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75results about How to "Small region" patented technology

Wearable input device

A wearable input device includes a body and a soft battery. The body is connected to the soft battery to form a collar range, and the soft battery surrounds a hand of a user. The soft battery supplies an electric power to a finger-contact control module and a wireless transmitter in the body, such that the finger-contact control module senses a movement of an object (for example, a finger) on the body, and generates a control signal corresponding to a moving position of the object, and then the wireless transmitter transmits the control signal to a computer host, thus manipulating a cursor on an operating system frame of the computer host.
Owner:KYE SYST CORP

Modulated metal removal using localized wet etching

An apparatus for wet etching metal from a semiconductor wafer comprises a wafer holder for rotating a wafer and a plurality of nozzles for applying separate flow patterns of etching liquid to the surface of the wafer. The flow patterns impact the wafer in distinct band-like impact zones. The flow pattern of etching liquid from at least one nozzle is modulated during a total etching time control the cumulative etching rate in one local etch region relative to the cumulative etching rate in one or more other local etch regions. Some embodiments include a lower etch chamber and an upper rinse chamber separated by a horizontal splash shield. Some embodiments include a retractable vertical splash shield used to prevent splashing of etching liquid onto the inside walls of a treatment container. An etch-liquid delivery system includes a plurality of nozzle flow paths having corresponding nozzle flow resistances, and a plurality of drain flow paths having corresponding drain flow resistances. Nozzle flow resistances and drain flow resistances are matched so that switching the flow from a nozzle to a corresponding drain flow path does not change the flow rate of etching liquid through other nozzles. A non-wafer-contacting measuring device measures a metal thickness on a rotating semiconductor wafer during metal wet etching by immersing a plurality of electrodes in etching liquid in close proximity to the wafer surface of the rotating wafer and determining electrical resistance between a plurality of electrodes.
Owner:NOVELLUS SYSTEMS

Agricultural machine with a guidance system

A self-propelled agricultural machine having a position-finding system including a position-finding device for detecting positions of guide variables relative to the machine and at least one adjusting device for adjusting the orientation of the region of coverage of the position-finding device relative to the machine. The position of the crop edge detected by the position-finding device is used for adjustment of the orientation of the region of coverage of the position-finding device relative to the machine. The position-finding system provides reliable control of the machine along the path of the crop edge. At least one adjusting device orientates the positioning-finding device relative to the machine for tracking the machine along the detected crop edge. In addition, the signals of a further position-finding device in a feed region of a cutterbar is taken into consideration.
Owner:CLAAS SELBSTFAHRENDE ERNTEMASCHINEN GMBH

Optical near-field generating element and optical apparatus including the same

An optical near-field generating element is provided with: a light shielding member, which is placed on an optical path of light emitted from a light source, for defining a micro opening having a diameter equal to or shorter than a wavelength of the light; and a dielectric film placed in close contact with the micro opening. Alternatively, an optical near-field generating element is provided with a light shielding member, which is placed on an optical path of lights emitted from a light source, for defining a micro opening having a diameter equal to or shorter than a wavelength of the light, the shielding member equipped with: a main portion for defining a basic shape of the micro opening; and a protrusion portion protruding from the main portion toward the center of the micro opening.
Owner:PIONEER CORP

In-plane switching liquid crystal display with high aperture ratio

InactiveUS20040109119A1Reduce power consumptionIncreasing horizontal electric fieldsNon-linear opticsLiquid-crystal displayEngineering
The present invention discloses an in-plane switching (IPS) LCD having a plurality of pixels arranged in a matrix to be formed on a transparent insulating substrate. A region, bounded by a pair of gate bus lines and a pair of signal bus lines, defines a unit pixel region. Each common electrode overlaps with one of the signal bus lines in parallel. A gate electrode extended from an adjacent gate bus line goes toward the gate bus line of the pixel. A switching element formed in the pixel is a three-terminal thin film transistor whose one terminal is connected to a pixel electrode by passing through the middle of the pixel, and the other two terminals are respectively connected to the gate bus line and the signal bus line. The pixel electrode overlaps with the gate electrode in parallel, and the storage capacitor of the pixel is formed therebetween.
Owner:HANNSTAR DISPLAY CORPORATION

Method of Continuously Synthesizing Oriented Carbon Nanotubes and Apparatus for Continuously Synthesizing Same

A method and apparatus for continuously synthesizing oriented carbon nanotubes, with which oriented carbon nanotubes can be stably synthesized in large quantities, is presented.The method and apparatus for continuously synthesizing oriented carbon nanotubes comprise: a coating and drying step in which a catalyst liquid is applied and dried to form a catalyst layer on a substrate surface; a catalyst substrate formation step in which the catalyst layer is heated to form a catalyst substrate having a catalyst particle layer on the substrate surface; a synthesis step in which a raw material gas heated to a temperature equal to or higher than a synthesis temperature for the oriented carbon nanotubes is brought into contact with the surface of the catalyst substrate to synthesize oriented carbon nanotubes; and a collection step in which the oriented carbon nanotubes are collected. In the synthesis step, a carrier gas having a temperature equal to or higher than the synthesis temperature is supplied to the periphery of the raw material gas which is in contact with the surface of the catalytic substrate, or to its front and rear stages. Thus, oriented carbon nanotubes are continuously or intermittently synthesized.
Owner:NIPPON SANSO CORP +1

Light-emitting device for sealing light-emitting elements and electronic apparatus

A light-emitting device includes: a substrate; a plurality of light-emitting elements which is formed on the substrate and each of which has an anode partitioned by an insulating pixel partition wall, a cathode, and an organic light-emitting layer interposed therebetween and emits light by an electric field generated by the anode and the cathode; a first organic buffer layer that is formed by applying an organic compound and hardening the organic compound and covers a region larger than the region in which the plurality of light-emitting elements are formed; a second organic buffer layer that is that is formed by applying an organic compound and hardening the organic compound and is arranged above the substrate with the first organic buffer layer interposed therebetween so as to cover the plurality of light-emitting elements; and a gas barrier layer that is formed of an inorganic compound, covers a region larger than the region in which the first and second organic buffer layers are formed, and protects the plurality of light-emitting elements from air. In the light-emitting device, a region of the substrate overlapping the first organic buffer layer is not completely matched with a region of the substrate overlapping the second organic buffer layer.
Owner:SEIKO EPSON CORP

Modulated metal removal using localized wet etching

An apparatus for wet etching metal from a semiconductor wafer comprises a wafer holder for rotating a wafer and a plurality of nozzles for applying separate flow patterns of etching liquid to the surface of the wafer. The flow patterns impact the wafer in distinct band-like impact zones. The flow pattern of etching liquid from at least one nozzle is modulated during a total etching time control the cumulative etching rate in one local etch region relative to the cumulative etching rate in one or more other local etch regions. Some embodiments include a lower etch chamber and an upper rinse chamber separated by a horizontal splash shield. Some embodiments include a retractable vertical splash shield used to prevent splashing of etching liquid onto the inside walls of a treatment container. An etch-liquid delivery system includes a plurality of nozzle flow paths having corresponding nozzle flow resistances, and a plurality of drain flow paths having corresponding drain flow resistances. Nozzle flow resistances and drain flow resistances are matched so that switching the flow from a nozzle to a corresponding drain flow path does not change the flow rate of etching liquid through other nozzles. A non-wafer-contacting measuring device measures a metal thickness on a rotating semiconductor wafer during metal wet etching by immersing a plurality of electrodes in etching liquid in close proximity to the wafer surface of the rotating wafer and determining electrical resistance between a plurality of electrodes.
Owner:NOVELLUS SYSTEMS
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