133 results about "Exposure chamber" patented technology

An automated biomonitoring system for monitoring water quality includes an exposure chamber for housing an aquatic organism having ventilatory behavior and body movement sensitive to water quality. Electrodes capture electrical signals produced by the organism during its ventilatory behavior and body movement, and a controller responsive to signals from the electrodes determines one or more ventilatory parameters based on the signals. The ventilatory parameters are compared with corresponding thresholds to determine when the water to which the organism is exposed has caused physiological stress to the organism. The signals captured by the electrodes may be corrected for variations in water conductivity so that the signals processed by the controlled are not influenced by conductivity.

An automated biomonitoring system for monitoring water quality includes an exposure chamber for housing an aquatic organism having ventilatory behavior and body movement sensitive to water quality. Electrodes sense electrical signals produced by the organism during its ventilatory behavior and body movement, and a controller responsive to signals from the electrodes determines a plurality of ventilatory parameters based on the signals. The ventilatory parameters are compared with corresponding thresholds to determine when the water to which the organism is exposed has caused physiological stress to the organism.

A quantitative fit test (QNFT) system and method for assessing the biological fit factor (FF) performance of respiratory protective devices. The biological QNFT system includes the following three main elements: an aerosol generation system; an exposure chamber; and an aerosol sampling subsystem. The aerosol sampling subsystem includes an aerosol spectrometer that counts particles in discrete size units ranging from 0.5 to 20 micrometers (μm) making it possible to obtain several size-specific FF measurements from a single respirator fit test. A virtual impactor in the aerosol generation system increases the number of challenge particles in the primary target size of interest (1 to 5 μm) and increases the sensitivity of the method allowing FF values of up to one million to be measured without the need to correct for in-mask background particles.

An apparatus for removing an immersion lithography liquid and a method of immersion lithography are disclosed, that rapidly and easily remove liquid from a wafer before development and after exposure. The apparatus includes a housing device configured to prevent the exposure chamber from being contaminated with a scattered liquid; a (rotatable) stage inside the housing device, configured to support a substrate; and (i) a motor configured to rotate the stage or (ii) a gas-spraying device or nozzle above the stage, configured to spray the substrate with an inert gas. The method generally includes coating a photoresist on a substrate; immersing the substrate in a liquid; exposing the substrate; removing the liquid from the substrate by (i) rotating the stage and / or substrate or (ii) spraying the substrate with an inert gas; and developing the photoresist.

A portable automated biomonitoring system for monitoring water quality includes an exposure chamber for housing an aquatic organism and a water inlet for directing water to the exposure chamber. The aquatic organism has ventilatory behavior and body movement sensitive to water quality. Electrodes sense electrical signals produced by the organism during its ventilatory behavior and body movement, and a controller responsive to signals from the electrodes determines a plurality of ventilatory parameters based on the signals. The ventilatory parameters are compared with corresponding thresholds to determine when the water to which the organism is exposed has caused physiological stress to the organism. The water being evaluated may be recirculated through the system for further analysis.

Disclosed is an exposure apparatus having a load-lock chamber being arranged to avoid condensation of water vapors in the load-lock chamber or to reduce the amount of condensation of the water vapors, with a simple structure and a simple control method. Specifically, an exposure apparatus according to an aspect of the present invention comprises an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber disposed adjacent the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience, wherein, when the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.

A portable automated biomonitoring system for monitoring water quality includes an exposure chamber for housing an aquatic organism and a water inlet for directing water to the exposure chamber. The aquatic organism has ventilatory behavior and body movement sensitive to water quality. Electrodes sense electrical signals produced by the organism during its ventilatory behavior and body movement, and a controller responsive to signals from the electrodes determines a plurality of ventilatory parameters based on the signals. The ventilatory parameters are compared with corresponding thresholds to determine when the water to which the organism is exposed has caused physiological stress to the organism. The water being evaluated may be recirculated through the system for further analysis.

