A well-isolated anti-SEU multi-node inversion memory cell layout structure, comprising well isolation regions (201), (202), (203), DICE unit regions (101), (103), (105), (107), DICE units (102), (104), (106), (108). The well isolation region is arranged crosswise between the two DICE cell regions. Compared with the prior art, the present invention further increases the distance between sensitive node pairs while effectively separating all sensitive node pairs in the DICE memory cell structure, and the well isolation structure is also beneficial to reduce the distance between sensitive node pairs. The parasitic bipolar transistor effect and the charge sharing effect greatly suppress the multi-node turnover caused by SEU in the DICE unit, and greatly improve the anti-SEU performance of the radiation-resistant SRAM.