The invention discloses a structure for optimizing the writing performance of a magnetic
random access memory. The structure comprises a writing accelerator, the writing accelerator is positioned on the lower side of a bottom
electrode of the magnetic
random access memory and the upper side of a bottom
electrode through hole, and the writing accelerator is directly connected with the bottom
electrode and the bottom electrode through hole. The invention further discloses a preparation method of the structure for optimizing the writing performance of the magnetic
random access memory. The preparation method comprises the following steps: 1, providing a
CMOS substrate with a polished surface and a
metal connecting line Mx; 2, manufacturing a bottom electrode through hole in the flattened CMOSsubstrate, and
grinding the bottom electrode through hole; 3, on the bottom electrode through hole, performing graphical definition and
etching to manufacture writing accelerator
metal, filling a writing accelerator
dielectric medium, and
grinding the writing accelerator
dielectric medium by adopting
chemical mechanical planarization; and 4, sequentially depositing a bottom electrode, a magnetictunnel junction multilayer film and a top electrode on the writing accelerator, manufacturing a magnetic
tunnel junction storage unit, and finally manufacturing
bit line connection on the top electrode.