The invention discloses an analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation. The means comprises a hydrogen atom generator interface, an electron gun, an electron gun chamber, an electron gun interface, an exposure chamber, a cooling capillary tube, a sample bench, a sample bench interface, a gas introducing device, a turbomolecular pump, a backing pump, an RGA, an RGA interface, a gate valve, a vent valve, a resistance gauge and an isolating valve, wherein the hydrogen atom generator interface, the electron gun interface, the sample bench interface and the RGA interface are all open, and fixedly connected with the exposure chamber, the electron gun interface and the sample bench interface are symmetrically arranged at both sides of the exposure chamber, so that the electron gun and the sample bench are located at one horizontal line, the hydrogen atom generator interface is arranged above the chamber and perpendicular to the axis of the electron gun interface, and the RGA interface is arranged at side of the experimental device. The means can solve problems that present devices cannot simultaneously realize experimental functions of optics surface contamination and cleaning, and has only one set of vacuum-pumping system; and the sample bench does not have the free degree.

A device for the exposure of blood to light produces a controlled, safe, and rapid exposure of blood to specific emissions, thereby inducing improved immune response. The device exposes the blood through a simplified macro blood flow path in which the internal or micro blood flow is in a spiral motion. The device includes a blood flow path, a pump, an exposure chamber, an ultraviolet light source, and a vacuum chamber.

Embodiments of the present application are directed to devices, systems and methods for irradiating fluids (e.g., blood) with ultraviolet light, and corresponding related components, systems and methods. In some embodiments of the invention, an ultraviolet blood irradiation (UBI) system is provided and may include an ultraviolet UV source providing a predetermined wavelength of radiation to provide a detrimental effect to virus and / or bacteria, an exposure chamber for exposing a predetermined volume of blood to radiation, a conduit between the UV source and the exposure chamber, a pump for pumping blood between a first location and a second location and a shutter assembly provided between the UV source and the exposure chamber providing time-metered irradiation of the blood in the chamber.

A lithography tool includes an exposure chamber and a reticle handler that exchanges a reticle being exposed as prescribed by the user of the lithography tool. The reticle handler can include a vacuum-compatible robot, a vacuum chamber to house the robot, a load-lock to input reticles and transition them from atmospheric pressure to vacuum, a processing station for processing the reticle, and a reticle library for storing at least one extra reticle so that it is quickly available for exchange during an exposure process. The robot can have a two or more handed gripper to simultaneously hold multiple reticles. This allows a first reticle to be removed from the reticle stage with a first hand and a second reticle to be loaded onto the reticle stage with a second hand, and so on, which minimizes exchange time.

The invention discloses a manufacture method of a silicon solar cell electrode screen board. The manufacturing method includes the following steps: S1: preprocessing, performing preprocessing to a stainless steel sheet to be etched; S2: pasting a dry film, uniformly coating a sensitive dry film on the obtained stainless steel sheet; S3: carrying out exposure, fixing a base plate in an exposure chamber of an exposure machine and performing exposure to the dry film on the base plate by ultraviolet rays; S4: developing, performing development to the base plate subjected to exposure, dissolving and cleaning the dry film which is not subjected to exposure, and leaving an electrode screen board graph of a solar cell; and S5: etching, performing etching to the developed steel sheet to etch a position at which an opening is needed. According to the manufacture method, the whole stainless steel sheet is adopted to be etched, when the steel sheet is selected, the steel sheet with proper roughness is chosen according to the requirement of the product surface roughness, so that the surface of a manufactured mask can well meet the printing requirement, the printing precision can be well improved and the conversion efficiency of the solar cell is improved.

A method and apparatus for evaluating the effects of toxic substances in the environment on aquatic organisms is disclosed. The apparatus allows for exposure of test organisms, placed in test chambers made of partially submerged sieves, to water that is pumped from an urban creek at preset time intervals. The invention also allows for maintenance of cool temperatures in the exposure chambers, both for the treatment (i.e., creek water) and the experimental control.

The invention provides a whole body exposure system for animals. The whole body exposure system comprises a whole body exposure chamber, an aerosol generation system, a sampling system, a waste gas recycling and treating system and a control system; the whole body exposure chamber is used for placement of animals for toxicity experiment; the aerosol generation system is communicated with the whole body exposure chamber and used for generating aerosol for inhalation toxicity experiment; the sampling system is used for collecting concentration of the aerosol in the whole body exposure chamber; the waste gas recycling and treating system is communicated with the whole body exposure chamber and used for recycling and treating waste gas generated by the animals and excessive aerosol; the control system is used for regulating the concentration of the aerosol in the whole body exposure chamber in the experiment process. The concentration of the aerosol in the whole body exposure chamber is detected through the control system and the sampling system, automatic control of the whole body exposure system is realized, accurate control on the concentration of the aerosol in the whole body exposure chamber is realized, and requirements of experiments are met. The whole body exposure system with the automatic control system is high in automation degree and experiment accuracy.

