circulate on a non-circular race (21) about the central body (1) and so as to be mobile with respect to the central body (1) by the rolling movement of the rollers (3) of the roller unit (2) on the central body (1). The rollers (3) are configured as balls or substantially cylindrical elements. A peripheral surface of the rollers (3), for a substantial part, is shaped as a rolling surface that corresponds to the central body (1) and for rolling off on the central body (1). The elements of the roller unit (2) have play in relation to one another and / or the roller unit has play regarding its mobility in relation to the central body (1).

The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.

The present invention provides novel co-crystal forms of dapagliflozin, namely a dapagliflozin lactose co-crystal and a dapagliflozin asparagine co-crystal, to pharmaceutical compositions comprising same, methods for their preparation and uses thereof for treating type 2 diabetes.

A production process of a poly(arylene sulfide), including (a) a polymerization step of polymerizing at least one sulfur source selected from the group consisting of alkali metal sulfides and alkali metal hydrosulfides and a dihalo-aromatic compound in an organic amide solvent to form a polymer; (b) a separation step of separating the polymer from a liquid reaction mixture containing the polymer formed after the polymerization step; (c) a washing step of washing the polymer with at least one washing liquid selected from the group consisting of water, an organic solvent and a mixed solution of water and an organic solvent as desired; and (d) an aqueous oxidizing solution treatment step of treating the polymer by bringing the polymer into contact with an aqueous oxidizing solution.

The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening material contains a resin and a phase transfer catalyst. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.

The object of the present invention is to provide a resist pattern thickening material, etc. which, when coated over a resist pattern formed of ArF resist material, etc., can efficiently thicken the resist pattern such as lines and spaces pattern, etc. regardless of the composition of ArF resist material, and the like; which can easily control the thickening amount of resist pattern by process condition; and which can easily and efficiently form a fine space pattern beyond the exposure (resolution) limits of light sources of the exposure devices at low cost. The resist pattern thickening material of the present invention comprises a solubilizer which melts the resist pattern at the temperature near its melting point and- a water-soluble element. The process for forming a resist pattern of the present invention comprises forming a resist pattern and coating a resist pattern thickening material of the present invention over the surface of the resist pattern.

The present invention relates to an electronic toll settlement system and apparatus of a vehicle, more particularly, to a technology that settles a toll of a vehicle with a high-pass system through an identification card of a mobile communications terminal instead of a smart card in a high-pass terminal which is built in a mirror.

The present invention provides elastic polyurethane yarns which possess excellent elongation, recoverability, heat resistance and chemical resistance, as well as a method of manufacturing the same. The elastic polyurethane yarns comprise a polyurethane being composed mainly of a polymeric diol and a diisocyanate, and contains through incorporation a compound having within the molecule a phosphorus-nitrogen interatomic bond(s). The process can produce the elastic polyurethane yarns by adding to a solution of the polyurethane a compound having within the molecule a phosphorus-nitrogen interatomic bond(s), followed by spinning.