49results about How to "Avoid Threshold Voltage Drift" patented technology

Each stage of first and second shift registers outputs a scan pulse by transferring a clock pulse of a clock signal supplied through a first clock input terminal. A first transistor is provided in at least one embodiment so as to connect and disconnect a scan signal line corresponding to the individual stage to and from a low-level power source of the scan pulse, and the first transistor has a gate that receives a clock signal supplied through a second clock input terminal. Two clock signals supplied to the first shift register and two clock signals supplied to the second shift register are different from each other in timings of their clock pulses. This realizes a display device capable of curbing the phenomenon in which a threshold voltage of a sink-down transistor is shifted, while sinking the gate line voltage down.

The invention provides an SOI single-port SRAM unit and a preparation method thereof. The unit comprises a first phase inverter composed of a first PMOS transistor and a first NMOS transistor; a second phase inverter composed of a second PMOS transistor and a second NMOS transistor; an obtaining transistor composed of a third NMOS transistor and a fourth NMOS transistor. In the SRAM unit, the four transistors forming the first phase inverter and the second phase inverter are L-type gates; heavy dopant contact regions are arranged in the regions at the outer sides of the bending angles of the L-type gates. According to the unit and the method of the invention, leakage power consumption and transistor threshold voltage drift resulted from the floating body effect and parasitic triode effect in the PD SOI instrument can be effectively inhibited under the condition of sacrificing a relatively small unit area; the anti-noise capability of the unit is improved; the preparation technique of the invention introduces no extra mask plate and is fully compatible with the exiting logic technique; the inner part of the unit is a center symmetrical structure which is beneficial for matching the size and the threshold voltage of the MOS tube and for matching an array and is convenient for a full-custom SRAM chip.

A method for manufacturing display panel is disclosed, which comprises: (A) providing a substrate, an oxide semiconductor layer disposed on the substrate, and a gate electrode disposed on the substrate and corresponding to the oxide semiconductor layer; (B) forming a metal layer on the oxide semiconductor layer; (C) forming a photoresist on the metal layer, and etching the metal layer to form a source electrode and a drain electrode; (D) heating the photoresist and the photoresist covers at least partial of side walls of the source electrode and the drain electrode; (E) applying an alkaline solution on the substrate; and (F) removing the photoresist to expose the source electrode and the drain electrode.

The invention relates to the technical field of semiconductor manufacturing, in particular to a 3D NAND flash memory structure and a manufacturing method of the 3D NAND flash memory structure. The method includes: providing a substrate, and sequentially forming a gate oxide layer, a source selection transistor polysilicon layer, a plurality of stacked oxide dielectric layers and sacrificial dielectric layers, a drain selection transistor polysilicon layer, and a protective oxide layer on the substrate ; Etching to form a cylindrical channel that exposes the substrate; forming a tunnel oxide layer, polysilicon and polysilicon isolation dielectric layer in the cylindrical channel; etching to form a source trench that exposes the substrate, and forming a common source removing the sacrificial dielectric layer by wet etching; forming an electron trapping layer and a blocking oxide layer on the side walls of the source trench and the inner wall of the oxide dielectric layer; forming a gate on the surface of the blocking oxide layer. The selection tube prepared by the method does not include electron trapping layer silicon nitride, avoids threshold voltage drift and leakage phenomenon of the selection tube, and improves the quality of the memory device.

The embodiment of the invention provides a pixel driving circuit and a driving method thereof, a display panel and a display device. The pixel driving circuit comprises a charging control module whichis configured to transmit a data signal from a data signal end to a first node under the control of a scanning signal from a scanning signal end; a signal storage module which is configured to be capable of storing signals from the first node or transmitting the stored signals to the first node; a first driving module which is configured to be capable of transmitting a first voltage signal from the first voltage signal end to the organic light emitting diode (OLED) element under the control of the level of the first node; and a second driving module which is configured to be capable of transmitting a second voltage signal from the second voltage signal end to the OLED element under the control of the level of the first node.

The invention provides an inkjet printing OLED display panel and a preparation method thereof. The method comprises the steps that a passivation layer and a flat layer are successively formed on a glass substrate on which at least one pair of thin film transistors are prepared, and the passivation layer covers at least one pair of thin film transistors; at least one pair of via holes are formed onthe passivation layer and the flat layer; at least one pair of anodes are prepared on the flat layer, and the anodes are electrically connected with the thin film transistors through the via holes arranged on the flat layer and the passivation layer; a pixel defining layer is deposited on the flat layer to cover the anodes; the pattern of the pixel defining layer is defined by using a halftone photomask so that the region arranged on the anodes of the pixel defining layer is enabled to form a notch, and the height of the pixel defining layer between the anodes is reduced; and a light-emittinglayer is prepared in the notch by using the inkjet printing technology. A photomask can be saved, the performance of the thin film transistors in the inkjet printing OLED display panel can be improved without reducing the mobility of the thin film transistors, and threshold voltage drift can also be effectively suppressed.

