The invention relates to a
hot isostatic pressing preparation method of a
nickel oxide-based
ceramic target material. The method comprises the following steps: A, performing
raw material preparation:preparing mixed
powder of
nickel oxide powder and doped source
powder, the total
mass fraction of doped source elements in the mixed powder not being higher than 10%, and the doped source being selected from one or more of Li, Na, Mg, Al, Si, K, Zn, Zr, Mn, Cu, Cr, V, W and Ti, the purity of the
nickel oxide powder and the
doping source powder being higher than 99.99%, the average particle size being 500 nm-2 microns, and the D50 particle size is 50 nm-800 nm; B, performing
spray drying; C, loading the product into a sheath mold; D, performing vacuum degassing; E, performing
hot isostatic pressing treatment, specifically, the pressure intensity being 50-200 MPa, the
sintering temperature being 500-1200 DEG C, the heat preservation time being 1-5h, and the temperature rising speed being 0.5-3 DEG C / min; F, obtaining a sintered blank; and G, carrying out
machining or not carrying out
machining according to needs to reach the designed size to obtain a target material finished product.