A lithography tool includes an exposure chamber and a reticle handler that exchanges a reticle being exposed as prescribed by the user of the lithography tool. The reticle handler can include a vacuum-compatible robot, a vacuum chamber to house the robot, a load-lock to input reticles and transition them from atmospheric pressure to vacuum, a processing station for processing the reticle, and a reticle library for storing at least one extra reticle so that it is quickly available for exchange during an exposure process. The robot can have a two or more handed gripper to simultaneously hold multiple reticles. This allows a first reticle to be removed from the reticle stage with a first hand and a second reticle to be loaded onto the reticle stage with a second hand, and so on, which minimizes exchange time.

An exposure apparatus for exposing a substrate. The apparatus includes an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber, disposed adjacent to the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience. When the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.

An exposure chamber for reducing pathogens in a biological fluid such as whole blood or blood-derived products includes a serpentine-shaped UV-transparent flow path and closely positioned ultraviolet light emitting diodes configured for emanating UV irradiation towards the biological fluid at peak wavelength of 250 nm to 270 nm. The control system is provided to energize UV LEDs using various novel modes of modulating pulse width and current amplitude for LEDs so as to deliver higher UV intensity to the biological fluid but without overheating thereof or the LEDs.

A substrate processing apparatus for performing an exposure process by printing a pattern on a substrate coated with a photosensitive material includes an exposure part for performing an immersion exposure process, a cleaning part and a transport mechanism which are provided within an exposure chamber. After the exposure part performs the immersion exposure process on the substrate, the substrate is transported to the cleaning part and is cleaned therein. If the liquid used during the immersion exposure process remains on the substrate after the exposure process, the substrate is cleaned in the cleaning part immediately after the exposure process. This prevents the remaining liquid from adhering to and contaminating mechanisms within the substrate processing apparatus. Also, the cleaning part is able to clean a dummy substrate for use in an alignment process in the exposure part.

An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles 23 and 24 for jetting the cleaning water supplied from the cleaning water supply device, into the antigen exposure chamber 1 and ducts 17 of fan units to clean the antigen exposure chamber 1 and the ducts 17; a floor surface 15 of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning. Further, the cleaning water supply device includes a water purifying device 19 for purifying tap water; a pure water tank 20 for storing the purified water; and a pure water supply pump 21 for pumping the pure water from the pure water tank into the cleaning nozzles. The exhaust device includes an air exhaust port 4 for exhausting air from the antigen exposure chamber; drain pans 14 for receiving and collecting the cleaning water flowing down from the antigen exposure chamber; a drain tank 27 for storing the cleaning water collected by the drain pans; a drain pump 28 for draining the cleaning water stored in the drain tank into a drain pipe; and a drying exhaust-air fan 29 for exhausting the air from the antigen exposure chamber through the drain tank to accelerate drying in the antigen exposure chamber after the cleaning water is drained.

A microwave heating device for activating a microwave-activatable foam insulating material within the dual sidewalls of a beverage cup. The device has a waveguide that defines an exposure chamber for the articles. The waveguide has a plurality of 90-degree twisted rectangular sections, for rotating a perpendicular microwave field pattern along the length of the waveguide. A continuous flexible belt made of a dielectric material passes into and through the exposure chamber along a conveying path, and is formed and maintained into a curled shape in cross section through the exposure chamber to retain the untreated beverage cup upon the curled belt.

A single- or multi-well chamber assembly comprising nanoparticle exposure chambers with a plurality of wells designed to hold porous membrane inserts, with cell culture media being maintained on the basal (lower) surface to generate the air-liquid interface. The wells may accommodate a variety of sizes of cell culture inserts and may be arranged radially. The chamber assembly comprises an integrated heating-humidifying mechanism so that the internal chamber environment may be heated to 37° C. and maintained at humid conditions to allow for maintenance of cell cultures. The presently disclosed apparatus may be used to investigate the toxicity of airborne nanoparticles to cells or tissue models grown at the air-liquid interface. Aerosolized nanomaterials are drawn into a multi-well chamber assembly and deposited via electrostatic deposition onto cells grown at the air-liquid interface.