The invention provides a grid electrode driving circuit and a driving method thereof and a display device and relates to the technical field of display. A first control signal input through a first control signal end is adopted for controlling a first upward pulling module and a first downward pulling module to work, a second control signal input through a second control signal end is adopted forcontrolling a second upward pulling module and a second downward pulling module to work, and by controlling the electrical levels of the first control signal and second control signal, the first upward pulling module and the second upward pulling module are driven to alternatively work, and meanwhile the first downward pulling module and the second downward pulling module are driven to alternatively work, so that time for receiving signals of upward pulling nodes of each upward pulling module is shortened, time for receiving reset signals of each downward pulling module is also shortened, andthreshold voltage drift of a TFT is effectively suppressed. Therefore, stable electrical properties of the TFT is achieved, influences on the output of an output end are reduced, and the occurrence rate of various display failures caused by the properties of the TFT is decreased.

A sensor circuit includes a transistor comprising an oxide semiconductor; a first circuit which supplies one of a first potential and a second potential; a first switch; a second switch; and a second circuit to which a current flowing between a source and a drain of the transistor is applied via the second switch when the first potential is applied to a gate of the transistor. The first potential is lower than a potential of the source or a potential of the drain of the transistor, and the second potential is higher than the potential of the source or the potential of the drain of the transistor. The first switch electrically connects the source and the drain of the transistor when the second potential is applied to the gate of the transistor, and electrically isolates them when the first potential is applied to the gate of the transistor.

Provided is a method for manufacturing a semiconductor device comprising forming a device isolation layer on a semiconductor substrate; forming gate insulating layers on the upper part of the semiconductor substrate having the device isolation layers formed thereon; forming an undoped layer for a gate electrode; implanting mixed dopant ions consisting of at least two dopant ions containing ¹¹B ions into the undoped layer, utilizing an ion-implantation mask; and heat-treating the mixed dopant ion-implanted layer.

The invention provides a semiconductor structure and a preparation method thereof. The preparation method of the semiconductor structure provided by the invention comprises the following steps: providing a substrate; a base pattern is formed on the substrate, the base pattern comprises a plurality of bit lines arranged in parallel, and isolation structures are arranged among the bit lines; forming a plurality of semiconductor columns arranged along the direction of the bit line on the surface of the bit line, wherein the bit line is electrically connected with the semiconductor columns; a surrounding gate structure is formed on the surface of the semiconductor column, the surrounding gate structure comprises a first insulating layer, a gate structure layer and a second insulating layer which are sequentially arranged on the side face of the semiconductor column, and the gate structure layer is electrically connected with the semiconductor column; and forming a first wire, a magnetic tunnel junction and a second wire which are stacked in sequence on the surface of the surrounding gate structure, wherein the first wire is electrically connected with the semiconductor column. The performance of the semiconductor structure is greatly improved, and the requirement for miniaturization is met.

The invention provides a silicon-on-insulator (SOI) six-transistor static random access memory (SRAM) unit and a fabrication method thereof. The unit comprises a first phase inverter, a second phase inverter and an acquisition tube, wherein the first phase inverter comprises a first P-channel metal oxide semiconductor (PMOS) transistor and a first N-channel metal oxide semiconductor (NMOS) transistor, the second phase converter comprises a second PMOS transistor and a second NMOS transistor, and the acquisition tube comprises a third NMOS transistor and a fourth NMOS transistor. In the SOI six-transistor SRAM unit, tunneling diode structures are embedded into sources of the four transistors forming the first phase inverter and the second phase inverter, power consumption leakage and threshold voltage drift of the transistors caused by a floating body effect and a parasitic triode effect in a partially-depleted (PD) SOI device can be effectively suppressed on the condition of no increase on device area, and the noise resistant capability of the unit is improved; moreover, the fabrication method also has the advantages of simple manufacturing process and the like, and is completely compatible with an existing logic process; and a central symmetric structure and a sharing structure between units are employed in the unit, so that a storage array is convenient to form, and the design period of an SRAM chip is favorably shortened.