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32results about How to "Problem is caused" patented technology

Method and apparatus for tracing packets

A system and method for performing source path isolation in a network. The system comprises an intrusion detection system (IDS), a source path isolation server (SS1) and at least one router configured to operate as a source path isolation router (SR1) operating within an autonomous system. When IDS detects a malicious packet, a message is sent to SS1. SS1 in turn generates a query message (QM) containing at least a portion of the malicious packet. Then, QM is sent to participating routers located one hop away. SR1 uses the query message to determine if it has observed the malicious packet by comparing it with locally stored information about packets having passed through SR1. SR1 sends a reply to SS1, and SS1 uses the reply to identify the ingress point into the network of the malicious packet.
Owner:STRAGENT

Package structure of a composite LED

A package structure of a composite LED is to package an LED chip into a SMD LED package subbody component. Then, a single SMD LED package subbody component or multiple SMD LED package subbody components may be packaged into a large sized recessed package mother body, thereby forming the package structure of a composite LED. Thus, the quality is better, and the color shift is less, thereby enhancing the quality of production, and thereby decreasing the cost of production. In addition, the SMD LED may be previously classified according to the features, and may then be packaged into the mother body, thereby obtaining better features, such as Vf, color, brightness or the like.
Owner:SOLIDLITE CORP

Method of manufacturing mask for electron beam lithography and mask blank for electron beam lithography

This invention provides a method of manufacturing mask for electron beam lithography and a mask blank for electron beam lithography, which could prevent damage upon a front side of an SOI (Silicon On Insulator) layer and also provide desirable etching of a silicon base layer of an SOI substrate is used.A mask blank for electron beam lithography is manufactured as an intermediary product by etching a silicon base layer and a BOX layer subsequent to forming a protective layer on a front side of an SOI (Silicon On Insulator) layer simultaneously with forming a hard mask on a back side of the SOI layer. Then, an etching process is performed upon the SOI layer to thereby complete a manufacture process of a mask for electron beam lithography having an aperture for transmitting an electron beam therethrough.
Owner:TOKYO ELECTRON LTD

Organic-inorganic composite particles, manufacturing method therefor, and cosmetic

There is provided a spherical organic-inorganic composite particle having good biodegradability. The organic-inorganic composite particle according to the present invention includes 1 to 79% by weight of a silica component and 21 to 99% by weight of a biodegradable plastic. The organic-inorganic composite particle has an average particle diameter d1 of 0.5 to 25 μm, a true density of 1.03 to 2.00 g / cm3, and a sphericity of 0.80 or more. A cosmetic product including the organic-inorganic composite particle having such properties has excellent texture properties.
Owner:JGC CATALYSTS & CHEM LTD

Method for Reducing Runnability Problems Caused By Gas Flows in an Impingement Dryer for a Fibre Web and an Impingement Dryer

The invention relates to an impingement dryer and a method for reducing runnability problems caused by gas flows in an impingement dryer for a fibre web, which impingement dryer has gas blowing opening and gas exhaust openings. The fibre web to be dried is supported with a support fabric. The support fabric and the fibre web to be dried are moved in the machine direction inside the impingement dryer past the blowing openings and exhaust openings. At the same time hot gas is blown from the blowing openings toward the fibre web to be dried and gas is removed from the vicinity of the fibre web to the exhaust openings. At least one edge control strip is moved in the machine direction edges of the impingement dryer in front of the blowing openings or the exhaust openings or both. With its aid a desired number of blowing openings or exhaust openings or both are covered and thus their effect is controlled.
Owner:VALMET TECHNOLOGIES INC
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