The invention relates to the biomedical toxicantexposure experimental equipment and the method of the experimental equipment, in particular to a gas exposure experimental device and the method. The key technology is to design and make a small sized, portable, and electric controlled dynamic gas exposure experimental device; the device comprises a miniature fan motor (3), a section of removable and movable toxicant exposure chambers (5), a set of air transmission pipelines and adjusting valves (4) connected with the fan motor and the toxicant exposure chambers, and a set of exhaust tubes (6) and collection bags for waste gas (7) combined with the toxicant exposure chambers; the remote controls for gas flow rate, flow, and exposure time are performed by the miniature adjustable fan motor and the air transmission pipelines; the animal foods and drinking water (15) are provided by the removable toxicant exposure chambers (5) to meet the requirements for long-time and repeated exposure; and the performance evaluations for filed gas exposure experiment, toxicological study and the equipment for harmful gas are performed by the different combinations and different exposure modules of the small sized movable exposure device.

An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

Embodiments of the present application are directed to devices, systems and methods for irradiating fluids (e.g., blood) with ultraviolet light, and corresponding related components, systems and methods. In some embodiments of the invention, an ultraviolet blood irradiation (UBI) system is provided and may include an ultraviolet UV source providing a predetermined wavelength of radiation to provide a detrimental effect to virus and / or bacteria, an exposure chamber for exposing a predetermined volume of blood to radiation, a conduit between the UV source and the exposure chamber, a pump for pumping blood between a first location and a second location and a shutter assembly provided between the UV source and the exposure chamber providing time-metered irradiation of the blood in the chamber.

The invention relates to the technical field of liquid crystal display and discloses orientation equipment, an orientation film preparation method and a display substrate. The orientation equipment comprises a first exposure chamber which comprises a first light box and a light shading board. The light shading board is used for preventing irradiation of light rays towards an orientation area of an orientation film, light rays emitted by the first light box are used for exposure of a non-orientation area to remove the orientation film in the non-orientation area, and accordingly edge control precision of the orientation film is improved. Since only addition of one exposure chamber is required, simplicity in modification, avoiding of debugging after modification and low cost are realized. When orientation films are formed on an array substrate and a color film substrate by the aid of the orientation equipment and combination is finished, overlapping of a sealant and the orientation films is avoided, and the problems of striping, defective frames and the like caused by large overlapping area of the sealant and the orientation films are solved.

An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.

The invention discloses a semi-automatic alignment and exposure device of a printed circuit board (PCB). The semi-automatic alignment and exposure device comprises an alignment chamber and an exposure chamber, wherein an upper slipway and a lower slipway are respectively arranged in the alignment chamber and the exposure chamber and are in parallel, an upper alignment platform is arranged in the upper slipway and comprises a first working table, a first upper cover and an alignment mechanism, the first working table can slide along the upper slipway, the first upper cover is hinged with the first working table, a signal acquisition device is arranged above the first working table and can slide along the alignment chamber, the exposure chamber comprises an exposure device, the exposure device can do vertical movement along the exposure chamber, a lower alignment platform comprises a second working table, a second upper cover and an alignment mechanism, the second working table can slide along the lower slipway, the second upper cover is hinged with the second working table, the first working table and the second working table do movement relative to each other by a driving device, the semi-automatic alignment and exposure device also comprises a control system, and the control system controls opening and closing of a partition plate, controls the first working table and the second working table to do movement relative to each other and controls the alignment mechanism to automatically align. The semi-automatic alignment and exposure device has the advantages of positioning accuracy and high positioning efficiency.

The invention discloses a method for simulating dust aerosol personal exposure and a special device for the method. The test device provided by the invention comprises a dust aerosol generator, a static neutralizer, and an exposure chamber, wherein the dust aerosol generator and the static neutralizer are arranged outside the exposure chamber; and the dust aerosol generator, the static neutralizer, and the exposure chamber are connected sequentially through an interface pipeline. The personal exposure method comprises the following steps: placing particles in the dust aerosol generator and starting the dust aerosol generator to generate dust aerosol; neutralizing surplus electric charges in the generated dust aerosol by the static neutralizer, and reaching the exposure chamber through the interface pipeline; and arranging to-be-tested crowd in the exposure chamber after the dust aerosol in the exposure chamber reaches the concentration needed by experiment, for carrying out the personal dust aerosol control exposure experiment. By adopting the method, the personal dust aerosol control exposure experiments can be effectively carried out.