6912results about "Water supply installation" patented technology

Ink refill systems are disclosed. In general, an ink source comprising a saturated zone and a tubarc porous microstructure for conducting ink from the saturated zone to an unsaturated zone are provided. The ink can be delivered from the saturated zone to the unsaturated zone through the tubarc porous microstructure, thereby permitting the ink to be harnessed for ink writing and / or printing through the unsaturated hydrodynamic flow of the ink from one zone of saturation or unsaturation to another.

This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed / vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

Disclosed is a bubbler assembly. The bubbler assembly includes a vessel configured to contain a liquid source material and its vapor. It also includes a carrier gas supply line, a downstream end of which discharges in a lower portion of the vessel, and a gas outlet line, an upstream end of which is in fluid communication with an upper portion of the vessel. The gas outlet line includes a constriction. The bubbler assembly further includes a pressurizing gas supply line, a downstream end of which discharges in either the upper portion of the vessel or in the gas outlet line at a point upstream of the constriction.

A gas flow rate verification unit capable of enhancing reliability of gas flow rate verification. The gas flow rate verification unit has a first cutoff valve that is connected to a flow rate control device and to which gas is inputted, a second cutoff valve for discharging the gas, a communication member for allowing the first cutoff valve and the second cutoff valve to communicate with each other, a pressure sensor for detecting the pressure of the gas supplied between the first cutoff valve and the second cutoff valve, a temperature detector for detecting the temperature of the gas supplied between the first cutoff valve and the second cutoff valve, and a control means for verifying the flow of the gas flowing in the flow control device, the verification being performed by using both the result of the pressure detected by the pressure sensor and the result of the temperatures detected by the temperature detector. The volume (Vk) between the valve seat of the first cutoff valve and the valve seat of the second cutoff valve is equal to or less than the volume (Ve) between the outlet of the flow control device and the valve seat of the first cutoff valve.

A process and apparatus for rapidly producing an emulsion and microcapsules in a simple manner. A dispersion phase is ejected from a dispersion phase-feeding port toward a continuous phase flowing in a microchannel such that flows of the dispersion phase and the continuous phase cross each other, thereby obtaining microdroplets, formed by the shear force of the continuous phase, having a size smaller than the width of the channel for feeding the dispersion phase.

A pumping apparatus for evacuating a reactant from a reactive region includes a vacuum able chamber, a hearth for supporting a workpiece, one or more gas introduction valves, one or more exhaust evacuation valves, and an adjustable valve providing one or more pathways there through formed by alignment of separate components of the valve, the components perforated with two or more openings to form the pathways.

A substrate processing system includes a plurality of processing chambers accommodating substrates, a processing gas supply system configured to supply a processing gas sequentially into the plurality of processing chambers, a reactive gas supply system configured to supply an activated reactive gas sequentially into the plurality of processing chambers, a buffer tank installed at the processing gas supply system, and a control unit configured to control the processing gas supply system and the reactive gas supply system such that a time period of supplying the reactive gas into one of the plurality of processing chambers is equal to a sum of a time period of supplying the processing gas into the one of the plurality of processing chambers and a time period of supplying the processing gas into the buffer tank, and the processing gas and the reactive gas are alternately supplied into the plurality of processing chambers.

An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.

A hands-free faucet comprises a proximity sensor, a logical control, a handle including a first touch control, a second touch control, and a mode indicator. The logical control has a manual mode (wherein the proximity sensor is inactive, and water flow is toggled on and off by positioning the handle) and a hands-free mode (wherein water flow is toggled on and off in response to the proximity sensor). The first touch control puts the faucet in the hands-free mode when touched by a user. The second touch control toggles the logical control between the hands-free mode and the manual mode when touched by a user. The mode indicator indicates which mode the faucet is presently in. The water flow has a temperature and a flow rate that are determined by the position of the handle.

A microchannel apparatus includes a plural partition walls 4 formed as extensions of plural microchannels 1 toward a continuous phase, and a flow path 5 is formed between adjacent ones of the partition walls 4. A dispersed phase pumped into a continuous phase via each microchannel 1 generates nearly perfect spheres in the course of passing through the microchannel and the flow path 5 in between the partition walls 4, thereby producing emulsions comprising fine and homogenous microspheres.

A proportional valve is disclosed for controlling the outlet pressure of a fluid flowing therethrough. The valve comprises a valve body having an inlet port and an outlet port for the fluid. The valve also has an inner chamber, within which there is formed a valve seat that may be opened and closed variably by a shutter axially movable from and towards the valve seat. Movement of the shutter is controlled by a shape memory alloy (SMA) actuating member operating antagonistically to an elastic member, the temperature of the fluid being lower than the transition temperature of the shape memory alloy. The actuating member and the elastic member are connected to the body valve at opposite sides relative to the valve seat. A power control circuit is also provided for circulating an electric current through the actuating member so as to heat the same by Joule effect from a temperature lower than the transition temperature to one that is higher. At least one vent hole is formed in the valve body for putting a portion of the chamber upstream of the valve seat into fluid communication with the outside or a collection network. The actuating member is housed in that portion of chamber corresponding to the inlet port of the fluid, whereby a continuous flow of fluid around the actuating member is ensured for accelerating the cooling process. A closed-loop control circuit for the power control circuit controls the circulating current as a function of a pressure signal generated by fluid pressure sensing means and in such a way as to offset the retarding effect produced by the fluid during heating of the actuating member.

A droplet actuation system is provided including a droplet actuation device including a substrate that includes electrodes for conducting droplet operations; temperature control means for heating and / or cooling a region of the droplet actuation device and arranged such that a droplet can be transported on the electrodes to a region for heating; and a means for effecting a magnetic field in proximity to one or more of the electrodes sufficient to immobilize magnetically responsive beads in a droplet on the substrate during droplet operations. The system further includes a processor for controlling the electrodes and temperature control means, wherein the processor is programmed, and electrodes and magnetic field are arranged, to cause the electrodes to split a droplet including the magnetically responsive beads yielding a first daughter droplet which includes the magnetically responsive beads and a second daughter droplet without a substantial amount of the magnetically responsive beads.

A gas supply facility includes a plurality of pressure type flow controllers connected in parallel, and a first controller to control operation of the plurality of pressure type flow controllers so as to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one of the pressure type flow controllers operates as a second controller to control the gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones that control the rest of the gas flow rate range. Furthermore, pressure inside the chamber is controlled by installing a pressure detector in the chamber, inputting the value detected by the detector to the controller, and by adjusting a control signal to the pressure type flow controllers.