Analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation

Abstract

The invention discloses an analogue means of optical surface contamination and cleaning under extreme ultraviolet irradiation. The means comprises a hydrogen atom generator interface, an electron gun, an electron gun chamber, an electron gun interface, an exposure chamber, a cooling capillary tube, a sample bench, a sample bench interface, a gas introducing device, a turbomolecular pump, a backing pump, an RGA, an RGA interface, a gate valve, a vent valve, a resistance gauge and an isolating valve, wherein the hydrogen atom generator interface, the electron gun interface, the sample bench interface and the RGA interface are all open, and fixedly connected with the exposure chamber, the electron gun interface and the sample bench interface are symmetrically arranged at both sides of the exposure chamber, so that the electron gun and the sample bench are located at one horizontal line, the hydrogen atom generator interface is arranged above the chamber and perpendicular to the axis of the electron gun interface, and the RGA interface is arranged at side of the experimental device. The means can solve problems that present devices cannot simultaneously realize experimental functions of optics surface contamination and cleaning, and has only one set of vacuum-pumping system; and the sample bench does not have the free degree.

Description

technical field [0001] The invention belongs to the technical field of photolithography, and more specifically relates to an optical surface pollution and cleaning simulation device under extreme ultraviolet light irradiation. Background technique [0002] Among the next-generation lithography technologies, extreme ultraviolet lithography is regarded as the most promising technology. In EUVL, the wavelength of the exposure light source is in the extreme ultraviolet band, and the energy of photons is high. In the case of pollution sources, it is easy to cause pollution on the surface of the optical element. After the surface of the optical element is polluted, not only will the reflectivity of the optical element be reduced, but also Causes inconsistencies in lithographic feature size. The optical components in EUVL are expensive and complex to assemble, and the contamination of optical components will lead to performance degradation or even failure of the entire optical sys...

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Problems solved by technology

[0011] Aiming at the defects of the prior art, the purpose of the present invention is to provide an optical surface pollution and cleaning simulation device under the irradiation of extreme ultraviolet light, aiming to solve the problem that the existing device cannot realize the optical surface pollution and cleaning experiment functions at the same time, only A set of vacuum system and the problem that the sample table does not have a degree of freedom

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