622 results about "Chemical storage" patented technology

A system and method are disclosed for centralized monitoring and control of a hydraulic fracturing operation. The system includes an electric powered fracturing fleet and a centralized control unit coupled to the electric powered fracturing fleet. The electric powered fracturing fleet can include a combination of one or more of: electric powered pumps, turbine generators, blenders, sand silos, chemical storage units, conveyor belts, manifold trailers, hydration units, variable frequency drives, switchgear, transformers, and compressors. The centralized control unit can be configured to monitor and / or control one or more operating characteristics of the electric powered fracturing fleet.

The invention discloses an intelligent conditioning system for deep dewatering of sludge, which comprises a dosing module, wherein the dosing module comprises an automatic dispensing system, a dosing system and chemical storage and throwing systems. According to the invention, an intelligent diagnosis system diagnoses each part in the reaction process of a sludge treatment device, and transmits the diagnosis result to a control unit; the control unit analyzes the diagnosis result, and controls the dosing system to perform dosing operation according to a control result; and through the treatment of the invention, the sludge moisture content is reduced from the originally 80-98% to 35-60%, the final sludge output mass is reduced by at least 50%, the sludge can still keep 70% or above (about 600-3000 kilocalories per kilogram) of the original organic caloric value after the sludge moisture content is reduced, and the sludge can be further treated by incineration and drying.

The invention provides an anticorrosive coating for a chemical storage tank and a construction method thereof. The anticorrosive coating comprises at least two anticorrosive coating units sequentially connected on the inner wall of the chemical storage tank, wherein each anticorrosive coating unit comprises a primer layer and a sprayed polyurea layer, the thickness of the primer layer of each basic anticorrosive coating unit is 10-100 microns, and the thickness of the sprayed polyurea layer is 0.5-1 mm. The inner wall of the chemical storage tank connected with each primer layer is obtained through sand blasting treatment or through sand blasting and acid pickling treatment sequentially. The thickness of each basic anticorrosive coating unit of the anticorrosive coating is small, the anticorrosive coating can be completed through one-time construction, and the polyurea layers are free of joints and tightly combine with the inner wall of the chemical storage tank to form a complete isolation layer. By adding an acid pickling step, tiny sharp corners on the surface subjected to the sand blasting treatment are decreased, the phenomenon that the basic anticorrosive coating cannot completely cover the surface of the inner wall is prevented, and the continuity of the basic anticorrosive coating is ensured.

A chemical treatment system that injects one or more dosage chemical solutions into a process. Conditions of the process are sensed by sensors, communicated to a chemical treatment management system. The chemical treatment management system processes the process conditions and issues command signals to one or more chemical storage systems to provide a dosage of chemical to the process. The chemical storage systems each comprise a chemical storage tank, a level sensor for the tank, a controller and a pump. The controller uses the command signals for varying in real time the dosage of the chemical solution by varying the pump operation. The chemical treatment management system also uses additional data from the chemical storage systems, such as tank level, and from other sources to provide the command signals and alerts / alarms and other user information.

A chemical storage device and a method for monitoring chemical usage are described herein. The device and disclosed method utilize a chemical storage canister and a load cell integrated into one transportable unit. The load cell is capable of compensating for the added weight of attached dispensing devices used in the semiconductor industry. Additionally, the load cell continuously displays the weight of the chemicals as they are withdrawn from the chemical storage device. These functionalities are included in the control logic of the load cell which is incorporated into the load cell itself.

The present invention is an apparatus and process for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, e) a second manifold for delivering the process chemical from the process container to a process tool; f) a solvent recovery container for containing used solvent and removed process chemical, and, g) a solvent evaporator to differentially remove solvent from process chemical in the solvent recovery container by entrainment in a carrier gas, vacuum removal, heating or combinations thereof. The containers can be baffled on their inert gas inlets. The cabinet can be heated.

The invention relates to an automatic chemical feeding device and method in a foam-drainage gas recovery well. The automatic chemical feeding device mainly comprises a ground chemical storage tank, a thin pipe valve, a thin pipe, a pressure difference control valve, an oil pipe and a casing. The ground chemical storage tank, the thin pipe valve, the thin pipe and the pressure difference control valve form a chemical feeding channel, the thin pipe and the oil pipe form an annular liquid discharge channel, and the pressure difference control valve mainly comprises a chemical inlet, an upper cavity, a valve spool ball, a conical valve seat, a lower cavity, a spring and a chemical outlet. The upper end of the pressure difference control valve is stressed by chemical gravity (constant in pressure), and the lower end thereof is stressed by return pressure at bottom of the well. The more the accumulated liquid is, the higher the return pressure at the bottom of the well is and the lower the downward pressure difference stressed on the valve spool ball is, so that the spring can overcome the pressure difference to support the valve spool ball upwards and chemicals are begun to be added. After the accumulated liquid is discharged, the pressure difference is larger than elastic force of the spring and presses the valve spool ball to stop chemical feeding. The automatic chemical feeding device can automatically feed and stop feeding chemicals according to level of the accumulated liquid, and the chemicals and the accumulated liquid at the bottom can be guaranteed to be sufficiently mixed.